Photocurable composition, barrier layer including same, and encapsulated device including same

Patent metadata

Field	Value
Publication number	US-9562123-B2
Application number	US-201314385920-A
Country	US
Kind code	B2
Filing date	Feb 22, 2013
Priority date	Jun 15, 2012
Publication date	Feb 7, 2017
Grant date	Feb 7, 2017

Abstract

The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer(A) and a silicon containing monomer(B), wherein the silicon containing monomers(B) has a structure according to Formula 1.

First claim

The invention claimed is:

1. A photocurable composition, comprising:
(A) a photocurable monomer; and
(B) a silicon containing monomer, wherein the (B) silicon containing monomer is represented by Formula 1:

wherein X 1 , X 2 , and X 3 are the same or different, and are independently O, S, NH, or NR′, R′ being an unsubstituted or substituted C1-C20 alkyl group;
R 1 , R 2 , and R 3 are the same or different, and are independently an unsubstituted or substituted C1-C30 alkyl group, an unsubstituted or substituted C1-C30 alkyl ether group, an unsubstituted or substituted C1-C30 monoalkylamine group or dialkylamine group, an unsubstituted or substituted C1-C30 monoalkylsulfide group or dialkylsulfide group, an unsubstituted or substituted C6-C30 aryl group, an unsubstituted or substituted C7-C30 arylalkyl group, an unsubstituted or substituted C1-C30 alkoxy group, or an unsubstituted or substituted C7-C30 arylalkoxy group;
Z 1 , Z 2 , and Z 3 are the same or different, and are independently hydrogen, an unsubstituted or substituted C1-C30 alkyl group, an unsubstituted or substituted C1-C30 alkyl ether group, an unsubstituted or substituted C1-C30 monoalkylamine group or dialkylamine group, an unsubstituted or substituted C1-C30 monoalkylsulfide group or dialkylsulfide group, an unsubstituted or substituted C6-C30 aryl group, an unsubstituted or substituted C7-C30 arylalkyl group, an unsubstituted or substituted C1-C30 alkoxy group, an unsubstituted or substituted C7-C30 arylalkoxy group, or a group represented by Formula 2:

wherein:
* represents a binding site for Si in Formula 1;
R 4 is hydrogen, or a substituted or unsubstituted C1-C30 alkyl group, R 5 is a substituted or unsubstituted C1-C30 alkylene group, a substituted or unsubstituted C6-C30 arylene group, a substituted or unsubstituted C7-C30 arylalkylene group, or a substituted or unsubstituted C1-C30 alkyleneoxy group;
n is an integer from 1 to 30;
at least one of Z 1 , Z 2 , and Z 3 is the group represented by Formula 2, and
the (A) photocurable monomer includes one or more of a (meth)acrylate having a C1-C20 alkyl group, a di(meth)acrylate of a C2-C20 diol, a tri(meth)acrylate of a C3-C20 triol, or a tetra(meth)acrylate of a C4-C20 tetraol,
the composition including about 60 to about 95 parts by weight of the (A) photocurable monomer and about 5 to about 40 parts by weight of the (B) silicon containing monomer based on 100 parts by weight of (A)+(B).

2. The photocurable composition according to claim 1 , wherein the (B) silicon containing monomer includes Formula 3, Formula 4, or a mixture thereof:

3. The photocurable composition according to claim 1 , wherein the photocurable monomer includes a monomer having 1 to about 30 substituted or unsubstituted vinyl groups, a monomer having 1 to about 30 substituted or unsubstituted acrylate groups, a monomer having 1 to about 30 substituted or unsubstituted methacrylate groups, or a mixture thereof.

4. The photocurable composition according to claim 1 , comprising:
about 1 to 99 parts by weight of the (A) photocurable monomer and about 1 to 99 parts by weight of the (B) silicon containing monomer based on 100 parts by weight of (A)+(B).

5. The photocurable composition according to claim 1 , further comprising:
(C) an initiator.

6. The photocurable composition according to claim 5 , wherein the (C) initiator comprises a photoinitiator.

7. The photocurable composition according to claim 5 , comprising:
about 1 part by weight to about 99 parts by weight of the (A) photocurable monomer and about 1 part by weight to about 99 parts by weight of the (B) silicon containing monomer based on 100 parts by weight of (A)+(B); and
about 0.1 parts by weight to about 20 parts by weight of the (C) initiator based on 100 parts by weight of (A)+(B).

