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Method for forming metal oxide film, metal oxide film and apparatus for forming metal oxide film
US9574271B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9574271-B2 |
| Application number | US-200913383766-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 2, 2009 |
| Priority date | Sep 2, 2009 |
| Publication date | Feb 21, 2017 |
| Grant date | Feb 21, 2017 |
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Abstract
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The present method of forming a metal oxide film can increase production efficiency while maintaining the low resistance of the metal oxide film. The present method of forming a metal oxide film includes first misting a solution containing a metallic element and ethylenediamine; meanwhile, heating a substrate; and then, supplying the misted solution onto a first main surface of the substrate.
First claim
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The invention claimed is: 1. A method of forming a metal oxide film with a desired mobility, the method comprising: supplying a misted solution comprising a metallic element and an amount of ethylenediamine sufficient to provide the desired mobility onto a first main surface of a substrate while heating the substrate, wherein the amount of ethylenediamine is determined from a relationship showing change in mobility of the metal oxide film with a changing ethylenediamine amount…
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Electricity · mapped topic
Chemistry & Metallurgy · mapped topic
Cross-Sectional Technologies · mapped topic
Electricity · mapped topic
- C23C18/1216Primary
Chemistry & Metallurgy · mapped topic
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- What does patent US9574271B2 cover?
- The present method of forming a metal oxide film can increase production efficiency while maintaining the low resistance of the metal oxide film. The present method of forming a metal oxide film includes first misting a solution containing a metallic element and ethylenediamine; meanwhile, heating a substrate; and then, supplying the misted solution onto a first main surface of the substrate.
- Who is the assignee on this patent?
- Orita Hiroyuki, Shirahata Takahiro, Yoshida Akio, and 5 more
- What technology area does this patent fall under?
- Primary CPC classification C23C18/1216. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 21 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).