Forming of optoelectronic devices, particularly of inverted-type OPV cells

US9559304B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9559304-B2
Application numberUS-201314107296-A
CountryUS
Kind codeB2
Filing dateDec 16, 2013
Priority dateJan 31, 2013
Publication dateJan 31, 2017
Grant dateJan 31, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

This forming involves a composition including: poly(3,4-ethylenedioxythiophene) or PEDOT; polystyrene sulfonate or PSS; a compound (A) having formula: with 0<x/y<1; Ar1 and Ar2 representing two aromatic rings, which may be identical or different; Ar1 and/or Ar2 comprising at least one hydrophobic substituent on its ring.

First claim

Opening claim text (preview).

The invention claimed is: 1. An ink composition comprising: poly(3,4-ethylenedioxythiophene) (PEDOT); polystyrene sulfonate (PSS); and a compound (A) having formula: with 0<x/y<1, Ar1 and Ar2 representing aromatic rings, which may be identical or different, Ar1 and/or Ar2 comprising at least one hydrophobic substituent on its ring, the compound (A) being from 0.01 to 0.2% by weight of the ink composition. 2. The ink composition of claim 1 wherein the compound (A) is electrically conductive or electrically semiconductive. 3. The ink composition of claim 1 , wherein each aromatic ring (Ar 1, Ar2) is selected from the group consisting of thiophene, bithiophene, terthiophene, thienothiophene, pyrrole, carbazole, diketopyrrolopyrrole (DPP), selenophene, cyclopentadithiophene (CPDT), dithieno cyclopentadithiophene, Si-cyclopentadithiophene (Si-CPDT), dithieno Si-cyclopentadithiophene, fluorene, dithienofluorene, benzene, benzothiazole, benzothiadiazole, dithienobenzothiadiazole, quinoxaline, thiazole, and phosphole. 4. The ink composition of claim 3 , wherein aromatic rings Ar1 and Ar2 are thiophenes. 5. The ink composition of claim 1 , wherein the hydrophobic substituent is an ether chain (—O—R), where R may be a linear or branched chain, comprising carbon atoms. 6. The ink composition of claim 5 , wherein Ar1 and/or Ar2, comprise a hydrophobic substituent having the following structure: 7. The ink composition of claim 5 , wherein the carbon atoms number from 1 to 15. 8. The ink composition of claim 5 , wherein R comprises heteroatoms. 9. The ink composition of claim 8 , wherein the heteroatoms are 0 or N. 10. The ink composition of claim 8 , wherein the heteroatoms number from 1 to 10. 11. The ink composition of claim 1 , wherein the compound (A) has the following formula: 12. The ink composition of claim 1 , wherein the ink composition further comprises at least one solvent selected from the group consisting of water, propan-2-ol, Ethylene glycol monobutyl ether (EGMBE), ethanol, butan-1-ol, butan-2-ol, ethylene glycol, propylene glycol, diethylene glycol, Dipropylene Glycol Methyl Ether, and ethylene glycol methyl ether. 13. The ink composition of claim 12 , wherein the ink composition comprises water, propan-2-ol, and 2-butoxyethanol. 14. The ink composition of claim 13 , wherein the water is in a proportion by volume smaller than 5%. 15. The ink composition of claim 13 , wherein the water is in a proportion by volume smaller than 2%. 16. The ink composition of claim 13 , wherein the propan-2-ol is in a proportion by volume greater than 30%. 17. The ink composition of claim 13 , wherein the propan-2-ol is in a proportion by volume between 40% and 60%. 18. The ink composition of claim 13 , wherein the propan-2-ol is in a proportion by volume between 50% and 55%. 19. The ink composition of claim 13 , wherein the 2-butoxyethanol is in a proportion by volume between 10% and 50%. 20. The ink composition of claim 13 , wherein the 2-butoxyethanol is in a proportion by volume between 15% and 35%. 21. The ink composition of claim 1 , wherein the compound (A) amounts to from 0.05 to 0.2% by weight of the ink composition. 22. The ink composition of claim 1 , wherein the compound (A) amounts to 0.1% by weight of the ink composition or more. 23. The ink composition of claim 1 , wherein the poly(3,4-ethylenedioxythiophene) (PEDOT), and the polystyrene sulfonate (PSS) together are more than 1.0% by weight of the ink composition. 24. A method for preparing the composition of claim 1 , comprising mixing the compound (A) in a dispersion containing PEDOT:PSS. 25. A method of forming an optoelectronic device, comprising the deposition on a layer of the composition of claim 1 . 26. The method of forming an optoelectronic device of claim 25 , wherein the deposition is performed by inkjet printing. 27. The method of forming a photovoltaic device of claim 26 , wherein the upper electrode, is deposited at the surface of the layer. 28. The method of forming a photovoltaic device of claim 25 , wherein the upper electrode, is deposited at the surface of the layer. 29. An ink composition consisting of: poly(3,4-ethylenedioxythiophene) (PEDOT); polystyrene sulfonate (PSS); at least one solvent selected from the group consisting of water, propan-2-ol, ethylene glycol monobutyl ether (EGMBE), ethanol, butan-1-ol, butan-2-ol, ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol methyl ether, and ethylene glycol methyl ether; and a compound (A) having formula: with 0<x/y<1, Ar1 and Ar2 representing aromatic rings, which may be identical or different, Ar1 and/or Ar2 comprising at least one hydrophobic substituent on its ring, the compound (A) being from 0.01 to 0.2% by weight of the ink composition. 30. The ink composition of claim 29 , wherein the ink composition further comprises at least one additive selected from the group consisting of a solvent of high boiling point, a crosslinking agent, and a surfactant agent. 31. The ink composition of claim 30 , wherein the solvent comprises an N-Methyl-2-pyrrolidone. 32. The ink composition of claim 30 , wherein the crosslinking agent comprises gamma-glycidoxypropyltimethoxysilane. 33. The ink composition of claim 30 , wherein the surfactant agent comprises an additive containing acetylenic diol.

Assignees

Inventors

Classifications

  • Photovoltaic applications · CPC title

  • containing sulfonyl or sulfonate-groups · CPC title

  • containing ether groups, including alkoxy · CPC title

  • containing one or more sulfur atoms as the only heteroatom, e.g. thiophene · CPC title

  • using ink-jet printing · CPC title

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Frequently asked questions

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What does patent US9559304B2 cover?
This forming involves a composition including: poly(3,4-ethylenedioxythiophene) or PEDOT; polystyrene sulfonate or PSS; a compound (A) having formula: with 0<x/y<1; Ar1 and Ar2 representing two aromatic rings, which may be identical or different; Ar1 and/or Ar2 comprising at least one hydrophobic substituent on its ring.
Who is the assignee on this patent?
Commissariat Energie Atomique
What technology area does this patent fall under?
Primary CPC classification C08G61/126. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 31 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).