Piezoelectric actuator and liquid discharging head
US-2024334834-A1 · Oct 3, 2024 · US
US9586401B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9586401-B2 |
| Application number | US-201414206092-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 12, 2014 |
| Priority date | Mar 14, 2013 |
| Publication date | Mar 7, 2017 |
| Grant date | Mar 7, 2017 |
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A piezoelectric thin film element includes a substrate, a vibration plate provided on the substrate, a lower electrode provided on the vibration plate, the lower electrode including at least a platinum metal film or an iridium metal film, a piezoelectric film provided on the lower electrode, the piezoelectric film including a polycrystalline body, and an upper electrode provided on the piezoelectric film, the lower electrode being provided on an upper portion of a titanium oxide film formed on the vibration plate, the lower electrode including a platinum metal film or an iridium metal film formed on the titanium oxide film and conductive oxide formed on the platinum metal film or the iridium metal film, and the platinum metal film or the iridium metal film being a precise film.
Opening claim text (preview).
What is claimed is: 1. A piezoelectric thin film element, comprising: a substrate; a vibration plate provided on the substrate; a lower electrode provided on the vibration plate, the lower electrode including at least a platinum metal film or an iridium metal film; a piezoelectric film provided on the lower electrode, the piezoelectric film including a polycrystalline body; and an upper electrode provided on the piezoelectric film, the lower electrode being provided on an upper portion of a titanium oxide film formed on the vibration plate, the lower electrode including a platinum metal film or an iridium metal film formed on the titanium oxide film, and the platinum metal film or the iridium metal film being a precise film without having a hole that is in a crystal grain boundary of the platinum metal film or a crystal grain boundary of the iridium metal film and that permits Pb diffusion of Pb in the piezoelectric film into the platinum metal film or the iridium metal film, the precise film having a thickness of 150 nm or more and 250 nm or less and having an average particle diameter of crystal of 250 nm or more. 2. The piezoelectric thin film element according to claim 1 , wherein the piezoelectric film is a composition of MPB (Morphotropic Phase Boundary) of PZT (Pb (Zr x Ti 1-x ) O 3 , x=approximate 0.52). 3. An inkjet recording head comprising the piezoelectric thin film element according to claim 1 . 4. An inkjet image-forming apparatus comprising the inkjet recording head according to claim 3 . 5. A piezoelectric thin film element, comprising: a vibration plate on a substrate; a lower electrode provided on the vibration plate, the lower electrode including at least a platinum metal film or an iridium metal film; a piezoelectric film provided on the lower electrode, the piezoelectric film including a polycrystalline body; and an upper electrode provided on the piezoelectric film, the lower electrode being formed on an upper portion of a titanium oxide film formed on the vibration plate, the platinum metal film or the iridium metal film being a precise film without having a hole that is in a crystal grain boundary of the platinum metal film or a crystal grain boundary of the iridium metal film and that pen Pb diffusion of Pb in the piezoelectric film into the platinum metal film or the iridium metal film, the precise film having a thickness of 150 nm or more and having an average particle diameter of 250 nm or more, and the piezoelectric film being formed on the lower electrode having (100) priority orientation. 6. The piezoelectric thin film element according to claim 5 , wherein the (100) orientation component of the piezoelectric film is an orientation ratio of 90% or more if an orientation ratio ρ when the sum of a peak of each orientation of (111), (100), (110) obtained with XRD is 1 is obtained by the following formula (1), where the denominator represents the sum of each peak intensity of (111), (100), (110), and the numerator represents a peak intensity of arbitrary orientation ρ= I ( hkl )/Σ I ( hkl ) (1). 7. The piezoelectric thin film element according to claim 5 , wherein the titanium oxide film has a high Ti ratio on a side close to the lower electrode. 8. A piezoelectric thin film element, comprising: a vibration plate on a substrate; a lower electrode provided on the vibration plate, the lower electrode including at least a platinum metal film or an iridium metal film; a piezoelectric film provided on the lower electrode, the piezoelectric film including a polycrystalline body; and an upper electrode provided on the piezoelectric film, the lower electrode being formed on an upper portion of a titanium oxide film formed on the vibration plate, the platinum metal film or the iridium metal film being a precise film without having a hole that is in a crystal grain boundary and that permits Pb diffusion, the precise film having a thickness of 150 nm or more and having an average particle diameter of 250 nm or more, and the piezoelectric film being formed on the lower electrode having (100) priority orientation, wherein the piezoelectric film is a composition of MPB (Morphotropic Phase Boundary) of PZT (Pb (Zr x Ti 1-x )O 3 , x=approximate 0.52). 9. An inkjet recording head comprising the piezoelectric thin film element according to claim 5 . 10. An inkjet image-forming apparatus comprising the inkjet recording head according to claim 9 . 11. The piezoelectric thin film element according to claim 1 , wherein the upper electrode includes a conductive oxide and platinum. 12. The piezoelectric thin film element according to claim 5 , wherein the upper electrode includes a conductive oxide and platinum. 13. The piezoelectric thin film element according to claim 8 , wherein the upper electrode includes a conductive oxide and platinum.
by sol-gel deposition · CPC title
Electricity · mapped topic
thin film formation by spincoating · CPC title
Piezoelectric device making · CPC title
thin film formation by sputtering · CPC title
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