Photoimageable compositions containing oxetane functionality

Patent metadata

Field	Value
Publication number	US-9575409-B2
Application number	US-201514946843-A
Country	US
Kind code	B2
Filing date	Nov 20, 2015
Priority date	Nov 26, 2014
Publication date	Feb 21, 2017
Grant date	Feb 21, 2017

Abstract

Embodiments in accordance with the present invention encompass negative-tone, solvent developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.

First claim

What is claimed is:

1. A photoimageable solvent developable negative tone composition comprising:
a) a polymer selected from the group consisting of:
a copolymer containing repeating units derived from 5-decylbicyclo[2.2.1]hept-2-ene (DecNB) and 2-((bicyclo[2.2.1]hept-5-en-2-ylmethoxy)methyl)oxirane (MGENB); and
a terpolymer containing repeating units derived from 5-decylbicyclo[2.2.1]hept-2-ene (DecNB), 5-phenethylbicyclo[2.2.1]hept-2-ene (PENB) and 2-((bicycle[2.2.1]hept-5-en-2-ylmethoxy)methyl)oxirane (MGENB);

b) an oxetane compound:

c) a photoactive compound selected from the group consisting of:

 and
d) a carrier solvent.

2. The composition of claim 1 , wherein the polymer is a copolymer containing repeating units derived from 5-decylbicyclo[2.2.1]hept-2-ene (DecNB) and 2-((bicyclo[2.2.1]hept-5-en-2-ylmethoxy)methyl)oxirane (MGENB).

3. The composition of claim 1 , wherein the polymer is a terpolymer containing repeating units derived from 5-decylbicyclo[2.2.1]hept-2-ene (DecNB), 5-phenethylbicyclo [2.2.1]hept-2-ene (PENB) and 2-((bicyclo[2.2.1]hept-5-en-2-ylmethoxy)methyl)oxirane (MGENB).

4. The composition of claim 1 , which further comprises one or more adhesion promoters selected from the group consisting of:

5. A photoimageable solvent developable negative tone composition comprising:
a) a polymer selected from the group consisting of:
a copolymer containing repeating units derived from 5-decylbicyclo[2.2.1]hept-2-ene (DecNB) and 2-((bicyclo[2.2.1]hept-5-en-2-ylmethoxy)methyl)oxirane (MGENB); and
a terpolymer containing repeating units derived from 5-decylbicyclo[2.2.1]hept-2-ene (DecNB), 5-phenethylbicyclo[2.2.1]hept-2-ene (PENB) and 2-((bicyclo[2.2.1]hept-5-en-2-ylmethoxy)methyl)oxirane (MGENB);

b) an oxetane compound selected from the group consisting of:
a compound of formula (IIIA):

c) a photoactive compound selected from the group consisting of:

d) an adhesion promoter selected from the group consisting of:

 and
e) a carrier solvent.

6. The composition of claim 5 , wherein the polymer is a copolymer containing repeating units derived from 5-decylbicyclo[2.2.1]hept-2-ene (DecNB) and 2-((bicyclo[2.2.1]hept-5-en-2-ylmethoxy)methyl)oxirane (MGENB).

7. The composition of claim 5 , wherein the polymer is a terpolymer containing repeating units derived from 5-decylbicyclo[2.2.1]hept-2-ene (DecNB), 5-phenethylbicyclo[2.2.1]hept-2-ene (PENB) and 2-((bicyclo [2 .2 .1] hept-5-en-2-ylmethoxy)methyl)oxirane (MGENB).

8. The composition of claim 5 , wherein the oxetane compound is a compound of formula (IIIA):

wherein f is 1 or 2.

9. The composition of claim 5 , wherein the oxetane compound is

10. The composition of claim 5 , wherein the oxetane compound is

11. The composition of claim 5 , wherein the oxetane compound is

12. The composition of claim 5 , wherein the oxetane compound is

13. The composition of claim 5 , wherein the oxetane compound is

14. The composition of claim 5 , wherein the photoactive compound is

15. The composition of claim 5 , wherein the photoactive compound is

16. The composition of claim 5 , wherein the adhesion promoter is

17. The composition of claim 5 , wherein the adhesion promoter is

Assignees

• Promerus Llc

Inventors

• Ng Hendra
• Zhang Wei

Classifications

• G03F7/0755

  Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds (G03F7/0752 takes precedence) · CPC title

• G03F7/0751

  used as adhesion-promoting additives or as means to improve adhesion · CPC title

• G03F7/0382

  the macromolecular compound being present in a chemically amplified negative photoresist composition · CPC title

• G03F7/0388

  with ethylenic or acetylenic bands in the side chains of the photopolymer · CPC title

• G03F7/0046

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title