Compound, resin, resist composition and method for producing resist pattern

Patent metadata

Field	Value
Publication number	US-9562122-B2
Application number	US-201514835054-A
Country	US
Kind code	B2
Filing date	Aug 25, 2015
Priority date	Aug 25, 2014
Publication date	Feb 7, 2017
Grant date	Feb 7, 2017

Abstract

A resist composition has a resin (A1) including a structural unit having an acid-labile group, a resin (A2) including a structural unit having a group represented by formula (Ia), and an acid generator.

wherein R 1 in each occurrence independently represents a fluorine atom or a C 1 to C 6 fluorinated alkyl group, ring W represents a C 5 to C 18 alicyclic hydrocarbon group, n represents an integer of 1 to 6, and * represents a binding site.

First claim

What is claimed is:

1. A resist composition comprising
a resin (A1) which comprises a structural unit having an acid-labile group,
a resin (A2) which comprises a structural unit having a group represented by formula (Ia) and having no acid-labile group, and
an acid generator:

wherein R 1 in each occurrence independently represents a fluorine atom or a C 1 to C 6 fluorinated alkyl group,
ring W represents a C 5 to C 18 alicyclic hydrocarbon group,
n represents an integer of 1 to 6, and
* represents a binding site.

2. The resist composition according to claim 1 , wherein
the structural unit having the group represented by the formula (Ia) is a structural unit derived from a compound represented by formula (Ia1):

wherein R 1 , ring W and n are as defined in claim 1 ,
R 2 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that may have a halogen atom,
R 3 represents a single bond or a C 1 to C 6 alkanediyl group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and
A 3 represents an oxygen atom or an NH group.

3. The resist composition according to claim 1 , wherein
the ring W is a cyclohexane ring, a cyclopentane ring or a norbornane group.

4. The resist composition according to claim 1 , wherein
the structural unit having the group represented by the formula (Ia) is a structural unit derived from a compound represented by formula (I0):

wherein R 1 and n are as defined in claim 1 ,
R 2 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that may have a halogen atom,
A 3 represents an oxygen atom or an NH group, and
s represents an integer of 1 to 4.

5. The resist composition according to claim 1 , wherein
the structural unit having the group represented by the formula (Ia) is a structural unit derived from a monomer represented by formula (I):

wherein R 1 and n are as defined in claim 1 ,
R 2 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that may have a halogen atom, and
s represents an integer of 1 to 4.

6. The resist composition according to claim 1 , wherein
the resin (A2) comprises 50% by mole or more of the structural unit having the group represented by the formula (Ia).

7. The resist composition according to claim 1 , wherein
the resin (A2) consists of the structural units having the group represented by the formula (Ia).

8. A method for producing a resist pattern comprising steps (1) to (5);
(1) applying the resist composition according to claim 1 onto a substrate;
(2) drying the applied composition to form a composition layer;
(3) exposing the composition layer;
(4) heating the exposed composition layer, and
(5) developing the heated composition layer.

9. A compound represented by formula (Ia1):

wherein R 1 in each occurrence independently represents a fluorine atom or a C 1 to C 6 fluorinated alkyl group,
ring W represents a C 5 to C 18 alicyclic hydrocarbon group,
n represents an integer of 1 to 6,
R 2 represents a hydrogen atom, a halogen atom, or a C 1 to C 6 alkyl group that may have a halogen atom,
R 3 represents a single bond or a C 1 to C 6 alkanediyl group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and
A 3 represents an oxygen atom or an NH group, and
the compound represented by formula (Ia1) has no acid-labile group.

10. The compound according to claim 9 , which
is a compound represented by formula (I0):

wherein R 1 , A 3 , R 2 and n are as defined in claim 9 , and
s represents an integer of 1 to 4.

11. The compound according to claim 9 , which
is a compound represented by formula (I):

wherein R 1 , R 2 and n are as defined in claim 9 , and
s represents an integer of 1 to 4.

12. The compound according to claim 9 , which
is a compound represented by formula (I-1):

wherein R 2 is as defined in claim 9 .

13. A resin having a structural unit derived from the compound of claim 9 .

Assignees

• Sumitomo Chemical Co

Inventors

• Masuyama Tatsuro
• Yamamoto Satoshi
• Ichikawa Koji

Classifications

• G03F7/38

  Treatment before imagewise removal, e.g. prebaking {(G03F7/265 takes precedence)} · CPC title

• C07C2601/08

  the ring being saturated · CPC title

• G03F7/0397

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• G03F7/0046

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

• C07C69/74

  Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring · CPC title