Compound and photosensitive resin composition

US9594302B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9594302-B2
Application numberUS-201314381772-A
CountryUS
Kind codeB2
Filing dateMar 5, 2013
Priority dateMar 22, 2012
Publication dateMar 14, 2017
Grant dateMar 14, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator including at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which R 1 is an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 is nitro, and the compound (1) in which n is 0. The symbols in general formula (1) are as defined in the description.

First claim

Opening claim text (preview).

The invention claimed is: 1. A compound represented by general formula (1): wherein R 1 represents an unsubstituted or substituted aliphatic hydrocarbon group having 1 to 20 carbon atoms or an unsubstituted or substituted aromatic hydrocarbon group having 6 to 20 carbon atoms, R 2 and R 3 are taken together to form a ring containing a nitrogen atom and a carbon atom, R 4 represents an unsubstituted or substituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic hydrocarbon group having 6 to 20 carbon atoms, or an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, R 5 , R 6 , R 7 , R 8 , R 9 , and R 11 each independently represent a hydrogen atom, a cyano group, a halogen atom, or an unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, and R 10 is a nitro group. 2. The compound according to claim 1 , wherein R 1 in general formula (1) is an unsubstituted or substituted aromatic hydrocarbon group having 6 to 20 carbon atoms. 3. The compound according to claim 1 , selected from the group consisting of: 4. The compound according to claim 1 , wherein R 1 in general formula (1) is a substituted or unsubstituted phenyl group. 5. A photosensitive resin composition comprising (A) a photo-initiator comprising at least one compound represented by general formula (1): wherein R 1 represents an unsubstituted or substituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, or an unsubstituted or substituted aromatic hydrocarbon group having 6 to 20 carbon atoms, R 2 and R 3 are taken together to form a ring containing a nitrogen atom and a carbon atom, R 4 represents an unsubstituted or substituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted aromatic hydrocarbon group having 6 to 20 carbon atoms, or an unsubstituted or substituted heterocyclic group having 2 to 20 carbon atoms, R 5 , R 6 , R 7 , R 8 , R 9 , and R 11 each independently represent a hydrogen atom, a cyano group, a halogen atom, or an unsubstituted aliphatic hydrocarbon group having 1 to 20 carbon atoms, and R 10 is a nitro group; and (B) a photosensitive resin. 6. The photosensitive resin composition according to claim 5 , wherein R 1 in general formula (1) is a substituted or unsubstituted phenyl group. 7. A cured product obtained by irradiating the photosensitive resin composition according to claim 5 with energy rays.

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Inventors

Classifications

  • Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

  • with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms · CPC title

  • having one or two double bonds between ring members or between ring members and non-ring members · CPC title

  • C07D209/86Primary

    with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system · CPC title

  • linked by a chain containing hetero atoms as chain links · CPC title

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What does patent US9594302B2 cover?
A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator including at least one compound (1) and…
Who is the assignee on this patent?
Adeka Corp
What technology area does this patent fall under?
Primary CPC classification C07D209/86. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 14 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).