Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device

US9599901B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9599901-B2
Application numberUS-201615212936-A
CountryUS
Kind codeB2
Filing dateJul 18, 2016
Priority dateFeb 20, 2014
Publication dateMar 21, 2017
Grant dateMar 21, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a photosensitive resin composition from which a cured product having thin film thickness, excellent light-shielding properties, and high surface hardness is obtained. A a cured film and a method for producing the same, a method for producing a resin pattern, and an LCD device, an organic EL display device, an infrared cut filter, or a solid-state imaging device are also provided. The photosensitive resin composition includes a polymer component including at least one of categories (1) or (2), a photoacid generator, a solvent, and titanium black, wherein (1) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group, and (2) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group.

First claim

Opening claim text (preview).

What is claimed is: 1. A photosensitive resin composition comprising: (Component A) a polymer component including polymers satisfying at least one of (1) or (2) below, (1) a polymer having (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group; (2) a polymer having (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and a polymer having (a2) a constitutional unit containing a crosslinkable group; (Component B) a photoacid generator; (Component C) a solvent; and (Component S) titanium black. 2. The photosensitive resin composition according to claim 1 , wherein the crosslinkable group is at least one selected from the group consisting of an epoxy group, an oxetanyl group, —NH—CH 2 —OR 1 in which R 1 represents an alkyl group having 1 to 20 carbon atoms, an ethylenically unsaturated group, and a blocked isocyanate group. 3. The photosensitive resin composition according to claim 1 , wherein the crosslinkable group equivalent in the photosensitive resin composition is 250 to 1,000 per 1 g of organic solid content. 4. The photosensitive resin composition according to claim 1 , further comprising (Component D) a dispersant. 5. The photosensitive resin composition according to claim 1 , wherein the content of Component S is 40 mass % to 80 mass % based on the total solid content of the photosensitive resin composition. 6. The photosensitive resin composition according to claim 1 , further comprising (Component E) a crosslinking agent. 7. The photosensitive resin composition according to claim 1 , wherein Component B is an oxime sulfonate compound. 8. A method for producing a cured product, comprising in this order: applying the photosensitive resin composition according to claim 1 onto a substrate; removing a solvent from the applied resin composition; and heat-treating the resin composition freed from the solvent, or irradiating the resin composition freed from the solvent with actinic rays. 9. A method for producing a resin pattern, comprising in this order: applying the photosensitive resin composition according to claim 1 onto a substrate; removing a solvent from the applied resin composition; patternwise exposing the resin composition freed from the solvent to actinic rays; and developing the exposed resin composition and the unexposed resin composition with an aqueous developer. 10. A cured film obtained by curing the photosensitive resin composition according to claim 1 . 11. The cured film according to claim 10 , which is a light-shielding color filter. 12. A liquid crystal display device having the cured film according to claim 10 . 13. An organic EL display device having the cured film according to claim 10 . 14. An infrared cut filter having the cured film according to claim 10 . 15. A solid-state imaging device having the cured film according to claim 10 .

Assignees

Inventors

Classifications

  • G03F7/0392Primary

    the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title

  • with ethylenic or acetylenic bands in the side chains of the photopolymer · CPC title

  • Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

  • Filters, e.g. additive colour filters; Components for display devices · CPC title

  • for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation · CPC title

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What does patent US9599901B2 cover?
Provided is a photosensitive resin composition from which a cured product having thin film thickness, excellent light-shielding properties, and high surface hardness is obtained. A a cured film and a method for producing the same, a method for producing a resin pattern, and an LCD device, an organic EL display device, an infrared cut filter, or a solid-state imaging device are also provided. Th…
Who is the assignee on this patent?
Fujifilm Corp
What technology area does this patent fall under?
Primary CPC classification G03F7/0392. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 21 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).