Semiconductor device including voltage dividing diode

Patent metadata

Field	Value
Publication number	US-9559098-B2
Application number	US-201414450472-A
Country	US
Kind code	B2
Filing date	Aug 4, 2014
Priority date	Sep 5, 2013
Publication date	Jan 31, 2017
Grant date	Jan 31, 2017

Abstract

In a semiconductor device connected to a mutual-inductive load, a voltage dividing diode is provided in series to an ST-MOS circuit so that an anode thereof is connected to a GND terminal and a cathode thereof is connected to the back gate of each of lateral nMOSFETs forming the ST-MOS circuit. This can inhibit parasitic transistors in the lateral nMOSFETs from malfunctioning to enable the voltage at an ST terminal to be reliably maintained at a normal voltage.

First claim

What is claimed is:

1. A semiconductor device comprising:
an output stage switching element configured to control a current in a load having a mutual inductance;
a detection circuit configured to detect an abnormality of the output stage switching element;
a logic circuit configured to make a determination with respect to a state of the output stage switching element using an output of the detection circuit;
a status detection circuit configured to output a status of a connection between the load and the output stage switching element and a result of the determination made by the logic circuit to a state outputting terminal; and
a voltage dividing diode connected in series to the status detection circuit, a cathode of the voltage dividing diode being connected to the status detection circuit, and an anode of the voltage dividing diode being connected to a ground,
wherein:
a first potential side of the output stage switching element is connected to an output terminal of a control circuit of the semiconductor device,
a first end of the load is connected to the output terminal, and a second end of the load is connected to a first potential side of a power supply, a second potential side of the power supply being connected to the ground,
the output stage switching element is formed in a semiconductor layer of a second conduction type with the semiconductor layer taken as being on the first potential side of the output stage switching element,
the detection circuit and the logic circuit are formed in a first well region of a first conduction type in the semiconductor layer,
the status detection circuit comprises a lateral MOSFET of the second conduction type formed in a second well region of the first conduction type, the second well region being formed in the semiconductor layer at a distance from the first well region of the first conduction type,
each of the first well region of the first conduction type and the second potential side of the output stage switching element is connected to the ground,
the second well region of the first conduction type forms a back gate of the lateral MOSFET of the second conduction type, the back gate having the cathode of the voltage dividing diode connected thereto to connect the second well region of the first conduction type to the ground through the anode of the voltage dividing diode, and
the semiconductor layer formed as being on the first potential side of the output stage switching element is connected to the first potential side of the power supply through the load connected to the output terminal of the control circuit.

2. The semiconductor device as claimed in claim 1 , wherein a fourth well region of the first conduction type is formed in the second well region so as to overlap at least a source region of regions forming the lateral MOSFET of the second conduction type forming the status detection circuit formed in the second well region of the first conduction type, the fourth well region having a diffusion depth greater than that of the second well region and an impurity concentration higher than that in the second well region, and being connected to the cathode of the voltage dividing diode.

3. The semiconductor device as claimed in claim 1 , wherein:
the voltage dividing diode is a lateral diffused junction diode, and
the lateral diffused junction diode is formed in a third well region of the first conduction type formed with a depth greater than a diffused depth of the first well region, with an impurity concentration higher than that in the first well region, and at a distance apart from the first well region and the second well region.

4. The semiconductor device as claimed in claim 1 , wherein a forward bias voltage applied to a first p-n junction between the first well region and the semiconductor layer is equal to a sum of a voltage applied to a second p-n junction in the voltage dividing diode and a voltage applied to a third p-n junction between the second well region and the semiconductor layer.

5. The semiconductor device as claimed in claim 4 , wherein the voltage applied to the second p-n junction is smaller than the built-in voltage at the second p-n junction.

6. The semiconductor device as claimed in claim 4 , wherein the voltage applied to the third p-n junction is smaller than the built-in voltage at the third p-n junction.

7. The semiconductor device as claimed in claim 1 , wherein an isolation distance between the first well region and the second well region is in a range of 10 μm to 500 μm.

8. The semiconductor device as claimed in claim 1 , wherein the voltage dividing diode is disposed on an oxide film disposed on the semiconductor layer.

9. The semiconductor system as claimed in claim 8 , wherein the oxide film is formed on a third well region of the first conduction type formed in the semiconductor layer so as to be isolated from both of the first well region and the second well region.

10. The semiconductor device as claimed in claim 9 , wherein each of an isolation distance between the first well region and the third well region and an isolation distance between the second well region and the third well region is in a range of 10 μm to 500 μm.

11. The semiconductor device as claimed in claim 9 , wherein an isolation distance between the second well region and the third well region is longer than the diffusion length of minor carriers injected from the first well region to the semiconductor layer.

12. The semiconductor device as claimed in claim 8 , wherein the voltage dividing diode comprises polysilicon.

13. The semiconductor device as claimed in claim 1 , wherein an isolation distance between the first well region and the second well region is longer than a diffusion length of minor carriers injected from the first well region to the semiconductor layer.

14. The semiconductor device as claimed in claim 1 , wherein the output stage switching element is a vertical MOSFET of the second conduction type.

Assignees

• Fuji Electric Co Ltd
• Fuji Electric Co Ltd

Inventors

• Iwata Hideki

Classifications

• H02M3/156

  with automatic control of output voltage or current, e.g. switching regulators · CPC title

• H02M3/1588

  comprising at least one synchronous rectifier element (H02M3/1582, H02M3/1584 take precedence) · CPC title

• H02M3/158

  including plural semiconductor devices as final control devices for a single load · CPC title

• H02M1/32

  Means for protecting converters other than automatic disconnection · CPC title

• H01L27/088 Primary

  Electricity · mapped topic