Plasma treatment apparatus and plasma antenna

Patent metadata

Field	Value
Publication number	US-9564294-B2
Application number	US-200913126042-A
Country	US
Kind code	B2
Filing date	Oct 26, 2009
Priority date	Nov 3, 2008
Publication date	Feb 7, 2017
Grant date	Feb 7, 2017

Abstract

According to one embodiment of the present invention, a plasma treatment apparatus comprises: a chamber having an inner space in which processes for an object to be treated are performed; and an antenna which is arranged to cover the side part of the chamber, and which forms electric fields in said inner space to generate plasma from the source gas supplied in the inner space. The antenna includes a helical antenna which is formed into a helical shape from one side of the chamber toward the other side of the chamber along a first rotation direction, and which has a current flowing in the first rotation direction; an extension antenna which is connected to one end of the helical antenna positioned at said one side of the chamber, and which has a current flowing in the direction opposite to the first rotation direction; and a connection antenna for interconnecting the extension antenna and the helical antenna.

First claim

The invention claimed is:

1. A plasma treatment apparatus comprising:
a chamber including
a process chamber in which a substrate is processed, and
a generating chamber disposed on a top of the process chamber, in which a plasma is generated from a source gas supplied into an inner space of the generating chamber; and

an antenna disposed outside the generating chamber and forming electric fields for generating the plasma, the antenna including
a helical antenna having a helical shape and winding an outer circumference of the generating chamber more than one turn from a lower side of the generating chamber toward an upper side of the generating chamber along a first rotation direction, the more than one turn of helical antenna having the same radius of curvature through the lower side and the upper side, the helical antenna having a first end disposed in the lower side of the generating chamber and a second end disposed in the upper side of the generating chamber and having a current flowing in the first rotation direction,
a first connection antenna connected to the first end of the helical antenna and extending outwardly from the first end of the helical antenna,
a second connection antenna connected to the second end of the helical antenna and extending outwardly from the second end of the helical antenna,
an extension antenna extending from the first connection antenna and disposed farther away from the inner space of the generating chamber than the helical antenna and in a height corresponding to the lower side end of the helical antenna, the extension antenna having a shorter length than that of the helical antenna and being formed such that the current flows in a second direction opposite to the first rotation direction,
an input antenna extending from the extension antenna for supplying the current and disposed farther away from the inner space of the generating chamber than the helical antenna, wherein the input antenna is connected to the first end of the helical antenna through the first connection antenna and the extension antenna, and
an output antenna connected to the second connection antenna and disposed farther away from the inner space of the generating chamber than the helical antenna,
wherein the extension antenna is formed in a circular arc shape and has a radius of curvature greater than that of the helical antenna.

2. A plasma antenna forming an electric field to generate plasma from a source gas, the plasma antenna comprising:
a helical antenna having in a helical shape and winding an outer circumference of a generating chamber more than one turn from a lower side of the generating chamber toward an upper side of the generating chamber along a first rotation direction, the more than one turn of helical antenna having the same radius of curvature through the lower side and the upper side, the helical antenna having a first end disposed in the lower side of the generating chamber and a second end disposed in the upper side of the generating chamber and having a current flowing in the first rotation direction;
a first connection antenna connected to the first end of the helical antenna and extending outwardly from the first end of the helical antenna;
a second connection antenna connected to the second end of the helical antenna and extending outwardly from the second end of the helical antenna;
an extension antenna extending from the first connection antenna and disposed farther away from the inner space of the generating chamber than the helical antenna and in a height corresponding to the lower side end of the helical antenna, the extension antenna having a shorter length than that of the helical antenna and being formed such that the current flows in a second direction opposite to the first rotation direction;
an input antenna extending from the extension antenna for supplying the current and disposed farther away from the inner space of the generating chamber than the helical antenna, wherein the input antenna is connected to the first end of the helical antenna through the first connection antenna and the extension antenna; and
an output antenna connected to the second connection antenna and disposed farther away from the inner space of the generating chamber than the helical antenna,
wherein the extension antenna is formed in a circular arc shape and has a radius of curvature greater than that of the helical antenna.

Assignees

• Woo Sang Ho
• Yang Il Kwang
• Song Byung Gyu
• Eugene Technology Co Ltd

Inventors

• Woo Sang Ho
• Yang Il Kwang
• Song Byung Gyu

Classifications

• H01J37/3211 Primary

  Antennas, e.g. particular shapes of coils · CPC title

• H01J37/321

  the radio frequency energy being inductively coupled to the plasma · CPC title

• H05H1/46

  using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title

• H05H1/4652

  using inductive coupling means, e.g. coils · CPC title