Electrode Structure with Corrosion Resistance and Power Durability
US-2024429889-A1 · Dec 26, 2024 · US
US9564873B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9564873-B2 |
| Application number | US-201414170883-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 3, 2014 |
| Priority date | Aug 8, 2011 |
| Publication date | Feb 7, 2017 |
| Grant date | Feb 7, 2017 |
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An elastic wave device making use of an SH plate wave propagating in LiNbO 3 substrates includes a LiNbO 3 substrate, IDT electrodes located on at least one surface of the LiNbO 3 substrate, and a support which is bonded to the LiNbO 3 substrate such that the support is located outside a region provided with the IDT electrodes and supports the LiNbO 3 substrate, wherein θ of the Euler angles (0°, θ, 0°) of the LiNbO 3 substrate ranges from about 92° to about 138° and the thickness of the LiNbO 3 substrate ranges from about 0.05λ to about 0.25λ, where λ is the wavelength determined by the pitch between electrode fingers of the IDT electrodes.
Opening claim text (preview).
What is claimed is: 1. An elastic wave device comprising: a LiNbO 3 substrate; an IDT electrode located on at least one surface of the LiNbO 3 substrate; and a support arranged on the LiNbO 3 substrate such that the support is located outside a region provided with the IDT electrode and supports the LiNbO 3 substrate; wherein an elastic wave propagating in the LiNbO 3 substrate is an SH plate wave; and θ of Euler angles (0°, θ, 0°) of the LiNbO 3 substrate ranges from about 92° to about 138° and a thickness of the LiNbO 3 substrate ranges from about 0.05λ to about 0.25λ, where λ is a wavelength determined by a pitch between electrode fingers of the IDT electrode. 2. The elastic wave device according to claim 1 , wherein the IDT electrode is made of a metal containing one of a plurality of metals shown in Table 1 below as a major component and have a thickness within a range specified in Table 1 depending on a type of the metal: TABLE 1 Thickness of IDT electrode Pt More than 0 to 0.083λ or less Au More than 0 to 0.055λ or less Cu More than 0 to 0.11λ or less Ni More than 0 to 0.16λ or less Al More than 0 to 0.135λ or less. 3. The elastic wave device according to claim 1 , wherein the IDT electrode is made of a metal containing one of a plurality of metals shown in Table 2 below as a major component and a duty is within a range specified in Table 2 depending on a type of the metal: TABLE 2 Duty Pt 0.105 to 0.62 Au 0.105 to 0.585 Cu 0.11 to 0.645 Ni 0.11 to 0.655 Al 0.115 to 0.63. 4. The elastic wave device according to claim 2 , wherein the IDT electrode is made of a metal containing one of a plurality of metals shown in Table 2 below as a major component and a duty is within a range specified in Table 2 depending on a type of the metal: TABLE 2 Duty Pt 0.105 to 0.62 Au 0.105 to 0.585 Cu 0.11 to 0.645 Ni 0.11 to 0.655 Al 0.115 to 0.63. 5. The elastic wave device according to claim 1 , wherein the IDT electrode is located on both surfaces of the LiNbO 3 substrate, the IDT electrode is made of a metal containing one of a plurality of metals shown in Table 3 below as a major component, and a thickness of the IDT electrode is within a range specified in Table 3 depending on a type of the metal: TABLE 3 Metal making Thickness of single-side IDT up electrode electrodes Pt More than 0 to 0.14λ or less Au More than 0 to 0.067λ or less Cu More than 0 to 0.145λ or less Ni 0.002λ to 0.20λ Al More than 0 to 0.125λ or less. 6. The elastic wave device according to claim 1 , wherein the IDT electrode is located on both surfaces of the LiNbO 3 substrate and a duty of the IDT electrode is within a range specified in Table 4 below depending on a type of a metal making up the IDT electrode: TABLE 4 Metal making up electrode Duty Pt 0.018 to 0.547 Au 0.018 to 0.523
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