Mirror for use in a microlithography projection exposure apparatus

Patent metadata

Field	Value
Publication number	US-9568845-B2
Application number	US-201213417510-A
Country	US
Kind code	B2
Filing date	Mar 12, 2012
Priority date	Sep 15, 2009
Publication date	Feb 14, 2017
Grant date	Feb 14, 2017

Abstract

A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second material layers, arranged one above another. The refractive index of the first material for radiation in the range of 5-30 nm is greater than the refractive index of the second material in that wavelength range. The first group of layers is configured to have a number of layers that is greater than 20, such that, upon irradiation with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers, which has a layer thickness variation for correcting the surface form of the mirror.

First claim

The invention claimed is:

1. A mirror configured for a microlithography projection exposure apparatus comprising:
a substrate and a reflective coating,
wherein the reflective coating comprises a first group of layers and a second group of layers, wherein the second group of layers is arranged between the substrate and the first group of layers,
wherein the first group of layers and the second group of layers each comprise a plurality of alternating first and second layers arranged one above another, wherein the first layers comprise a first material and the second layers comprise a second material differing from the first material,
wherein, for radiation having a wavelength in the range of 5-30 nm, the refractive index of the first material is greater than the refractive index of the second material,
wherein the first group of layers comprises a number of the first and the second layers that is greater than 20,
wherein the second group of layers has a layer thickness variation correcting a surface form of the mirror, and
wherein the second group of layers comprises a correction layer containing a third material that differs from the first and second materials and having a layer thickness variation for correcting the surface form of the mirror, wherein the correction layer adjoins the first group of layers.

2. The mirror according to claim 1 ,
wherein the layer thickness variation of the correction layer, for correcting the surface form of the mirror, is greater than a layer thickness variation of the first and second layers of the second group of layers.

3. The mirror according to claim 1 ,
wherein the correction layer contains quartz as the third material.

4. The mirror according to claim 1 , wherein, upon irradiation of the mirror with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers.

5. A method for providing a corrected surface form of a mirror comprising a substrate and a reflective coating, comprising:
applying an initial group of layers to the substrate, wherein the initial group of layers comprises a plurality greater than 20 of alternating first and second layers, and wherein the first layers comprise a first material and the second layers comprise a second material differing from the first material,
producing an at least partially corrected profile for the initial group of layers by removing a portion of the initial group of layers, thereby producing a layer thickness variation in the initial group of layers, and
applying a further group of layers over the initial group of layers, wherein the further group comprises a plurality greater than 20 of alternating third and fourth layers that each extend continuously across the substrate, wherein the third layers comprise a third material and the fourth layers comprise a fourth material differing from the third material, and wherein the initial group of layers further comprises a correction layer which comprises a fifth material differing from the first material and from the second material and which is provided between the first and second layers on one side and the further group of layers on the other side.

6. The method according to claim 5 , wherein the portion removed from the initial group of layers is removed predominantly from the correction layer.

Assignees

• Rocktaeschel Martin
• Enkisch Hartmut
• Stickel Franz-Josef
• Natt Oliver
• Mann Hans-Juergen
• Migura Sascha
• Zeiss Carl Smt Gmbh

Inventors

• Rocktaeschel Martin
• Enkisch Hartmut
• Stickel Franz-Josef
• Natt Oliver
• Mann Hans-Juergen
• Migura Sascha

Classifications

• G03F7/70308

  Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift · CPC title

• G03F7/70316

  Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements · CPC title

• G03F7/70191

  Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like · CPC title

• G03F7/70958 Primary

  Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties · CPC title

• G02B5/0833

  comprising inorganic materials only · CPC title