Mask frame assembly and method of manufacturing the same
US-2015368785-A1 · Dec 24, 2015 · US
US9599889B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9599889-B2 |
| Application number | US-201314415416-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 11, 2013 |
| Priority date | Jul 17, 2012 |
| Publication date | Mar 21, 2017 |
| Grant date | Mar 21, 2017 |
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Provided are a method of manufacturing a support frame for a pellicle, capable of forming a sufficiently blackened anodic oxide film through anodic oxidation treatment and providing a support frame for a pellicle industrially inexpensively with ease, a support frame for a pellicle obtained by the method, and a pellicle. Specifically, provided are a method of manufacturing a support frame for a pellicle to be used as a pellicle including an optical thin film, the method including: annealing an aluminum material formed of an Al—Zn—Mg based aluminum alloy; and subjecting the aluminum material to anodic oxidation treatment in an alkaline solution to form an anodic oxide film having a lightness index L* value of 40 or less, a support frame for a pellicle obtained by the method, and a pellicle including the support frame for a pellicle and an optical thin film.
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The invention claimed is: 1. A method of manufacturing a support frame for a pellicle to be used as a pellicle comprising an optical thin film, the method comprising: annealing an aluminum material obtained by subjecting an Al—Zn—Mg based aluminum alloy to solution treatment or an aluminum material obtained by subjecting an Al—Zn—Mg based aluminum alloy to solution treatment and then aging treatment, so that an integral diffraction intensity of MgZn 2 measured by an X-ray diffraction method is 39.0 or more; and subjecting the aluminum material to anodic oxidation treatment in an alkaline solution to form an anodic oxide film having a lightness index L* value of 40 or less. 2. A method of manufacturing a support frame for a pellicle according to claim 1 , wherein the alkaline solution comprises an inorganic alkaline solution containing any one or more kinds of inorganic alkaline components selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, calcium hydroxide, strontium hydroxide, and rubidium hydroxide. 3. A method of manufacturing a support frame for a pellicle according to claim 1 , wherein the alkaline solution comprises a mixed alkaline solution containing salts of any one or more kinds of organic acids selected from the group consisting of tartaric acid, citric acid, oxalic acid, and salicylic acid and any one or more kinds of inorganic alkaline components selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, calcium hydroxide, strontium hydroxide, and rubidium hydroxide. 4. A method of manufacturing a support frame for a pellicle according to claim 2 , wherein the anodic oxidation treatment is performed by using the inorganic alkaline solution at a voltage of 0.5 V or more and less than 20 V. 5. A method of manufacturing a support frame for a pellicle according to claim 3 , wherein the anodic oxidation treatment is performed by using the mixed alkaline solution at a voltage of 2 V or more and less than 20 V. 6. A method of manufacturing a support frame for a pellicle according to claim 1 , further comprising, prior to the anodic oxidation treatment, subjecting a surface of the aluminum material to roughening treatment. 7. A method of manufacturing a support frame for a pellicle according to claim 1 , wherein the Al—Zn—Mg based aluminum alloy comprises an A7075 aluminum alloy specified by JIS. 8. A method of manufacturing a support frame for a pellicle according to claim 1 , further comprising, after the anodic oxidation treatment, performing sealing treatment using a sealing solution or steam. 9. A support frame for a pellicle, which is obtained by the method according to claim 1 and has concentrations of ions to be eluted in 100 ml of pure water per 100 cm 2 of a surface area of the support flame in an ion elution test for measuring concentrations of ions eluted after immersion in pure water at 80° C. for 4 hours of: 0.2 ppm or less for an acetate ion; 0.06 ppm or less for a formate ion; 0.01 ppm or less for an oxalate ion; 0.01 ppm or less for a sulfate ion; 0.02 ppm or less for a nitrate ion; 0.02 ppm or less for a nitrite ion; and 0.02 ppm or less for a chlorine ion. 10. A pellicle, comprising: the support frame for a pellicle according to claim 9 ; and an optical thin film. 11. A method of manufacturing a support frame for a pellicle according to claim 1 , wherein the annealing is conducted at temperature of 100° C. to 400° C. for 30 minutes to 120 minutes.
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