Direct liquid deposition

Patent metadata

Field	Value
Publication number	US-9593407-B2
Application number	US-201213655501-A
Country	US
Kind code	B2
Filing date	Oct 19, 2012
Priority date	Oct 21, 2011
Publication date	Mar 14, 2017
Grant date	Mar 14, 2017

Abstract

Liquid precursor material of a coating substance and a solvent is provided in a reservoir (STEP 1 , STEP 1 ′). In one variant the liquid precursor material is distilled (STEP 2 ), the resultant liquid coating substance is vaporized (STEP 3 ) and ejected through a vapor distribution nozzle arrangement ( 7 ) into a vacuum recipient ( 3 ) and onto substrate 5 to be coated. Alternatively, the liquid precursor material is directly vaporized (STEP 3 ′). From the two-component vapor coating substance vapor is applied to substrate 5 ′ to be coated. In this variant separation of solvent vapor and coating substance vapor is performed especially downstream vaporizing (STEP 2 ′).

First claim

What is claimed is:

1. A vapour distribution nozzle arrangement for a vacuum coating device, the arrangement comprising:
a distribution element with an input for vapour and an output for vapour, the distribution element comprising a recess that becomes enlarged in the direction of the output for vapour, the input for vapour being situated at the apex of the recess and not downstream of the apex of the recess;
a deflection element for directing vapour from the input for vapour towards walls of the recess, the deflection element comprising a single deflection surface facing the input for vapour and an ejection opening for ejecting the vapour into a vacuum recipient of the vacuum coating device and towards the walls of the recess without interruption.

2. The arrangement according to claim 1 , wherein the deflection element is thermally coupled to the distribution element.

3. The arrangement according to claim 1 or 2 , wherein the deflection element comprises a disc with a raised central portion and/or a raised edge portion extending from the plane of the disc towards the input for vapour.

4. The arrangement according to claim 3 , wherein the raised central portion is described by a surface of rotation of a concave curve.

5. The arrangement according to claim 1 , wherein the recess is conical-shaped or pyramidal-shaped.

6. The arrangement according to claim 1 , wherein the distribution element is provided with at least one heating element.

7. A vapour source, comprising:
a vapour distribution nozzle arrangement according to claim 1 ; and
a vapourising compartment in operative connection with said input for vapour, the vapourising compartment comprising a vapourising chamber.

8. The source according to claim 7 , wherein the vapourising compartment comprises at least one diffuser element proximate to the input for vapour of the distribution nozzle arrangement, said diffuser element being preferably of metal foam.

9. The source according to claim 7 or 8 , further comprising an injection lance for injecting a predetermined dose of a liquid material into the vapourising compartment, the injection lance opening into the compartment upstream of the vapour distribution nozzle arrangement.

10. The source according to claim 9 , further comprising an annular diffuser element disposed between walls of the injection lance and the walls of the vapourising compartment, said annular diffuser element being preferably of metal foam.

11. The source according to claim 7 , comprising a carrier gas input to the vapourising compartment.

12. The source according to claim 7 , comprising a further diffuser element and a carrier gas input upstream said further diffuser element.

13. The source according to claim 7 , comprising:
a vapourising chamber, a first wall thereof being constituted by a first diffuser element, a second wall thereof, preferably opposite said first wall, being constituted by a second diffuser element, both diffuser elements being preferably of a metal foam;
an injection lance for injecting a predetermined dose of a liquid material into the vapourising chamber, the injection lance traversing said second diffuser element and opening into the chamber; and
a carrier gas line around said injection lance, terminated at one end by said second diffuser element and with a gas input at its other end,
wherein said first diffuser element is disposed between said chamber and said deflection element of said vapour distribution nozzle arrangement.

14. A method of distributing vapour, comprising:
applying vapour to an input of a vapour distribution nozzle arrangement according to claim 1 .

15. A method of distributing vapour, comprising:
applying vapour to an input of a vapour distribution nozzle arrangement of a vapour source according to claim 7 ,
wherein the vapour is generated by applying a liquid precursor material comprising a coating material dissolved in a solvent into the vapourising compartment.

16. The arrangement according to claim 1 , wherein the deflection element is configured to deflect the vapour in a continuous ring-shaped distribution pattern.

17. The arrangement according to claim 1 , wherein the deflection element comprises a concave-shape.

18. The arrangement according to claim 1 , wherein the deflection element comprises an arrow-head cross-section with the deflection surface presenting an annular straight-sided bowl form.

Assignees

• Oc Oerlikon Balzers Ag
• Evatec Ag

Inventors

• Voser Stephan
• Ravelli Fabio Antonio
• Gaechter Bruno

Classifications

• C23C14/228 Primary

  Gas flow assisted PVD deposition · CPC title

• C23C14/26

  by resistance or inductive heating of the source · CPC title

• B05B7/1686

  involving vaporisation of the material to be sprayed or of an atomising-fluid-generating product · CPC title

• C23C14/024

  Deposition of sublayers, e.g. to promote adhesion of the coating (C23C14/027 takes precedence) · CPC title

• C23C14/50

  Substrate holders · CPC title