Elastic wave device

US9564873B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9564873-B2
Application numberUS-201414170883-A
CountryUS
Kind codeB2
Filing dateFeb 3, 2014
Priority dateAug 8, 2011
Publication dateFeb 7, 2017
Grant dateFeb 7, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An elastic wave device making use of an SH plate wave propagating in LiNbO 3 substrates includes a LiNbO 3 substrate, IDT electrodes located on at least one surface of the LiNbO 3 substrate, and a support which is bonded to the LiNbO 3 substrate such that the support is located outside a region provided with the IDT electrodes and supports the LiNbO 3 substrate, wherein θ of the Euler angles (0°, θ, 0°) of the LiNbO 3 substrate ranges from about 92° to about 138° and the thickness of the LiNbO 3 substrate ranges from about 0.05λ to about 0.25λ, where λ is the wavelength determined by the pitch between electrode fingers of the IDT electrodes.

First claim

Opening claim text (preview).

What is claimed is: 1. An elastic wave device comprising: a LiNbO 3 substrate; an IDT electrode located on at least one surface of the LiNbO 3 substrate; and a support arranged on the LiNbO 3 substrate such that the support is located outside a region provided with the IDT electrode and supports the LiNbO 3 substrate; wherein an elastic wave propagating in the LiNbO 3 substrate is an SH plate wave; and θ of Euler angles (0°, θ, 0°) of the LiNbO 3 substrate ranges from about 92° to about 138° and a thickness of the LiNbO 3 substrate ranges from about 0.05λ to about 0.25λ, where λ is a wavelength determined by a pitch between electrode fingers of the IDT electrode. 2. The elastic wave device according to claim 1 , wherein the IDT electrode is made of a metal containing one of a plurality of metals shown in Table 1 below as a major component and have a thickness within a range specified in Table 1 depending on a type of the metal: TABLE 1 Thickness of IDT electrode Pt More than 0 to 0.083λ or less Au More than 0 to 0.055λ or less Cu More than 0 to 0.11λ or less Ni More than 0 to 0.16λ or less Al More than 0 to 0.135λ or less. 3. The elastic wave device according to claim 1 , wherein the IDT electrode is made of a metal containing one of a plurality of metals shown in Table 2 below as a major component and a duty is within a range specified in Table 2 depending on a type of the metal: TABLE 2 Duty Pt 0.105 to 0.62 Au 0.105 to 0.585 Cu 0.11 to 0.645 Ni 0.11 to 0.655 Al 0.115 to 0.63. 4. The elastic wave device according to claim 2 , wherein the IDT electrode is made of a metal containing one of a plurality of metals shown in Table 2 below as a major component and a duty is within a range specified in Table 2 depending on a type of the metal: TABLE 2 Duty Pt 0.105 to 0.62 Au 0.105 to 0.585 Cu 0.11 to 0.645 Ni 0.11 to 0.655 Al 0.115 to 0.63. 5. The elastic wave device according to claim 1 , wherein the IDT electrode is located on both surfaces of the LiNbO 3 substrate, the IDT electrode is made of a metal containing one of a plurality of metals shown in Table 3 below as a major component, and a thickness of the IDT electrode is within a range specified in Table 3 depending on a type of the metal: TABLE 3 Metal making Thickness of single-side IDT up electrode electrodes Pt More than 0 to 0.14λ or less Au More than 0 to 0.067λ or less Cu More than 0 to 0.145λ or less Ni 0.002λ to 0.20λ Al More than 0 to 0.125λ or less. 6. The elastic wave device according to claim 1 , wherein the IDT electrode is located on both surfaces of the LiNbO 3 substrate and a duty of the IDT electrode is within a range specified in Table 4 below depending on a type of a metal making up the IDT electrode: TABLE 4 Metal making up electrode Duty Pt 0.018 to 0.547 Au 0.018 to 0.523

Assignees

Inventors

Classifications

  • of lithium niobate or lithium-tantalate substrates · CPC title

  • Guided bulk acoustic wave devices or Lamb wave devices having interdigital transducers situated in parallel planes on either side of a piezoelectric layer · CPC title

  • Constructional features of resonators using surface acoustic waves {(devices for manipulating acoustic surface waves in general G10K11/36)} · CPC title

  • Details of bus bars, contact pads or other electrical connections for finger electrodes · CPC title

  • Membranes · CPC title

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What does patent US9564873B2 cover?
An elastic wave device making use of an SH plate wave propagating in LiNbO 3 substrates includes a LiNbO 3 substrate, IDT electrodes located on at least one surface of the LiNbO 3 substrate, and a support which is bonded to the LiNbO 3 substrate such that the support is located outside a region provided with the IDT electrodes and supports the LiNbO 3 substrate, wherein θ of the Euler angl…
Who is the assignee on this patent?
Murata Manufacturing Co
What technology area does this patent fall under?
Primary CPC classification H03H9/02559. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 07 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).