X-ray generation device and x-ray generation method
US-2015117616-A1 · Apr 30, 2015 · US
US9570264B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9570264-B2 |
| Application number | US-201214241417-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 29, 2012 |
| Priority date | Aug 31, 2011 |
| Publication date | Feb 14, 2017 |
| Grant date | Feb 14, 2017 |
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Provided is an X-ray generator which includes: an electron path 8 ; a target 9 c disposed on a substrate 9 a , in which electrons having passed through the electron path 8 are made to emit at the target 9 c and to generate an X-ray, wherein: the target 9 c is disposed at the central area of the substrate 9 a ; at least a part of a peripheral area of the substrate 9 a which is not covered with the target 9 c has higher transmittance than that of the central area of the substrate 9 a covered with the target 9 c , with respect to the X-ray generated when electrons having reflected from the target enter an inner wall of the electron path. X-ray generation efficiency may be improved by effectively using electrons reflected off the target 9 c.
Opening claim text (preview).
The invention claimed is: 1. A transmission type X-ray generator comprising: an anode having an electron path formation member having an annular inner wall surface so as to define an electron path hole, an integrated target including a target layer, an insulating substrate supporting the target layer and a conductive metal layer including a metal component, and an electron source facing the target layer so as to irradiate the target layer with electrons passing through the electron path hole so as to generate a main X-ray, wherein the electron path formation member has a sub X-ray generating portion receiving reflected electrons reflected from the target layer and generating a sub X-ray at the annular inner wall surface; wherein the target layer is disposed at a central area of the insulating substrate and is remote from a periphery of the insulating substrate; wherein the conductive metal layer is overlaid partially on the target layer such that the target layer is electrically connected to the electron path formation member via the conductive metal layer and the sub X-ray generating portion is irradiated with electrons reflected from the target layer or is overlaid under the target layer such that the target layer is electrically connected to the electron path formation member via the conductive metal layer and the sub X-ray generating portion is irradiated with electrons reflected from the target layer; and wherein at least a part of a peripheral area of the integrated target corresponding to the substrate not covered with the target layer has higher transmittance than that of the central area of the integrated target corresponding to the substrate covered with the target layer, with respect to the sub X-ray. 2. The X-ray generator according to claim 1 , wherein an X-ray transmittance of the integrated target corresponding to the central area of the substrate which is covered with the target layer is 30% to 70% of an X-ray transmittance at the peripheral area of the substrate which is not covered with the target layer. 3. The X-ray generator according to claim 1 , further comprising: an envelope in which the electron source and the target layer are stored, wherein the electron path formation member and the target layer are disposed such that both the X-ray generated from the target layer which is directly irradiated with electrons and the X-ray generated from the annular inner wall surface of the electron path formation member which is irradiated with the electrons reflected from the target layer are made to emit outside from the envelope. 4. The X-ray generator according to claim 1 , wherein a conductive metal layer connected to the target layer is provided in at least a part of a peripheral area of the substrate which is not covered with the target layer entirely. 5. The X-ray generator according to claim 4 , wherein the thickness of the conductive metal layer is greater than that of the target layer. 6. The X-ray generator according to claim 4 , wherein the conductive metal layer consists of elements which are smaller in mass than the target layer. 7. The X-ray generator according to claim 4 , wherein the conductive metal layer is disposed in a part of a peripheral area of the substrate which is not covered with the target layer and the rest of the peripheral area of the substrate which is not covered with the target layer is a surface on which the substrate is exposed. 8. The X-ray generator according to claim 1 , wherein at least a material of the electron path formation member which constitutes the annular inner wall surface of the electron path formation member is the same material as that of the target layer. 9. An X-ray imaging apparatus comprising: an X-ray generator according to claim 1 ; an X-ray detector which detects an X-ray emitted from the X-ray generator and transmitted through a sample; and a controller which controls the X-ray generator and the X-ray detector in coordination with each other. 10. The X-ray generator according to claim 1 , wherein the anode further comprises a conductive metal layer configured to be electrically connecting between the target layer and the electron path formation member.
and forming images of the material · CPC title
Arrangements for concentrating, focusing, or directing the cathode ray · CPC title
Electricity · mapped topic
Electricity · mapped topic
Anodes; Anti cathodes · CPC title
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