Semiconductor device for reducing propagation time of gate input signals

US9601573B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9601573-B2
Application numberUS-201514681779-A
CountryUS
Kind codeB2
Filing dateApr 8, 2015
Priority dateApr 14, 2014
Publication dateMar 21, 2017
Grant dateMar 21, 2017

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A gate pad is disposed on a semiconductor layer composed of an n + type substrate, an n − type epitaxial layer, and a p − type body layer. The gate pad is disposed at the center portion of the semiconductor layer as viewed in plan. A plurality of unit cells that compose a trench type MOSFET element are provided in the semiconductor layer. The plurality of unit cells are arranged in the radial direction about the gate pad as viewed in plan. A gate electrode of a unit cell (center-side unit cell) that is proximate to the gate pad is electrically connected to the gate pad. Gate electrodes of unit cells that are adjacent to each other in the radial direction are connected to each other.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor device comprising: a semiconductor layer; a gate pad disposed on the semiconductor layer and formed at a center portion of the semiconductor layer as viewed in plan from a thickness direction of the semiconductor layer; and a plurality of unit cells formed in the semiconductor layer to each compose a transistor element that is either a metal oxide semiconductor (MOS) field effect transistor element or an insulated gate bipolar transistor element, and arranged in a radial direction about the gate pad as viewed in plan, wherein a gate electrode of a unit cell that is proximate to the gate pad, among the plurality of unit cells arranged in the radial direction, is electrically connected to the gate pad, and gate electrodes of unit cells that are adjacent to each other in the radial direction are connected to each other, the unit cells each have a regular hexagonal shape as viewed in plan, a source region of the unit cells other than the unit cells proximate to the gate pad is formed in a regular hexagonal ring shape as viewed in plan, and a source region of the unit cells proximate to the gate pad is formed in a partially missing regular hexagonal ring shape as viewed in plan.

Assignees

Inventors

Classifications

  • Die-attach connectors and bond wires · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • being orthogonal to a side surface of the chip, e.g. parallel arrangements · CPC title

  • multiple bond wires connected to common bond pads at both ends of the wires · CPC title

  • the connected ends being wedge-shaped · CPC title

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What does patent US9601573B2 cover?
A gate pad is disposed on a semiconductor layer composed of an n + type substrate, an n − type epitaxial layer, and a p − type body layer. The gate pad is disposed at the center portion of the semiconductor layer as viewed in plan. A plurality of unit cells that compose a trench type MOSFET element are provided in the semiconductor layer. The plurality of unit cells are arranged in the radia…
Who is the assignee on this patent?
Jtekt Corp
What technology area does this patent fall under?
Primary CPC classification H01L29/0696. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 21 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).