Chemically amplified positive resist composition and resist pattern forming process
US-12164231-B2 · Dec 10, 2024 · US
Photoresist composition, compound and process of producing photoresist pattern
US9563123B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9563123-B2 |
| Application number | US-201514635718-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 2, 2015 |
| Priority date | Mar 3, 2014 |
| Publication date | Feb 7, 2017 |
| Grant date | Feb 7, 2017 |
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- Title
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Abstract
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A photoresist composition comprising: a resin having an acid-labile group, an acid generator, and a compound represented by formula (I): wherein R 1 , R 2 and R 3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur atom or a carbonyl group.
First claim
Opening claim text (preview).
What is claimed is: 1. A photoresist composition comprising: a resin having an acid-labile group, an-acid-generator, and a compound represented by formula (I): wherein R 1 , R 2 and R 3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur atom or a carbonyl group. 2. The photoresist composition according to claim 1 wherein R 1 is a group represented by R 4 —CO—O—* where * represents a binding site to I, R 4 represents a C1-C22 hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group and in which a hydrogen atom can be replaced by a hydroxyl group, a halogen atom or a nitro group. 3. The photoresist composition according to claim 1 wherein R 2 is a C6-C24 aromatic hydrocarbon group in which a hydrogen atom can be replaced by a substituent. 4. The photoresist composition according to claim 1 which further comprises an onium carboxylic acid salt. 5. The photoresist composition according to claim 4 wherein the onium salt is a salt represented by formula (D): in which R D1 and R D2 respectively represent a C1-C12 monovalent hydrocarbon group, a C1-C6 alkoxy group, a C2-C7 acyl group, a C2-C7 acyloxy group, a C2-C7 alkoxycarbonyl group, a nitro group or a halogen atom, and the symbols m′ and n′ each independently represent an integer of 0 to 4.
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Classifications
condensed with carbocyclic rings or ring systems · CPC title
the macromolecular compound having an alicyclic moiety in a side chain · CPC title
- G03F7/0045Primary
with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title
The ring being saturated · CPC title
- G03F7/0392Primary
the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title
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- What does patent US9563123B2 cover?
- A photoresist composition comprising: a resin having an acid-labile group, an acid generator, and a compound represented by formula (I): wherein R 1 , R 2 and R 3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur ato…
- Who is the assignee on this patent?
- Sumitomo Chemical Co
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0045. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 07 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).