Shock sensor with latch mechanism and method of shock detection

US9562825B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9562825-B2
Application numberUS-201414535960-A
CountryUS
Kind codeB2
Filing dateNov 7, 2014
Priority dateNov 7, 2014
Publication dateFeb 7, 2017
Grant dateFeb 7, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A micromechanical shock sensor includes a proof mass coupled to a surface of a substrate and a projection element extending laterally from the proof mass. The shock sensor further includes a latch mechanism and a retention anchor. The latch mechanism has a latch spring attached to the surface and a latch tip extending from a movable end of the latch spring. The retention anchor is attached to the surface and is located proximate the latch tip. The proof mass is configured for planar movement relative to the substrate when the proof mass is subjected to a force of at least a threshold magnitude. Movement of the proof mass in response to the force causes the latch tip to become retained between the projection element and the retention anchor to place the shock sensor in a latched state. The latched state may be detected by optical inspection, probe, or external readout.

First claim

Opening claim text (preview).

What is claimed is: 1. A micromechanical shock sensor comprising: a proof mass coupled to a surface of a substrate and configured for planar movement relative to said substrate when said proof mass is subjected to a force of at least a threshold magnitude; a projection element extending laterally from said proof mass; a latch mechanism having a latch spring attached to said surface and a latch tip extending from a movable end of said latch spring, wherein said latch spring comprises: a spring anchor attached to said surface of said substrate; a first beam structure having a first end coupled to said spring anchor; and a second beam structure, said first and second beam structures being suspended above said surface of said substrate, said second beam structure having a third end coupled to a second end of said first beam structure, said second beam structure being arranged approximately orthogonal to said first beam structure, and said latch tip being formed on a fourth end of said second beam structure, and wherein said fourth end is said movable end; and a retention anchor attached to said surface and located proximate said latch tip, wherein movement of said proof mass in response to said force causes said latch tip to become retained between said projection element and said retention anchor to place said shock sensor in a latched state. 2. The micromechanical shock sensor of claim 1 wherein: said first beam structure is characterized by a first lengthwise dimension that is arranged approximately parallel to a direction of movement of said proof mass; and said second beam structure is characterized by a second lengthwise dimension that is arranged approximately perpendicular to said direction of movement of said proof mass, said first lengthwise dimension being greater than said second lengthwise dimension. 3. The micromechanical shock sensor of claim 1 wherein: said first beam structure is characterized by a first stiffness; and said second beam structure is characterized by a second stiffness, said second stiffness being greater than said first stiffness. 4. The micromechanical shock sensor of claim 1 wherein said latch mechanism further includes a mass element coupled to said first beam structure and suspended above said surface of said substrate. 5. The micromechanical shock sensor of claim 4 wherein said mass element is coupled to said first beam structure at a location that is distal from said second end of said first beam structure. 6. The micromechanical shock sensor of claim 1 wherein: said second beam structure is positioned adjacent to a first side of said retention anchor; and said latch tip extends laterally from said fourth end of said second beam structure so that said latch tip is positioned adjacent to a second side of said retention anchor when said shock sensor is in said latched state, said second side of said retention anchor facing said projection element. 7. The micromechanical shock sensor of claim 1 wherein: said projection element includes a first strike surface and a first latch surface opposing said first strike surface; and said latch tip includes a second strike surface and a second latch surface opposing said second strike surface, said second strike surface facing said first strike surface prior to movement of said proof mass, and said second latch surface abutting said first latch surface when said shock sensor is in said latched state. 8. The micromechanical shock sensor of claim 1 wherein said planar movement of said proof mass is in a first direction, said projection element is a first projection element, said latch mechanism is a first latch mechanism, said latch spring is a first latch spring, and said micromechanical shock sensor further comprises: a beam structure coupled to said substrate and configured for said planar movement relative to said substrate, said beam structure being adapted to move in a second direction when subjected to a second force; a second projection element extending laterally from said beam structure; a second latch mechanism having a second latch spring attached to said surface and a second latch tip extending from a second movable end of said second latch spring; and a second retention anchor attached to said surface and located proximate said second latch tip, wherein movement of said beam structure in said second direction in response to said second force causes said second latch tip to become retained between said second projection element and said second retention anchor. 9. The micromechanical shock sensor of claim 1 further comprising a plurality of projection elements extending from said proof mass, wherein when said proof mass moves in response to said force, said latch tip engages with one of said plurality of projection elements depending upon a magnitude of said force applied to said proof mass. 10. The micromechanical shock sensor of claim 1 further comprising an indicator for indicating that said shock sensor is in said latched state. 11. A micromechanical shock sensor comprising: a proof mass coupled to a surface of a substrate and configured for planar movement relative to said substrate when said proof mass is subjected to a force of at least a threshold magnitude; a projection element extending laterally from said proof mass, said projection element including a first strike surface and a first latch surface opposing said first strike surface; a latch mechanism having a latch spring attached to said surface and a latch tip extending from a movable end of said latch spring, said latch tip including a second strike surface and a second latch surface opposing said second strike surface, said second strike surface facing said first strike surface prior to movement of said proof mass; and a retention anchor attached to said surface and located proximate said latch tip, wherein movement of said proof mass in response to said force causes said latch tip to become retained between said projection element and said retention anchor to place said shock sensor in a latched state, and said second latch surface abuts said first latch surface when said shock sensor is in said latched state, wherein said second latch surface comprises an indent region and said first latch surface resides in said indent region when said shock sensor is in said latched state. 12. A micromechanical shock sensor comprising: a proof mass coupled to a surface of a substrate and configured for planar movement relative to said substrate when said proof mass is subjected to a force of at least a threshold magnitude; a first anchor attached to said surface of said substrate; a second anchor attached to said surface of said substrate, said first and second anchors being located on opposing sides of an axis of said proof mass, wherein said proof mass is configured to move in a first direction that is approximately orthogonal to said axis; a first spring attached between said first anchor and said proof mass; a second spring attached between said second anchor and said proof mass; a connector beam interconnecting said first spring with said second spring; a projection element extending laterally from said proof mass; a latch mechanism having a latch spring attached to said surface and a latch tip extending from a movable end of said latch spring; and a retention anchor attached to said surface and located proximate said latch tip, wherein movement of said proof mass in response to said force causes said latch tip to become retained between said projection element and said retention anchor to place said shock sensor in a latched state. 13. A micromechanical shock sensor com

Assignees

Inventors

Classifications

  • G01M7/08Primary

    Shock-testing · CPC title

  • for indicating predetermined acceleration values · CPC title

  • with indication of predetermined acceleration values (G01P15/135 takes precedence) · CPC title

  • by using non-electrical means · CPC title

  • G01P15/06Primary

    using members subjected to a permanent deformation · CPC title

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What does patent US9562825B2 cover?
A micromechanical shock sensor includes a proof mass coupled to a surface of a substrate and a projection element extending laterally from the proof mass. The shock sensor further includes a latch mechanism and a retention anchor. The latch mechanism has a latch spring attached to the surface and a latch tip extending from a movable end of the latch spring. The retention anchor is attached to t…
Who is the assignee on this patent?
Freescale Semiconductor Inc, Nxp Usa Inc
What technology area does this patent fall under?
Primary CPC classification G01M7/08. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 07 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).