8. A member for an apparatus encapsulated with the photocurable composition according to claim 1 .

9. An encapsulated apparatus, comprising:
a member for the apparatus and a barrier stack formed on the member for the apparatus, the barrier stack including an inorganic barrier layer and an organic barrier layer, the organic barrier layer having an outgas generation amount of about 1000 ppm or less and including a cured product of a photocurable composition, the photocurable composition including:
(A) a photocurable monomer; and
(B) a silicon containing monomer, wherein the (B) silicon containing monomer is represented by Formula 1:

wherein:
X 1 , X 2 , and X 3 are the same or different, and are independently O, S, NH, or NR′, R′ being an unsubstituted or substituted C1-C20 alkyl group;
R 1 , R 2 , and R 3 are the same or different, and are independently an unsubstituted or substituted C1-C30 alkyl group, an unsubstituted or substituted C1-C30 alkyl ether group, an unsubstituted or substituted C1-C30 monoalkylamine group or dialkylamine group, an unsubstituted or substituted C1-C30 monoalkylsulfide group or dialkylsulfide group, an unsubstituted or substituted C6-C30 aryl group, an unsubstituted or substituted C7-C30 arylalkyl group, an unsubstituted or substituted C1-C30 alkoxy group, or an unsubstituted or substituted C7-C30 arylalkoxy group;
Z 1 , Z 2 , and Z 3 are the same or different, and are independently hydrogen, an unsubstituted or substituted C1-C30 alkyl group, an unsubstituted or substituted C1-C30 alkyl ether group, an unsubstituted or substituted C1-C30 monoalkylamine group or dialkylamine group, an unsubstituted or substituted C1-C30 monoalkylsulfide group or dialkylsulfide group, an unsubstituted or substituted C6-C30 aryl group, an unsubstituted or substituted C7-C30 arylalkyl group, an unsubstituted or substituted C1-C30 alkoxy group, an unsubstituted or substituted C7-C30 arylalkoxy group, or a group represented by Formula 2:

wherein:
* represents a binding site for Si in Formula 1;
R 4 is hydrogen, or a substituted or unsubstituted C1-C30 alkyl group, R 5 is a substituted or unsubstituted C1-C30 alkylene group, a substituted or unsubstituted C6-C30 arylene group, a substituted or unsubstituted C7-C30 arylalkylene group, or a substituted or unsubstituted C1-C30 alkyleneoxy group;
n is an integer from 1 to 30;
at least one of Z 1 , Z 2 , and Z 3 is the group represented by Formula 2, and
the (A) photocurable monomer includes one or more of a (meth)acrylate having a C1-C20 alkyl group, a di(meth)acrylate of a C2-C20 diol, a tri(meth)acrylate of a C3-C20 triol, or a tetra(meth)acrylate of a C4-C20 tetraol,
the composition including about 60 to about 95 parts by weight of the (A) photocurable monomer and about 5 to about 40 parts by weight of the (B) silicon containing monomer based on 100 parts by weight of (A)+(B).

10. The encapsulated apparatus according to claim 9 , wherein the organic barrier layer and the inorganic barrier layer are alternately deposited in the barrier stack.

11. The encapsulated apparatus according to claim 9 , wherein the organic barrier layer and the inorganic barrier layer are deposited to a total of about 10 laye

Assignees

• Lee Chang Min
• Choi Seung Jib
• Kwon Ji Hye
• Lee Yeon Soo
• Ha Kyoung Jin
• Cheil Ind Inc

Inventors

• Lee Chang Min
• Choi Seung Jib
• Kwon Ji Hye
• Lee Yeon Soo
• Ha Kyoung Jin

Classifications

• C08L33/00

  Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers · CPC title

• C08L83/08 Primary

  containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen · CPC title

• C08G77/20

  containing silicon bound to unsaturated aliphatic groups · CPC title

• C08G77/14

  containing silicon bound to oxygen-containing groups · CPC title

• C09D133/00

  Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers · CPC title