Liquid treatment apparatus and liquid treatment method

US9593030B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9593030-B2
Application numberUS-201514693896-A
CountryUS
Kind codeB2
Filing dateApr 23, 2015
Priority dateNov 18, 2013
Publication dateMar 14, 2017
Grant dateMar 14, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A liquid treatment apparatus includes a dielectric tube through which water to be treated flows, a first electrode at least a part of which is disposed in the dielectric tube, a second electrode at least a part of which is disposed in the dielectric tube at a position upstream of the first electrode, a gas supplier operative to generate a bubble by supplying a gas into the water to be treated, and a power supply operative to apply a voltage between the first electrode and the second electrode in a state in which the bubble covers a conductor-exposed portion of the first electrode.

First claim

Opening claim text (preview).

What is claimed is: 1. A liquid treatment apparatus comprising: a dielectric tube through which water to be treated flows; a first electrode at least a part of which is disposed in the dielectric tube; a second electrode at least a part of which is disposed in the dielectric tube at a position upstream of the first electrode; a gas supplier operative to generate a bubble by supplying a gas into the water to be treated; and a power supply operative to apply a voltage between the first electrode and the second electrode in a state in which the bubble covers a conductor-exposed portion of the first electrode, wherein each of the first and second electrodes has a rod shape, a longitudinal axis of the first electrode is perpendicular to a longitudinal direction of the dielectric tube, and the second electrode is parallel to the longitudinal direction of the dielectric tube. 2. The liquid treatment apparatus according to claim 1 , wherein a flow path of the water to be treated extends parallel to the longitudinal direction of the dielectric tube, and the longitudinal axis of the first electrode crosses the flow path of the water to be treated. 3. The liquid treatment apparatus according to claim 1 , wherein the power supply is operative to apply the voltage in a state in which the bubble is not in contact with the second electrode. 4. The liquid treatment apparatus according to claim 1 , wherein the power supply is operative to apply a voltage between the first electrode and the second electrode to cause an electrical discharge in the bubble and generate plasma. 5. The liquid treatment apparatus according to claim 1 , wherein the dielectric tube defines a flow path through which the water to be treated flows from the second electrode toward the first electrode and through which the water to be treated and the bubble flow downstream from the first electrode. 6. The liquid treatment apparatus according to claim 1 , further comprising: an insulator that surrounds the first electrode with a space therebetween in the dielectric tube, the insulator including an opening through which the space is connected to an inside of the dielectric tube, wherein the gas supplier is operative to generate the bubble in the water to be treated from the opening in the insulator by supplying the gas to the space. 7. The liquid treatment apparatus according to claim 6 , wherein the first electrode includes a metal electrode portion disposed in the dielectric tube and a metal fastener that fixes the first electrode in place and that is connected to the power supply, and wherein the metal electrode portion and the metal fastener contain different materials. 8. The liquid treatment apparatus according to claim 7 , wherein the metal fastener has a through-hole through which the gas is supplied from the gas supplier to the space. 9. The liquid treatment apparatus according to claim 1 , further comprising: an insulator disposed in contact with an outer peripheral surface of the first electrode, wherein the first electrode has a tubular shape including an opening and a hollow space connected to the opening, and wherein the gas supplier is operative to generate the bubble in the water to be treated from the opening in the first electrode by supplying the gas to the space. 10. A liquid treatment method comprising: (a) preparing a dielectric tube, a first electrode at least a part of which is disposed in the dielectric tube, and a second electrode at least a part of which is disposed in the dielectric tube; (b) causing water to be treated to flow through the dielectric tube in a direction that the second electrode is located upstream of the first electrode; (c) supplying a gas into the water to be treated and generating a bubble; and (d) applying a voltage between the first electrode and the second electrode in a state in which the bubble covers a conductor-exposed portion of the first electrode, wherein each of the first and second electrodes has a rod shape, a longitudinal axis of the first electrode is perpendicular to a longitudinal direction of the dielectric tube, and the second electrode is parallel to the longitudinal direction of the dielectric tube. 11. A liquid treatment method comprising: (a) preparing a dielectric tube, a first electrode at least a part of which is disposed in the dielectric tube, and a second electrode at least a part of which is disposed in the dielectric tube; (b) causing water to be treated to flow through the dielectric tube in a direction that the second electrode is located upstream of the first electrode; (c) supplying a gas into the water to be treated and generating a bubble; and (d) applying a voltage between the first electrode and the second electrode in a state in which the bubble covers a conductor-exposed portion of the first electrode, wherein, in the step (d), the voltage is applied in a state in which the bubble is not in contact with the second electrode. 12. The liquid treatment method according to claim 10 , wherein, in the step (d), an electrical discharge is caused in the bubble and plasma is generated. 13. The liquid treatment method according to claim 10 , wherein a flow path of the water to be treated extends parallel to the longitudinal direction of the dielectric tube, and the longitudinal axis of the first electrode crosses the flow path of the water to be treated. 14. The liquid treatment apparatus according to claim 1 , wherein the dielectric tube includes a first tube through which the water to be treated flows, and a sub tube perpendicularly connected to the first tube, the first electrode is at least partially disposed in the sub tube, and the second electrode is at least partially disposed in the first tube. 15. The liquid treatment method according to claim 10 , wherein the dielectric tube includes a first tube through which the water to be treated flows, and a sub tube perpendicularly connected to the first tube, the first electrode is at least partially disposed in the sub tube, and the second electrode is at least partially disposed in the first tube.

Assignees

Inventors

Classifications

  • using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes · CPC title

  • using discharges in liquid media · CPC title

  • using glow discharges · CPC title

  • by oxidation {(C02F1/4672 takes precedence)} · CPC title

  • Electricity · mapped topic

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What does patent US9593030B2 cover?
A liquid treatment apparatus includes a dielectric tube through which water to be treated flows, a first electrode at least a part of which is disposed in the dielectric tube, a second electrode at least a part of which is disposed in the dielectric tube at a position upstream of the first electrode, a gas supplier operative to generate a bubble by supplying a gas into the water to be treated, …
Who is the assignee on this patent?
Panasonic Ip Man Co Ltd
What technology area does this patent fall under?
Primary CPC classification C02F1/4608. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 14 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).