Semiconductor pressure sensor, pressure sensor apparatus, electronic equipment, and method of manufacturing semiconductor pressure sensor

US9568385B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9568385-B2
Application numberUS-201414322306-A
CountryUS
Kind codeB2
Filing dateJul 2, 2014
Priority dateJul 24, 2009
Publication dateFeb 14, 2017
Grant dateFeb 14, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A semiconductor pressure sensor ( 720 ) includes a thin film piezoelectric element ( 701 ) which applies strain to a portion of a semiconductor substrate that corresponds to a thin region ( 402 ). The thin film piezoelectric element ( 701 ) is formed at a distance away from diffusion resistors ( 406, 408, 410 , and 412 ) functioning as strain gauges and is extended to the proximity of a bonding pad ( 716 A) connected to an upper electrode layer of the thin film piezoelectric element and a bonding pad ( 716 F) connected to a lower electrode thereof. The diffusion resistors ( 406, 408, 410 , and 412 ) constitute a bridge circuit by metal wiring ( 722 ) and diffusion wiring ( 724 ). During self-diagnosis, a prescribed voltage is applied to a thin film piezoelectric element ( 701 ). If the output difference of the bridge circuit between before and after the voltage application falls outside a prescribed range, it is determined that a breakage occurs in the semiconductor pressure sensor ( 720 ).

First claim

Opening claim text (preview).

The invention claimed is: 1. A pressure sensor apparatus comprising: a sensor configured to change a signal voltage based on a pressure; and a signal processing circuit for processing a signal output from said sensor, said signal processing circuit including an amplification circuit for amplifying said signal voltage, and a first operation circuit for generating a first voltage changing in accordance with said pressure, based on an output voltage of said amplification circuit, wherein said first operation circuit is configured to generate said first voltage by subtracting a voltage having a prescribed correlation with said output voltage of said amplification circuit from a prescribed offset voltage. 2. The pressure sensor apparatus according to claim 1 , wherein said signal processing circuit further includes a second operation circuit for generating a second voltage changing in accordance with said pressure, based on said first voltage, a first rate of change of said first voltage with respect to said pressure is different from a second rate of change of said second voltage with respect to said pressure, and said first voltage corresponds to said second voltage, at an upper limit value in a range of said pressure detected by said sensor. 3. The pressure sensor apparatus according to claim 2 , wherein an absolute value of said second rate of change is greater than an absolute value of said first rate of change. 4. The pressure sensor apparatus according to claim 3 , wherein said second operation circuit generates said second voltage by amplifying said first voltage. 5. The pressure sensor apparatus according to claim 2 , wherein said signal processing circuit further includes a first terminal for outputting said first voltage to the outside of said signal processing circuit, and a second terminal for outputting said second voltage to the outside of said signal processing circuit. 6. The pressure sensor apparatus according to claim 2 , wherein said range is determined so as to include a standard value of atmospheric pressure and such that said upper limit value is a value in the neighborhood of said standard value. 7. Electronic equipment comprising: a sensor configured to change a signal voltage based on a pressure; a signal processing circuit for processing a signal output from said sensor; said signal processing circuit including an amplification circuit for amplifying said signal voltage, and an operation circuit for generating a detection voltage changing in accordance with said pressure, based on an output voltage of said amplification circuit, wherein said operation circuit is configured to generate said detection voltage by subtracting a voltage having a prescribed correlation with said output voltage of said amplification circuit from a prescribed offset voltage; and a main unit for executing prescribed processing based on said detection voltage.

Assignees

Inventors

Classifications

  • using piezoelectric devices (piezoelectric resonators G01L9/0022; surface acoustic waves G01L9/0025) · CPC title

  • of piezo-resistive devices · CPC title

  • Electrical device making · CPC title

  • Malfunction diagnosis, i.e. diagnosing a sensor defect · CPC title

  • G01L9/0051Primary

    using variations in ohmic resistance · CPC title

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What does patent US9568385B2 cover?
A semiconductor pressure sensor ( 720 ) includes a thin film piezoelectric element ( 701 ) which applies strain to a portion of a semiconductor substrate that corresponds to a thin region ( 402 ). The thin film piezoelectric element ( 701 ) is formed at a distance away from diffusion resistors ( 406, 408, 410 , and 412 ) functioning as strain gauges and is extended to the proximity of a bondin…
Who is the assignee on this patent?
Rohm Co Ltd
What technology area does this patent fall under?
Primary CPC classification G01L9/0051. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 14 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).