Resist composition and method for producing resist pattern

Patent metadata

Field	Value
Publication number	US-9563125-B2
Application number	US-201514950212-A
Country	US
Kind code	B2
Filing date	Nov 24, 2015
Priority date	Nov 26, 2014
Publication date	Feb 7, 2017
Grant date	Feb 7, 2017

Abstract

A non-ionic compound includes a group represented by formula (Ia):

wherein R 2 represents a group having a C 5 to C 18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf 1 and Rf 2 each independently represent a C 1 to C 4 perfluoroalkyl group, and * represents a binding site.

First claim

What is claimed is:

1. A resist composition comprising
a resin (X) selected from the group consisting of a resin which consists of a structural unit derived from a compound represented by formula (I0) and a resin which comprises a structural unit derived from a compound represented by formula (I0) and a structural unit represented by formula (a5-1) or formula (a4-0);
a resin having an acid-labile group; and
an acid generator:

wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that may have a halogen atom,
R 2 represents a C 1 to C 18 linear or branched aliphatic hydrocarbon group,
Rf 1 and Rf 2 each independently represent a C 1 to C 4 perfluoroalkyl group,
A 1 represents a single bond, a C 1 to C 6 alkanediyl group or *-A 2 -X 1 -(A 3 -X 2 ) a -(A 4 ) b -,
* represents a binding site to an oxygen atom,
A 2 , A 3 and A 4 each independently represent a C 1 to C 6 alkanediyl group,
X 1 and X 2 each independently represent —O—, —CO—O— or —O—CO—,
a represents 0 or 1, and
b represents 0 or 1;

wherein R 51 represents a hydrogen atom or a methyl group,
L 51 represents a single bond or a C 1 to C 18 divalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and
R 52 represents a C 3 to C 18 alicyclic hydrocarbon group where a hydrogen atom may be replaced by a C 1 to C 8 aliphatic hydrocarbon group or a hydroxy group, provided that the carbon atom directly bonded to L 51 has no C 1 to C 8 aliphatic hydrocarbon group by which a hydrogen atom has been replaced;

wherein R 5 represents a hydrogen atom or a methyl group,
L 5 represents a single bond or a C 1 to C 4 saturated aliphatic hydrocarbon group,
L 3 represents a C 1 to C 8 linear perfluoroalkanediyl group or a C 3 to C 12 perfluorocycloalkanediyl group, and
R 6 represents a hydrogen atom or a fluorine atom.

2. The resist composition according to claim 1 wherein
the resin (X) is a resin which consists of a structural unit derived from a compound represented by formula (I0).

3. The resist composition according to claim 1 wherein
the resin (X) is a resin which comprises a structural unit derived from a compound represented by formula (I0) and a structural unit represented by formula (a5-1) or formula (a4-0).

4. The resist composition according to claim 1 wherein
the resin (X) is a resin which comprises a structural unit derived from a compound represented by formula (I0) and a structural unit represented by formula (a5-1).

5. The resist composition according to claim 1 , wherein
A 1 is a C 1 to C 6 alkanediyl group or *-A 2 -O—CO—.

6. The resist composition according to claim 1 , further comprising a salt which generates an acid weaker in acidity than an acid generated from the acid generator.

7. A method for producing a resist pattern comprising steps (1) to (5);
(1) applying the resist composition according to claim 1 onto a substrate;
(2) drying the applied composition to form a composition layer;
(3) exposing the composition layer;
(4) heating the exposed composition layer, and
(5) developing the heated composition layer.

Assignees

• Sumitomo Chemical Co

Inventors

• Masuyama Tatsuro
• Mukai Yuichi
• Ichikawa Koji

Classifications

• H10P76/2041

  Photolithographic processes · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title

• G03F7/0395

  the macromolecular compound having a backbone with alicyclic moieties · CPC title

• G03F7/168

  Finishing the coated layer, e.g. drying, baking, soaking · CPC title

• G03F7/0392

  the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title