Integrated magnetometer and its manufacturing process

Patent metadata

Field	Value
Publication number	US-9557392-B2
Application number	US-201113575221-A
Country	US
Kind code	B2
Filing date	Jan 28, 2011
Priority date	Jan 29, 2010
Publication date	Jan 31, 2017
Grant date	Jan 31, 2017

Abstract

Integrated magnetometer comprising a plurality of multilayer magnetoresistive sensors deposited on a surface, called the top surface, of a substantially planar substrate, characterized in that said top surface of the substrate has at least one cavity or protuberance provided with a plurality of inclined faces, and in that at least four said magnetoresistive sensors are placed on four said magnetoresistive sensors are placed on four said inclined faces, having different orientations and opposite one another in pairs, each sensor being sensitive to one component of an external magnetic field parallel to that face on which it is placed. Process for manufacturing such a magnetometer.

First claim

The invention claimed is:

1. An integrated magnetometer comprising a plurality of multilayer magnetoresistive sensors (R 1 , R 2 , R 3 , R 4 ) deposited on a top surface of a substantially planar substrate ( 2 ), wherein:
said top surface of the substrate presents at least one cavity or projection (P, CP) having a plurality of inclined faces;
at least four of said multilayer magnetoresistive sensors are deposited on four of said inclined faces of the at least one cavity or projection, said magnetoresistive sensors presenting four different orientations opposite in pairs, each sensor being sensitive to an external magnetic field component that is parallel to the face on which it is deposited;
said or each cavity or projection presents the shape of a pyramid or a truncated pyramid, having a base which is square or rectangular; and
the sensitivity axes (A R1 , A R2 , A R3 , A R4 ) of said sensors are directed towards or away from the tip of said pyramid.

2. An integrated magnetometer according to claim 1 , wherein said substrate is of the monocrystalline type, in particular of silicon, said inclined faces corresponding to crystal planes of the substrate.

3. A magnetometer according to claim 1 , wherein each of said sensors is constituted by two identical individual sensors, and wherein the individual sensors deposited on faces presenting opposite orientations are connected in a Wheatstone bridge circuit.

4. A magnetometer according to claim 1 , wherein said sensors are identical.

5. A magnetometer according to claim 1 , wherein said sensors are identical except in that those that are mounted on two opposite faces present sensitivities of opposite signs.

6. A magnetometer according to claim 1 , wherein each of said sensors is constituted by four identical individual sensors connected in a Wheatstone bridge, a magnetic shield (BM) being deposited over two of said individual sensors occupying opposite positions in said Wheatstone bridge.

7. A magnetometer according to claim 1 , wherein each of said sensors is constituted by two individual sensors (R, R′) that are identical except in that they present sensitivities of opposite signs.

8. A magnetometer according to claim 1 , wherein said multilayer magnetoresistive sensors are selected from:
giant magnetoresistance sensors; and
tunnel magnetoresistance sensors.

9. A magnetometer according to claim 1 , wherein at least one accelerometer (AM) of microelectromechanical type is integrated on said substrate.

10. A magnetometer according to claim 1 , exclusively comprising magnetoresistive sensors arranged on said inclined faces.

11. A magnetometer according to claim 1 , wherein said magnetoresistive sensors are arranged within a radius that is less than or equal to 1 millimeter, and preferably less than or equal to 100 micrometers.

12. A fabrication method for fabricating a magnetometer comprising a plurality of multilayer magnetoresistive sensors deposited on a top surface of a substantially planar substrate, the magnetometer being characterized in that:
said top surface presents at least one cavity or projection having at least four inclined faces, and
at least four of said multilayer magnetoresistive sensors are deposited on four of said inclined faces of the at least one cavity or projection, said magnetoresistive sensors presenting four different orientations opposite in pairs;
the method comprising:
a first step of making said or each cavity or projection in or on said top surface of said substrate;
a second step of making said multilayer magnetoresistive sensors by successive deposition and lithographic operations; and
a third step of annealing with an external magnetic field being applied in order to determine the sensitivity axes of the sensors made in this way.

13. A fabrication method according to claim 12 , wherein said first step is implemented by anisotropic etching of said substrate, which substrate is monocrystalline.

14. A fabrication method according to claim 12 , wherein said second step includes at least one operation of depositing a uniform layer of resin (RL′) on the surface of said substrate, the or each deposition operation being performed by spray-coating or vaporizing said resin.

Assignees

• Schuhl Alain
• Gaudin Gilles
• Sabon Philippe
• Zermatten Pierre-Jean
• MONTAIGNE François
• Centre Nat Rech Scient
• Commissariat Energie Atomique

Inventors

• Schuhl Alain
• Gaudin Gilles
• Sabon Philippe
• Zermatten Pierre-Jean
• MONTAIGNE François

Classifications

• G01R33/0206

  Three-component magnetometers · CPC title

• G01R33/02

  Measuring direction or magnitude of magnetic fields or magnetic flux (G01R33/20 takes precedence) · CPC title

• G01R33/093 Primary

  using multilayer structures, e.g. giant magnetoresistance sensors (thin magnetic films H01F10/00) · CPC title

• G01R33/0029

  Treating the measured signals, e.g. removing offset or noise · CPC title

• G01R33/098

  comprising tunnel junctions, e.g. tunnel magnetoresistance sensors · CPC title