Method for making metal nanowires film

Patent metadata

Field	Value
Publication number	US-9567257-B2
Application number	US-201514967335-A
Country	US
Kind code	B2
Filing date	Dec 13, 2015
Priority date	May 21, 2015
Publication date	Feb 14, 2017
Grant date	Feb 14, 2017

Abstract

The disclosure relates to a method for making a metal nanowire film. The method includes applying a metal layer on a substrate; placing a carbon nanotube composite structure on the metal layer, wherein the carbon nanotube composite structure defines a number of openings and parts of the metal layer are exposed by the number of openings; dry etching the metal layer using the carbon nanotube composite structure as a mask; and removing the carbon nanotube composite structure. The carbon nanotube composite structure includes a carbon nanotube structure and a protective layer coated on the carbon nanotube structure. The carbon nanotube structure includes a number of carbon nanotubes arranged substantially along the same direction.

First claim

What is claimed is:

1. A method for making a metal nanowire film, the method comprising:
providing a substrate having a first surface, and applying a metal layer on the first surface, wherein the metal layer has a metal layer surface spaced from the first surface;
providing a carbon nanotube composite structure, wherein the carbon nanotube composite structure defines a plurality of openings and comprises a carbon nanotube structure and a protective layer, coated on the carbon nanotube structure; and the carbon nanotube structure comprises a plurality of carbon nanotubes arranged substantially along the same direction;
placing the carbon nanotube composite structure on the metal layer surface, wherein parts of the metal layer are exposed by the plurality of openings;
dry etching the metal layer using the carbon nanotube composite structure as a mask; and
removing the carbon nanotube composite structure.

2. The method of claim 1 , wherein the carbon nanotube structure comprises a first carbon nanotube film and a second carbon nanotube film stacked with each other.

3. The method of claim 2 , wherein the first carbon nanotube film comprises a plurality of first carbon nanotubes that are joined end-to-end by van der Waals attractive force therebetween and substantially arranged along the same first direction; the second carbon nanotube film comprises a plurality of second carbon nanotubes that are joined end-to-end by van der Waals attractive force therebetween and substantially arranged along the same second direction; and the second direction is different from the first direction.

4. The method of claim 1 , wherein the carbon nanotube structure comprises a plurality of carbon nanotube wires parallel with and spaced from each other.

5. The method of claim 1 , wherein the providing the carbon nanotube composite structure comprises suspending the carbon nanotube structure and applying the protective layer on the carbon nanotube structure.

6. The method of claim 5 , wherein each of the plurality of carbon nanotubes is fully enclosed by the protective layer.

7. The method of claim 5 , wherein the providing the carbon nanotube composite structure further comprises scanning the carbon nanotube structure along a length direction of the plurality of carbon nanotubes by a laser.

8. The method of claim 7 , wherein a power density of the laser is greater than 0.053×10 12 watts per square meter; the laser is focused on the carbon nanotube structure to form a laser spot, a diameter of the laser spot is in a range from about 10 micrometers to about 100 micrometers.

9. The method of claim 1 , wherein a thickness of the protective layer is in a range from about 3 nanometers to about 50 nanometers.

10. The method of claim 9 , wherein the thickness of the protective layer is in a range from about 3 nanometers to about 20 nanometers.

11. The method of claim 1 , wherein the protective layer comprises a material selected from the group consisting of metal, metal oxide, metal nitride, metal carbide, metal sulfide, silicon oxide, silicon nitride, and silicon carbide.

12. The method of claim 1 , wherein the dry etching is plasma etching or reactive ion etching.

13. The method of claim 1 , wherein the removing the carbon nanotube composite structure comprises ultrasonic treating, adhesive tape peeling, or oxidation.

14. The method of claim 1 , wherein the substrate comprises material selected from the group consisting of silicon wafer, ceramic, glass, quartz, diamond, metal oxide, and polymer.

15. The method of claim 1 , wherein a material of the metal layer is elected from the group consisting of gold, silver, copper, iron, aluminum, nickel or chromium.

Assignees

• Univ Tsinghua
• Hon Hai Prec Ind Co Ltd

Inventors

• Jin Yuan-Hao
• Li Qun-Qing
• Fan Shou-Shan

Classifications

• G06F2203/04103

  Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices · CPC title

• G06F3/047

  using sets of wires, e.g. crossed wires · CPC title

• H05K1/0274

  Optical details, e.g. printed circuits comprising integral optical means (H05K1/0269 takes precedence; coupling light guides with opto-electronic components G02B6/42) · CPC title

• C03C2218/33

  by etching · CPC title

• H05K2201/0323

  Carbon · CPC title