Swing objective lens

US9583306B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9583306-B2
Application numberUS-201514964274-A
CountryUS
Kind codeB2
Filing dateDec 9, 2015
Priority dateDec 9, 2014
Publication dateFeb 28, 2017
Grant dateFeb 28, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A scanning electron microscope (SEM) with a swing objective lens (SOL) reduces the off-aberrations to enhance the image resolution, and extends the e-beam scanning angle. The scanning electron microscope comprises a charged particle source, an accelerating electrode, and a swing objective lens system including a pre-deflection unit, a swing deflection unit and an objective lens, all of them are rotationally symmetric with respect to an optical axis. The upper inner-face of the swing deflection unit is tilted an angle θ to the outer of the SEM and its lower inner-face is parallel to the optical axis. A distribution for a first and second focusing field of the swing objective lens is provided to limit the off-aberrations and can be performed by a single swing deflection unit. Preferably, the two focusing fields are overlapped by each other at least 80 percent.

First claim

Opening claim text (preview).

What is claimed is: 1. A system for tilting a charged particle beam focused by an immersion objective lens, comprising: a pre-lens deflector above and adjacent to a magnetic field generated by the immersion objective lens, said pre-lens deflector deflecting the charged particle beam to a pre-determined angle; and a swing deflector, located inside said immersion objective lens, for swinging a magnetic lens generated by the immersion objective lens into the pre-determined angle, such that the charged particle beam is focused by the swung magnetic lens and bombards a specimen with the pre-determined angle. 2. The system according to claim 1 , wherein the charged particle beam is an electron beam. 3. A swing objective lens, comprising: an immersion objective lens for focusing a charged particle beam on a specimen; a pre-lens deflector above and adjacent to a magnetic lens generated by the immersion objective lens, said pre-lens deflecting the charged particle beam to a pre-determined angle; and a swing deflector, located inside said magnetic lens, providing an electrostatic field with a first condition; wherein when the first condition matches a second condition generated by the immersion objective lens and the swing deflector, the magnetic lens is swung into the pre-determined angle. 4. The swing objective lens according to claim 3 , wherein the first condition is [φ′(z)+½″(z)(z−z 0 )], and φ is an electric potential produced by the swing deflector. 5. The swing objective lens according to claim 4 , wherein the second condition is √{square root over (φ(z))}[B(z)+½B′(z)(z−z 0 )], and B is the magnetic field generated by the immersion objective lens. 6. The swing objective lens according to claim 5 , wherein the match is the first condition mostly overlapped with the second condition. 7. The swing objective lens according to claim 5 , wherein the match is a first peak value of the first condition close to a second peak value of the second condition. 8. The swing objective lens according to claim 5 , wherein the match is a first distribution of the first condition similar and close to a second distribution of the second condition. 9. A swing objective lens, comprising: an immersion objective lens for focusing a charged particle beam on a specimen, wherein the charged particle beam along an optical axis; a pre-lens deflector above and adjacent to a magnetic lens generated by the immersion objective lens, said pre-lens deflecting the charged particle beam to a pre-determined angle; and a swing deflector, located inside said magnetic lens, a first portion of an inner surface of the swing deflector having an inclined angle to the optical axis and a second portion of the inner surface of the swing deflector being parallel to the optical axis, wherein the magnetic lens is swung by the swing deflector into the pre-determined angle. 10. The swing objective lens according to claim 9 , wherein the swing deflector generates an electric potential φ with a first condition, [φ′(z)+½φ″(z)(z−z 0 )]. 11. The swing objective lens according to claim 10 , wherein the immersion objective lens generates a magnetic field B with a second condition, √{square root over (φ(z))}[B(z)+½′(z)(z−z 0 )]. 12. The swing objective lens according to claim 11 , wherein the first condition matches the second condition. 13. The swing objective lens according to claim 12 , wherein the match is a first distribution of the first condition similar and close to a second distribution of the second condition. 14. The swing objective lens according to claim 13 , further comprising a scanning deflector unit for scanning the charged particle beam on the specimen. 15. The swing objective lens according to claim 14 , further comprising a retard electrode below the immersion objective lens. 16. A scanning electron microscope, comprising: an electron source for providing an electron beam along an optical axis; a condenser lens for condensing the electron beam; a detector for receiving signal electrons emanating from the specimen; and a swing objective lens, comprising: an immersion objective lens for focusing a charged particle beam on a specimen, wherein the charged particle beam along an optical axis, wherein the immersion objective lens generates a magnetic field B with a second condition, √{square root over (φ(z))}[B(z)+½B′(z)(z−z 0 )]; a pre-lens deflector above and adjacent to a magnetic lens generated by the immersion objective lens, said pre-lens deflecting the charged particle beam to a pre-determined angle; a swing deflector, located inside said magnetic lens, a first portion of an inner surface of the swing deflector having an inclined angle to the optical axis and a second portion of the inner surface of the swing deflector being parallel to the optical axis, wherein the magnetic lens is swung by the swing deflector into the pre-determined angle, the swing deflector generates an electric potential co with a first condition, [φ′(z)+½φ″(z)(z−z 0 )], and a first distribution of the first condition similar and close to a second distribution of the second condition; a scanning deflector unit for scanning the charged particle beam on the specimen.; and a retard electrode below the immersion objective lens. 17. A method for tilting a charged particle beam, comprising: deflecting the charged particle beam to a pre-determined angle; providing an immersion magnetic lens to the charged particle beam such that the charged particle beam is focused on a specimen; and providing a swinging electrostatic field to the immersion magnetic lens such that the immersion magnetic lens is swung to the pre-determined angle, wherein the swing electric field has a first condition match to a second condition generated by the immersion magnetic lens and the swinging electrostatic field.

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What does patent US9583306B2 cover?
A scanning electron microscope (SEM) with a swing objective lens (SOL) reduces the off-aberrations to enhance the image resolution, and extends the e-beam scanning angle. The scanning electron microscope comprises a charged particle source, an accelerating electrode, and a swing objective lens system including a pre-deflection unit, a swing deflection unit and an objective lens, all of them are…
Who is the assignee on this patent?
Hermes Microvision Inc
What technology area does this patent fall under?
Primary CPC classification H01J37/1478. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 28 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).