Systems and methods for x-ray phase contrast imaging using arrays of x-ray focusing elements

US9575015B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9575015-B2
Application numberUS-201514673304-A
CountryUS
Kind codeB2
Filing dateMar 30, 2015
Priority dateMar 31, 2014
Publication dateFeb 21, 2017
Grant dateFeb 21, 2017

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Abstract

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Systems and methods for performing x-ray phase-contrast imaging using a conventional x-ray source and detector are provided. An array of x-ray focusing elements it provided and used to focus x-ray onto a pattern of multiple different focal spots. When an object is introduced into the beam path, the focal spots will be displaced based on the x-rays being refracted by the object. A refraction angle map is produced and used to generate a phase contrast image, such as an image that indicates the electron density distribution in the object. Multi-spectral imaging can be achieved by utilizing the chromatic aberration of the array of x-ray focusing elements and sweeping the detector through different focal planes associated with different x-ray energy levels or sweeping the peak voltage of the x-ray source for a fixed object-to-detector distance.

First claim

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The invention claimed is: 1. A method for x-ray phase contrast imaging using an x-ray imaging system, the steps of the method comprising: a) acquiring an image of an object using an x-ray imaging system that comprises: an x-ray source; an x-ray detector; and an array of x-ray focusing elements positioned between the x-ray source and the x-ray detector and configured to focus x-rays incident on the array of x-ray focusing elements onto a pattern of focal spots on the x-ray detector;  wherein the acquired image is indicative of a displacement of the focal spots based on a refraction of the x-rays by the object; b) providing a calibration image that depicts the pattern of focal spots defined by the array of x-ray focusing elements; c) producing a refraction angle map that indicates a refraction angle associated with each focal spot, the refraction angle map being based on the displacement of the focal spots measured using the acquired image and the calibration image; and d) repeating step c) while changing a relative angle between the x-ray imaging system and the object to obtain refraction angle maps for varying angles of illumination of x-rays onto the object; e) producing an image of the object that is indicative of an electron density distribution in the object based on the refraction angle maps. 2. The method as recited in claim 1 , wherein the array of x-ray focusing elements comprises a zone-plate array. 3. The method as recited in claim 1 , wherein the array of x-ray focusing elements comprises a first array of x-ray focusing elements and a second array of x-ray focusing elements. 4. The method as recited in claim 3 , wherein the first array of x-ray focusing elements is a zone-plate array comprising a plurality of horizontally-aligned linear zones and the second array of x-ray focusing elements is a zone-plate array comprising a plurality of vertically-aligned linear zones. 5. The method as recited in claim 1 , wherein the array of x-ray focusing elements comprises an array of photon sieves. 6. The method as recited in claim 1 , wherein providing the calibration image in step b) includes acquiring an image with the x-ray imaging system while no object is present in the x-ray imaging system. 7. The method as recited in claim 1 , wherein the calibration image is computed based on known characteristics of the array of x-ray focusing elements and geometry of the x-ray imaging system. 8. The method as recited in claim 1 , wherein step c) includes calculating the displacement of each focal spot in the acquired image from a location of a corresponding focal spot in the calibration image, and estimating the refraction angle associated with each focal spot based on the respective calculated displacement. 9. The method as recited in claim 1 , wherein computing the electron density in step d) includes estimating phase shifts values from the estimated refraction angles, and relating the estimated phase shift values to the electron density in the object. 10. The method as recited in claim 1 , wherein the array of x-ray focusing elements is an array of absorption-type x-ray focusing elements that are each composed of a high-Z material deposited on a substrate. 11. The method as recited in claim 1 , wherein the array of x-ray focusing elements is an array of phase-type x-ray focusing elements that are each composed of a low-Z material deposited on a substrate. 12. The method as recited in claim 1 , wherein the array of x-ray focusing elements is an array of phase-type x-ray focusing elements that are each composed by etching an x-ray focusing element pattern on a substrate. 