Substrate treatment method and substrate treatment apparatus

Patent metadata

Field	Value
Publication number	US-9555452-B2
Application number	US-201414456007-A
Country	US
Kind code	B2
Filing date	Aug 11, 2014
Priority date	Sep 10, 2013
Publication date	Jan 31, 2017
Grant date	Jan 31, 2017

Abstract

A substrate treatment method is provided, which includes a liquid film retaining step of retaining a liquid film of a treatment liquid on a major surface of a substrate, and a heater heating step of locating a heater in opposed relation to the major surface of the substrate to heat the treatment liquid film by the heater in the liquid film retaining step, wherein an output of the heater is changed from a previous output level in the heater heating step.

First claim

What is claimed is:

1. A substrate treatment method comprising:
a liquid film retaining step of retaining a liquid film of a treatment liquid on an upper surface of a substrate;
a locating step of locating a heater having a smaller diameter than the upper surface of the substrate in opposed relation to the upper surface of the substrate;
a first heater heating step of setting an output of the heater at a first non-zero output level to heat the treatment liquid film on the upper surface of the substrate;
a heater moving step of moving the heater along the upper surface of the substrate in the first heater heating step; and
a second heater heating step of changing the output of the heater to a second non-zero output level which is lower than the first output level to heat the treatment liquid film on the upper surface of the substrate after the first heater heating step;
wherein the heater is stationary in the second heater heating step; and
wherein the heater moving step includes a step of moving the heater from an edge position in which the heater is opposed to a peripheral edge portion of the upper surface of the substrate, to a middle position in which the heater is not opposed to either the peripheral edge portion or a center portion of the upper surface of the substrate, but is opposed only to a portion which is intermediate between the center portion of the upper surface of the substrate and the peripheral edge portion of the upper surface of the substrate.

2. The substrate treatment method according to claim 1 , further comprising a heater preheating step of preliminarily heating the substrate before the first heater heating step.

3. The substrate treatment method according to claim 1 , wherein the treatment liquid is a resist lift-off liquid containing sulfuric acid.

4. The substrate treatment method according to claim 1 , wherein in the second heater heating step, the heater is located stationary at the middle position in which the heater is not opposed to either the peripheral edge portion or a center portion of the upper surface of the substrate, but is opposed only to a portion which is intermediate between the center portion of the upper surface of the substrate and the peripheral edge portion of the upper surface of the substrate.

5. A substrate treatment method comprising:
a liquid film retaining step of retaining a liquid film of a treatment liquid on an upper surface of a substrate;
a locating step of locating a heater having a smaller diameter than the upper surface of the substrate in opposed relation to the upper surface of the substrate;
a first heater heating step of setting an output of the heater at a first non-zero output level to heat the treatment liquid film on the upper surface of the substrate;
a heater moving step of moving the heater along the upper surface of the substrate in the first heater heating step; and
a second heater heating step of changing the output of the heater to a second non-zero output level which is lower than the first output level to heat the treatment liquid film on the upper surface of the substrate after the first heater heating step;
wherein the heater is stationary in the second heater heating step; and
wherein in the second heater heating step, the heater is located stationary at a middle position in which the heater is not opposed to either a peripheral edge portion or a center portion of the upper surface of the substrate, but is opposed only to a portion which is intermediate between the center portion of the upper surface of the substrate and the peripheral edge portion of the upper surface of the substrate.

6. The substrate treatment method according to claim 5 , further comprising a heater preheating step of preliminarily heating the substrate before the first heater heating step.

7. The substrate treatment method according to claim 5 , wherein the treatment liquid is a resist lift-off liquid containing sulfuric acid.

Assignees

• Dainippon Screen Mfg
• Screen Holdings Co Ltd

Inventors

• Negoro Sei
• Nagai Yasuhiko
• Iwata Keiji

Classifications

• H10P72/0448

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• H10P72/0432

  mainly by conduction · CPC title

• H10P72/0406 Primary

  for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title

• B08B7/0035

  by radiant energy, e.g. UV, laser, light beam or the like · CPC title

• B08B3/10 Primary

  with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration · CPC title