Methods of forming block polymers for directed self-assembly

Patent metadata

Field	Value
Publication number	US-9562127-B2
Application number	US-201414280167-A
Country	US
Kind code	B2
Filing date	May 16, 2014
Priority date	May 16, 2014
Publication date	Feb 7, 2017
Grant date	Feb 7, 2017

Abstract

Block polymers are formed by ring opening polymerization (ROP) of a cyclic carbonate monomer using a polymeric initiator for the ROP that comprises repeating functionalized ethylene units. The block polymers are free of, or substantially free of, any polymer having a chemical structure that does not comprise the polymer backbone of the polymeric initiator. The block polymers are capable of directed self-assembly.

First claim

What is claimed is:

1. A method, comprising:
forming a reaction mixture for a ring opening polymerization (ROP), the reaction mixture comprising a cyclic carbonyl monomer, a polymeric initiator for the ROP, a ROP catalyst, and a solvent, wherein the polymeric initiator comprises i) a polymer backbone comprising repeating functionalized ethylene units and ii) 1 to 2 nucleophilic groups capable of initiating a ROP of the cyclic carbonyl monomer;
allowing the cyclic carbonyl monomer to polymerize by ROP until 85% or more of the cyclic carbonyl monomer is consumed, thereby forming a second mixture comprising an initial block polymer, wherein the initial block polymer comprises a first block linked to a second block, the first block comprising the polymer backbone comprising repeating functionalized ethylene units, the second block comprising a backbone derived from ROP of the cyclic carbonyl monomer, the first block substantially immiscible with the second block;
precipitating the initial block polymer from the second mixture by adding a solvent to the second mixture; fractionating the precipitated initial block polymer by a process comprising a) forming a solution of the precipitated initial block polymer in a minimal amount of a solvent capable of dissolving each block of the block polymer and b) combining the solution with a solvent mixture comprising i) a first solvent which is a non-solvent for the first block and a non-solvent for the second block, and ii) a second solvent comprising a nitrile group, the second solvent which is a non-solvent for the first block and a solvent for the second block, wherein the first solvent:second solvent volume ratio is about 40:60 to about 60:40, thereby precipitating a final block polymer that is free of, or substantially free of, any polymer having a chemical structure that contains none of the polymer backbone of the polymeric initiator, and wherein the final block copolymer is capable of self-assembly to form a phase separated domain pattern comprising alternating domains of the first block and the second block.

2. The method of claim 1 , wherein the cyclic carbonyl monomer is trimethylene carbonate.

3. The method of claim 1 , wherein the ROP is performed at ambient temperature.

4. The method of claim 1 , wherein the first solvent is an alcohol.

5. The method of claim 1 , wherein the second solvent is acetonitrile.

6. The method of claim 1 , wherein the polymeric initiator is a polystyrene comprising one hydroxy end group.

7. The method of claim 1 , wherein the block polymer is capable of self-assembly to form cylindrical domains of the second block in a matrix of the first block.

8. The method of claim 1 , wherein the block polymer is capable of self-assembly to form spherical domains of the second block in a matrix of the first block.

9. The method of claim 1 , wherein the block polymer is capable of self-assembly to form alternating lamellar domains of the first block and the second block.

10. A method of forming a layered structure, comprising:
forming a mixture comprising a solvent and the final block polymer formed by the method of claim 1 ;
applying the mixture to a pre-patterned surface of a substrate, thereby forming a first structure, the pre-patterned surface capable of guiding self-assembly of the final block polymer wherein self-assembly of the final block polymer comprises phase separation of a first block of the final block polymer from a second block of the final block polymer to form first domains comprising the first block and second domains comprising the second block, the first domains not being miscible with the second domains;
removing the solvent from the first structure, thereby forming a second structure comprising the final block polymer disposed on the surface of the substrate; and
allowing the final block polymer of the second structure to self-assemble, optionally assisted with heat, thereby forming the layered structure, the layered structure comprising the phase separated domain pattern of the self-assembled final block polymer, the domain pattern disposed on the pre-patterned surface.

11. The method of claim 10 , wherein the pre-patterned surface of the substrate comprises an underlayer comprising a copolymer derived from styrene, acrylonitrile, and glycidyl methacrylate.

12. The method of claim 10 , wherein the self-assembled final block polymer comprises an array of cylindrical domains of the second block in a matrix of the first block.

13. The method of claim 10 , wherein the self-assembled final block polymer comprises a linear array of alternating lamellar domains of the second block and the first block.

14. The method of claim 1 , wherein the cyclic carbonyl monomer is a cyclic carbonate.

15. The method of claim 1 , wherein the cyclic carbonyl monomer is TMC:

16. The method of claim 1 , wherein the cyclic carbonyl monomer is MTC-Me:

17. The method of claim 1 , wherein the cyclic carbonyl monomer is a cyclic ester.

18. The method of claim 1 , wherein the cyclic carbonyl monomer is lactide.

19. The method of claim 10 , wherein the final block copolymer is a diblock copolymer comprising a polystyrene block (first block) and a polycarbonate block (second block) formed by ring opening polymerization of MTC-Me.

20. The method of claim 10 , wherein the final block copolymer is a diblock copolymer comprising a polystyrene block (first block), and a polycarbonate block (second block) formed by ring opening polymerization of TMC.

21. The method of claim 10 , wherein the final block copolymer is a diblock copolymer comprising a polystyrene block (first block) and a polyester block (second block) formed by ring opening polymerization of lactide.

22. The method of claim 10 , wherein the pre-patterned surface is a topographic pre-pattern.

23. The method of claim 22 , wherein the topographic pattern is suitable for forming a pattern of lines by directed self-assembly of the final block copolymer.

24. The method of claim 22 , wherein the topographic pattern is suitable for forming a pattern of holes by directed self-assembly of the final block copolymer.

Assignees

• IBM

Inventors

• Cheng Joy
• Chunder Anindarupa
• Sanders Daniel P
• Tjio Melia
• Vora Ankit

Classifications

• C08F293/00 Primary

  Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule (on to polymers modified by introduction of unsaturated end groups C08F290/02) · CPC title

• C09D169/00

  Coating compositions based on polycarbonates; Coating compositions based on derivatives of polycarbonates · CPC title

• C08G64/30

  using carbonates · CPC title

• C08G64/18 Primary

  Block or graft polymers · CPC title

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title