Photodiode and method for producing the same, photodiode array, spectrophotometer and solid-state imaging device

US9568364B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9568364-B2
Application numberUS-201514937095-A
CountryUS
Kind codeB2
Filing dateNov 10, 2015
Priority dateJun 7, 2011
Publication dateFeb 14, 2017
Grant dateFeb 14, 2017

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Abstract

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Provided is a photodiode having a high-concentration layer on its surface, in which the high-concentration layer is formed so that the thickness of a non-depleted region is larger than the roughness of an interface between silicon and an insulation film layer, and is smaller than a penetration depth of ultraviolet light.

First claim

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The invention claimed is: 1. A signal processing method for performing a signal processing based on a signal output from a photodiode depending on photocharges generated in the photodiode by a light illumination, comprising: performing a signal processing using a photodiode based on a signal output from the photodiode, wherein the photodiode includes a semiconductor layer made of silicon and an insulator layer in contact with the semiconductor layer, wherein the semiconductor layer is provided with a first-conduction-type region and a second-conduction-type region located between the first-conduction-type region and an interface between the semiconductor layer and the insulator layer, the second-conduction-type region having a polarity opposite to the first-conduction-type region, and wherein a thickness of a non-depleted region of the second-conduction-type region is larger than roughness of the interface, and is smaller than a penetration depth of ultraviolet light at which an intensity of the ultraviolet light in a wavelength range of 200-320 nm entering the semiconductor layer is equal to 1/e times the intensity of the same ultraviolet light at an outermost surface of the semiconductor layer. 2. The signal processing method according to claim 1 , wherein the signal processing is performed by a signal processing apparatus comprising: a photodiode array comprising a plurality of pixels arranged in the form of a one-dimensional array or a two-dimensional array, one of the plurality of pixels including the photodiode; and a means for scanning a signal from each of the plurality of pixels by predetermined procedures. 3. The signal processing method according to claim 2 , wherein the signal is an image signal. 4. The signal processing method according to claim 2 , wherein a light entering the photodiode array is dispersed in advance by a means for dispersing.

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What does patent US9568364B2 cover?
Provided is a photodiode having a high-concentration layer on its surface, in which the high-concentration layer is formed so that the thickness of a non-depleted region is larger than the roughness of an interface between silicon and an insulation film layer, and is smaller than a penetration depth of ultraviolet light.
Who is the assignee on this patent?
Univ Tohoku
What technology area does this patent fall under?
Primary CPC classification G01J3/2803. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 14 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).