Apparatus and method for drying substrate

US9587880B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9587880-B2
Application numberUS-201313905676-A
CountryUS
Kind codeB2
Filing dateMay 30, 2013
Priority dateMay 31, 2012
Publication dateMar 7, 2017
Grant dateMar 7, 2017

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Provided is an apparatus and method for drying a substrate. The apparatus includes a housing, a substrate support member, a fluid supply member, and a discharge member. The housing provides a space in which a drying process is performed. The substrate support member is provided in the housing to support the substrate. The fluid supply member includes a supply line for supplying a process fluid of a supercritical state to the housing. The discharge member includes a discharge line for discharging the process fluid from the housing. Here, the supply line includes a first supply line provided to supply the process fluid to the housing at a first supply flow rate, and a second supply line provided to supply the process fluid to the housing at a second supply flow rate.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for drying a substrate, comprising: a housing providing a space in which a drying process is performed; a substrate support member provided in the housing to support the substrate; a storage storing a process fluid of a supercritical state; a fluid supply member comprising a supply line for supplying the process fluid of the supercritical state from the storage to the housing; and a discharge member comprising a discharge line for discharging the process fluid from the housing, wherein the supply line comprises: a lower supply line connected to a bottom of the housing and provided to supply the process fluid from the storage to the housing at a first supply flow rate before an internal pressure of the housing reaches a predetermined pressure; and an upper supply line connected to a top of the housing and provided to supply the process fluid from the storage to the housing at a second supply flow rate after the internal pressure of the housing reaches the predetermined pressure. 2. The apparatus of claim 1 , wherein the supply line further comprises: a front supply line connected to the storage ; and a rear supply line connected to the housing, wherein the lower supply line and the upper supply line are connected in parallel to each other, and connect between the front supply line and the rear supply line. 3. The apparatus of claim 1 , wherein: the lower supply line comprises a first flow control valve that controls the process fluid to flow at the first supply flow rate; the upper supply line comprises a second flow control valve that controls the process fluid to flow at the second supply flow rate; and the first flow control valve and the second flow control valve are controlled such that the second supply flow rate is greater than the first supply flow rate. 4. The apparatus of claim 3 , wherein the supply line further comprises a third supply line provided with a third flow control valve that controls the process fluid to flow at a third supply flow rate, and the third flow control valve is controlled such that the third supply flow rate is greater than the second supply flow rate. 5. The apparatus of claim 3 , wherein the supply line further comprises a controller, which controls an opening degree of the second flow control valve during the drying process such that the first supply flow rate and the second supply flow rate of the process fluid passing through the supply line are controlled.

Assignees

Inventors

Classifications

  • for drying · CPC title

  • Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

  • F26B21/37Primary

    Velocity of flow; Quantity of flow · CPC title

  • by dipping them into or mixing them with a chemical liquid, e.g. organic; chemical, e.g. organic, dewatering aids (F26B3/005 takes precedence; using chemical vapours or gases F26B21/40) · CPC title

  • Electricity · mapped topic

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9587880B2 cover?
Provided is an apparatus and method for drying a substrate. The apparatus includes a housing, a substrate support member, a fluid supply member, and a discharge member. The housing provides a space in which a drying process is performed. The substrate support member is provided in the housing to support the substrate. The fluid supply member includes a supply line for supplying a process fluid …
Who is the assignee on this patent?
Semes Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/0402. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 07 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).