Reagent for enhancing generation of chemical species
US-2015241779-A1 · Aug 27, 2015 · US
Compounds for enhancing generation of chemical species
US9593060B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9593060-B2 |
| Application number | US-201414547088-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 18, 2014 |
| Priority date | Nov 18, 2013 |
| Publication date | Mar 14, 2017 |
| Grant date | Mar 14, 2017 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed. Also described is a method for manufacturing a device, the method including applying a liquid containing a composition to a member such that a coating film including the composition is formed on the member; and exposing the coating film to at least one of a first electromagnetic ray and a first particle ray such that a first portion of the coating film is exposed to the at least one of the first electromagnetic ray and the first particle ray while a second portion of the coating film is not exposed to the at least one of the first electromagnetic ray and the first particle ray.
First claim
Opening claim text (preview).
What is claimed is: 1. A composition comprising: a first polymer including an acid-dissociable substituent that is to react with a generated acid; a photoacid generator; a second polymer including the following unit represented by Formula (B-1) 2. The composition of claim 1 , wherein: the first polymer and the second polymer are the same polymer, and the acid-dissociable substituent and the unit represented by Formula (B-1) are included in one polymer. 3. An interlayer insulating film of a device which includes a layer of the composition of claim 1 .
Assignees
Inventors
Classifications
the macromolecular compound having an alicyclic moiety in a side chain · CPC title
etherified · CPC title
with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title
Acrylic acid esters; Methacrylic acid esters · CPC title
- C07C43/215Primary
having unsaturation outside the six-membered aromatic rings · CPC title
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Frequently asked questions
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- What does patent US9593060B2 cover?
- A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed. Also described is a method for manufacturing a device, the method including applying a liquid containing a composition to a member such that a coating film including the composition is formed on the member; and exposing the coating film to at least one of a first electromagneti…
- Who is the assignee on this patent?
- Toyo Gosei Co Ltd, Toyo Gosei Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification C07C43/215. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 14 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).