Method for ultra-fast boriding

US9556531B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9556531-B2
Application numberUS-201414158181-A
CountryUS
Kind codeB2
Filing dateJan 17, 2014
Priority dateJan 17, 2014
Publication dateJan 31, 2017
Grant dateJan 31, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An article of manufacture and method of forming a borided material. An electrochemical cell is used to process a substrate to deposit a plurality of borided layers on the substrate. The plurality of layers are co-deposited such that a refractory metal boride layer is disposed on a substrate and a rare earth metal boride conforming layer is disposed on the refractory metal boride layer.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of forming a boride material on a substrate, comprising the steps of, providing a boriding component; providing a substrate having a metal alloy having a first metal constituent comprising tungsten (W) and a second metal constituent comprising rhenium (Re); disposing the substrate and the boriding component in an electrochemical bath; establishing the electrochemical bath at a temperature of about 900°-1050° C.; and forming a first metal constituent conforming boride layer comprising WB 4 on the substrate and a second metal constituent conforming boride layer comprising ReB 2 on the first metal constituent conforming boride layer. 2. The method of forming a boride material on a substrate of claim 1 , wherein the metal alloy consists essentially of W—Re 25% alloy. 3. A method of forming a boride material on a substrate, comprising the steps of, providing a boriding component; providing a substrate having a metal alloy having a first metal constituent comprising tungsten (W) and a second metal constituent comprising rhenium (Re), the metal alloy consisting essentially of W—Re 25% alloy; disposing the substrate and the boriding component in an electrochemical bath; establishing the electrochemical bath at a temperature of about 900°-1050° C.; and forming a first metal constituent conforming boride layer on the substrate and a second metal constituent conforming boride layer on the first metal constituent conforming boride layer. 4. The method of claim 3 , wherein the first metal constituent conforming boride layer comprises WB 4 and the second metal constituent conforming boride layer comprises ReB 2 .

Assignees

Inventors

Classifications

  • C25D11/028Primary

    Borodising,, i.e. borides formed electrochemically · CPC title

  • from melts · CPC title

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What does patent US9556531B2 cover?
An article of manufacture and method of forming a borided material. An electrochemical cell is used to process a substrate to deposit a plurality of borided layers on the substrate. The plurality of layers are co-deposited such that a refractory metal boride layer is disposed on a substrate and a rare earth metal boride conforming layer is disposed on the refractory metal boride layer.
Who is the assignee on this patent?
Uchicago Argonne Llc, Uchicago Argonne Llc
What technology area does this patent fall under?
Primary CPC classification C25D11/028. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 31 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).