Surface nanoreplication using polymer nanomasks

Patent metadata

Field	Value
Publication number	US-9566609-B2
Application number	US-201313748827-A
Country	US
Kind code	B2
Filing date	Jan 24, 2013
Priority date	Jan 24, 2013
Publication date	Feb 14, 2017
Grant date	Feb 14, 2017

Abstract

Methods for replicating a nanopillared surface include applying a nanopillar-forming material to a surface of a replica substrate to form a precursor layer on the replica-substrate surface. A template surface of a nanomask may be contacted to the precursor layer. The nanomask may include a self-assembled polymer layer on a nanomask-substrate surface, the template surface being defined in the self-assembled polymer layer. The self-assembled polymer layer may have nano-sized pores with openings at the template surface. The precursor layer may be cured while the template surface remains in contact with the precursor layer. The nanomask is removed to expose a nanopillared surface having a plurality of nanopillars on the replica-substrate surface. The nanopillars on the replica-substrate surface may correspond to the pores in the template surface. Nanopillared surfaces may be replicated on one side of the replica substrate or on two opposing sides of the replica substrate.

First claim

What is claimed is:

1. A method for fabricating a nanopillared surface, the method comprising:
providing a nanomask prepared by:
applying a polymer solution to a nanomask-substrate surface of a nanomask substrate, the polymer solution containing:
an amphiphilic block copolymer having hydrophobic blocks and hydrophilic blocks, the hydrophobic blocks having a number-average molecular weight of from about 100,000 Dalton to about 500,000 Dalton;
a hydrophilic homopolymer that is chemically compatible with the hydrophilic blocks of the amphiphilic block copolymer; and
an application solvent;

evaporating the application solvent to form a self-assembled polymer layer defining a template surface opposite the nanomask substrate surface, the self-assembled polymer layer having hydrophobic domains adjacent to the nanomask substrate surface and hydrophilic domains extending into the self-assembled polymer layer from the template surface; and
removing at least a portion of the hydrophilic domains to form a plurality of pores in the self-assembled polymer layer having openings at the template surface;

applying a nanopillar-forming material to at least one replica-substrate surface of a replica substrate to form a precursor layer on the replica-substrate surface;
pressing the template surface of the nanomask onto the precursor layer;
curing the precursor layer while the template surface remains in contact with the precursor layer to form a cured precursor layer between the template surface and the replica-substrate surface; and
removing the nanomask to expose a nanopillared surface comprising a plurality of nanopillars on the replica-substrate surface, the plurality of nanopillars on the replica-substrate surface corresponding to the plurality of pores in the template surface.

2. The method of claim 1 , wherein the nanopillar-forming material is perfluoroethertetraacrylate combined with a photoinitiator.

3. The method of claim 1 , wherein at least one of the nanomask substrate and the replica substrate is glass.

4. The method of claim 1 , wherein the replica substrate is glass and the nanopillar-forming material is a polydimethylsiloxane or perfluoroethertetraacrylate.

5. The method of claim 1 , wherein the nanopillar-forming material is a UV-curable polymer and curing the precursor layer comprises exposing the precursor layer to UV radiation.

6. The method of claim 1 , wherein the plurality of pores in the template surface have a mean pore diameter from about 100 nm to about 200 nm.

7. The method of claim 1 , wherein the plurality of nanopillars have nanopillar heights from about 50 nm to about 150 nm.

8. The method of claim 1 , wherein the weight ratio of the amphiphilic block copolymer to the hydrophilic homopolymer in the polymer solution is from about 1:1 to about 10:1.

9. The method of claim 1 , wherein the amphiphilic block copolymer and the hydrophilic homopolymer have polydispersity indices of from 1.00 to about 1.20.

10. The method of claim 1 , wherein the amphiphilic block copolymer comprises a PS-b-PEO block copolymer having polystyrene hydrophobic blocks and polyethylene oxide hydrophilic blocks.

11. The method of claim 1 , wherein the hydrophilic homopolymer comprises poly(acrylic acid).

12. The method of claim 1 , wherein: the amphiphilic block copolymer comprises a PS-b-PEO block copolymer comprising polystyrene hydrophobic blocks and polyethylene oxide hydrophilic blocks; and the hydrophilic homopolymer comprises poly(acrylic acid).

13. The method of claim 12 , wherein the application solvent comprises tetrahydrofuran.

14. A method for fabricating a nanopillared glass substrate surface having antismudge or antireflective properties, the method comprising:
providing a nanomask prepared by:
applying a polymer solution to a nanomask-substrate surface of a nanomask substrate, the polymer solution containing:
a PS-b-PEO block copolymer having polystyrene hydrophobic blocks and polyethylene oxide hydrophilic blocks, the polystyrene hydrophobic blocks having a number-average molecular weight from 100,000 Dalton to 500,000 Dalton;
a poly(acrylic acid) homopolymer having a number-average molecular weight of from 2000 Dalton to 30,000 Dalton; and
an application solvent;

evaporating the application solvent to form a self-assembled polymer layer defining a template surface opposite the nanomask substrate surface, the self-assembled polymer layer having hydrophobic domains adjacent to the nanomask substrate surface and hydrophilic domains extending into the self-assembled polymer layer from the template surface;
removing at least a portion of the hydrophilic domains to form a plurality of pores in the self-assembled polymer layer having openings at the template surface;

applying a nanopillar-forming material to at least one substrate surface of a glass substrate to form a precursor layer on the substrate surface, the nanopillar-forming material comprising a polydimethylsiloxane or a perfluoroethertetraacrylate;
pressing the template surface of the nanomask onto the precursor layer;
curing the precursor layer while the template surface remains in contact with the precursor layer to form a cured precursor layer between the template surface and the substrate surface; and
removing the nanomask to expose a nanopillared surface comprising a plurality of nanopillars on the substrate surface that impart antismudge or antireflective properties to the substrate surface, the plurality of nanopillars on the substrate surface corresponding to the plurality of pores in the template surface.

15. The method of claim 14 , wherein the nanopillared surface exhibits a water contact angle greater than 110°.

16. The method of claim 14 , wherein the PS-b-PEO block copolymer comprises from 60 wt. % to 98 wt. % polystyrene hydrophobic blocks and from 2 wt. % to 40 wt. % polyethylene oxide hydrophilic blocks, based on the total weight of the PS-b-PEO block copolymer.

17. The method of claim 14 , wherein: the plurality of pores in the template surface have a mean pore diameter from about 100 nm to about 200 nm; and the plurality of nanopillars have nanopillar heights from about 50 nm to about 150 nm.

Assignees

• Lyon Jennifer Lynn
• Wang Jianguo
• Yongsunthon Ruchirej
• Zhang Ying
• Corning Inc

Inventors

• Lyon Jennifer Lynn
• Wang Jianguo
• Yongsunthon Ruchirej
• Zhang Ying

Classifications

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• B05D5/00 Primary

  Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title