Semiconductor device for reducing gate wiring length

US9601572B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9601572-B2
Application numberUS-201514681662-A
CountryUS
Kind codeB2
Filing dateApr 8, 2015
Priority dateApr 14, 2014
Publication dateMar 21, 2017
Grant dateMar 21, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A gate pad and a source pad are disposed on a semiconductor layer. The gate pad is disposed at the center portion of the semiconductor layer and has the shape of a circle centered on the center of the semiconductor layer as viewed in plan. The source pad is disposed so as to surround the gate pad, and has the shape of a circular ring centered on the center of the semiconductor layer as viewed in plan. A plurality of unit cells that compose a trench type MOSFET element are formed in the semiconductor layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor device comprising: a semiconductor layer; a plurality of unit cells formed in the semiconductor layer to each compose a transistor element that is a metal oxide semiconductor (MOS) field effect transistor element; a gate pad disposed on the semiconductor layer and having a shape of a circle centered on a center of the semiconductor layer as viewed in plan from a thickness direction of the semiconductor layer; and a main electrode pad disposed on the semiconductor layer so as to surround the gate pad and having a shape of a circular ring centered on the center of the semiconductor layer as viewed in plan, wherein the main electrode pad is a source pad, the unit cells each have a regular hexagonal shape as viewed in plan, a source region of the unit cells other than the unit cells proximate to the gate pad is formed in a regular hexagonal ring shape as viewed in plan, and a source region of the unit cells proximate to the gate pad is formed in a partially missing regular hexagonal ring shape as viewed in plan. 2. The semiconductor device according to claim 1 , wherein the plurality of unit cells are arranged in a radial direction about the gate pad as viewed in plan; and a gate electrode of a unit cell that is proximate to the gate pad, among the plurality of unit cells arranged in the radial direction, is electrically connected to the gate pad, and gate electrodes of unit cells that are adjacent to each other in the radial direction are connected to each other.

Assignees

Inventors

Classifications

  • Die-attach connectors and bond wires · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • being orthogonal to a side surface of the chip, e.g. parallel arrangements · CPC title

  • multiple bond wires connected to common bond pads at both ends of the wires · CPC title

  • the connected ends being wedge-shaped · CPC title

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Frequently asked questions

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What does patent US9601572B2 cover?
A gate pad and a source pad are disposed on a semiconductor layer. The gate pad is disposed at the center portion of the semiconductor layer and has the shape of a circle centered on the center of the semiconductor layer as viewed in plan. The source pad is disposed so as to surround the gate pad, and has the shape of a circular ring centered on the center of the semiconductor layer as viewed i…
Who is the assignee on this patent?
Jtekt Corp
What technology area does this patent fall under?
Primary CPC classification H01L29/0696. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 21 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).