13. The method as recited in claim 1 , wherein the array of x-ray focusing elements comprises multiple sub-units of x-ray focusing elements arranged in a mosaic pattern. 14. The method as recited in claim 1 , wherein step c) is repeated a plurality of times while sweeping a peak voltage of the x-ray source through a plurality of different peak voltage values in order to measure focal spot displacement patterns at the plurality of different peak voltage values for a fixed object-to-detector distance. 15. The method as recited in claim 14 , wherein step d) includes producing multi-spectral images based on the focal spot displacement patterns at the plurality of different peak voltage values. 16. The method as recited in claim 1 , wherein step c) is repeated a plurality of times while sweeping the detector through a plurality of different focal planes with a fixed x-ray source peak voltage in order to measure focal spot displacement patterns at the plurality of different focal planes. 17. The method as recited in claim 16 , wherein step d) includes producing multi-spectral images based on the focal spot displacement patterns at the plurality of different focal planes. 18. The method as recited in claim 1 , wherein the relative angle between the x-ray imaging system and the object is changed in step d) by rotating the object in the x-ray imaging system. 19. The method as recited in claim 1 , wherein the relative angle between the x-ray imaging system and the object is changed in step d) by rotating the x-ray imaging system about the object. 20. The method as recited in claim 1 , wherein step e) includes producing the image of the object using a backprojection. 21. The method as recited in claim 1 , wherein the object is positioned between the x-ray source and the array of x-ray focusing elements in step a). 22. The method as recited in claim 1 , wherein the object is positioned between the array of x-ray focusing elements and the x-ray detector in step a). 23. The method as recited in claim 1 , wherein the array of x-ray focusing elements comprises at least one crystalline silicon wafer having inter-plane distances matched with wavelengths of x-rays generated by the x-ray source. 24. A method for multi-spectral x-ray phase contrast imaging using an x-ray imaging system, the steps of the method comprising: a) positioning an x-ray imaging system in a first position associated with a first focal plane, the x-ray imaging system comprising: an x-ray source that emits x-rays at a plurality of different energy levels; an x-ray detector; and an array of x-ray focusing elements (XFEs) positioned between the x-ray source and the x-ray detector, the array of XFEs being configured to focus x-rays incident on the array of XFEs onto a pattern of focal spots on the x-ray detector, the array of x-ray focusing elements having a chromatic aberration such that x-rays having a first energy are focused on the first focal plane and x-rays having a second energy are focused on a second focal plane that is different from the first focal plane; b) acquiring a first image of an object using the x-ray imaging system, the first image being indicative of a displacement of the focal spots on the first focal plane based on a refraction of the x-rays having the first energy by the object; c) adjusting the x-ray imaging system into a second position associated with the second focal plane; d) acquiring a second image of an object using the x-ray imaging system, the second image being indicative of a displacement of the focal spots on the second focal plane based on a refraction of the x-rays having the second energy by the object; e) providing a calibration image that depicts the pattern of focal spots defined by the array of x-ray focusing elements; f) producing a first refraction angle map based on

Assignees

Inventors

Classifications

  • by measuring interferences of X-rays, e.g. Borrmann effect · CPC title

  • Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast · CPC title

  • Construction details · CPC title

  • calibrating, standardising · CPC title

  • G21K1/06Primary

    using diffraction, refraction or reflection, e.g. monochromators (G21K1/10, G21K7/00 take precedence) · CPC title

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What does patent US9575015B2 cover?
Systems and methods for performing x-ray phase-contrast imaging using a conventional x-ray source and detector are provided. An array of x-ray focusing elements it provided and used to focus x-ray onto a pattern of multiple different focal spots. When an object is introduced into the beam path, the focal spots will be displaced based on the x-rays being refracted by the object. A refraction ang…
Who is the assignee on this patent?
Sung Yongjin, Gupta Rajiv, Massachusetts Gen Hospital
What technology area does this patent fall under?
Primary CPC classification G21K1/06. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 21 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).