Polyamide resin
US-12162985-B2 · Dec 10, 2024 · US
Xylylenediamine composition, and method for producing polyamide resin
US9562144B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9562144-B2 |
| Application number | US-201414648006-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 9, 2014 |
| Priority date | Apr 30, 2013 |
| Publication date | Feb 7, 2017 |
| Grant date | Feb 7, 2017 |
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Abstract
Official abstract text for this publication.
Provided are a xylylenediamine composition containing xylylenediamine and bis(methylbenzyl)amine, a content of the bis(methylbenzyl)amine being 0.0005 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and a method for producing a polyamide resin including the steps of introducing a diamine containing xylylenediamine, a dicarboxylic acid, and bis(methylbenzyl)amine in an amount of 0.0005 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine into a reaction system and performing a polycondensation reaction.
First claim
Opening claim text (preview).
The invention claimed is: 1. A xylylenediamine composition comprising xylylenediamine and bis(methylbenzyl)amine, a content of the bis(methylbenzyl)amine being 0.0005 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine. 2. The xylylenediamine composition according to claim 1 , wherein the xylylenediamine is m-xylylenediamine, p-xylylenediamine, or a mixture thereof. 3. The xylylenediamine composition according to claim 1 , wherein the xylylenediamine is m-xylylenediamine. 4. The xylylenediamine composition according to claim 1 , wherein a content of the xylylenediamine is 99.5% by mass or more. 5. The xylylenediamine composition according to claim 1 , which is used for a raw material for polyamide resin. 6. The xylylenediamine composition according to claim 1 , which is used for an epoxy resin curing agent. 7. A method for producing a polyamide resin comprising the steps of introducing a diamine containing xylylenediamine, a dicarboxylic acid, and bis(methylbenzyl)amine in an amount of 0.0005 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine into a reaction system and performing a polycondensation reaction. 8. The method for producing a polyamide resin according to claim 7 , wherein the dicarboxylic acid is at least one selected from the group consisting of an aliphatic dicarboxylic acid having 4 to 20 carbon atoms, terephthalic acid, and isophthalic acid. 9. The method for producing a polyamide resin according to claim 7 , wherein a content of the xylylenediamine in the diamine is 70 mol % or more, and a content of the aliphatic dicarboxylic acid having 4 to 20 carbon atoms in the dicarboxylic acid is 50 mol % or more. 10. The method for producing a polyamide resin according to claim 8 , wherein the aliphatic dicarboxylic acid having 4 to 20 carbon atoms is at least one selected from the group consisting of adipic acid and sebacic acid. 11. The method for producing a polyamide resin according to claim 7 , wherein the xylylenediamine is m-xylylenediamine, p-xylylenediamine, or a mixture thereof. 12. The method for producing a polyamide resin according to claim 7 , wherein the xylylenediamine is m-xylylenediamine. 13. The method for producing a polyamide resin according to claim 7 , further comprising the step of performing solid-phase polymerization.
Assignees
Inventors
Classifications
Polyamides derived from polyamines and polycarboxylic acids (C08L77/10 takes precedence) · CPC title
Preparatory processes · CPC title
- C08G69/265Primary
from at least two different diamines or at least two different dicarboxylic acids · CPC title
Amines · CPC title
Solid state polycondensation · CPC title
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- What does patent US9562144B2 cover?
- Provided are a xylylenediamine composition containing xylylenediamine and bis(methylbenzyl)amine, a content of the bis(methylbenzyl)amine being 0.0005 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and a method for producing a polyamide resin including the steps of introducing a diamine containing xylylenediamine, a dicarboxylic acid, and bis(methylbenzyl)amine in an am…
- Who is the assignee on this patent?
- Mitsubishi Gas Chemical Co
- What technology area does this patent fall under?
- Primary CPC classification C08G69/265. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 07 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).