Systems and methods for engraving of nano void-dash metasurface into substrate to generate birefringence in the surface layer
US-2024369752-A1 · Nov 7, 2024 · US
US9551820B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9551820-B2 |
| Application number | US-201213566452-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 3, 2012 |
| Priority date | Aug 3, 2011 |
| Publication date | Jan 24, 2017 |
| Grant date | Jan 24, 2017 |
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A reflection-mode waveplate for operation in the terahertz region by shifting the phase between two perpendicular polarization components of the light wave, comprising a ground plane; an array of polygonal unit cells; the polygonal unit cells comprising a polymer positioned between the ground plane and the exterior of the array of polygonal patches.
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The invention claimed is: 1. A reflection-mode waveplate for operation in the terahertz region by shifting the phase between two perpendicular polarization components of the light wave, comprising a ground plane; an array of polygonal unit cells; the polygonal unit cells comprising a polymer positioned between the ground plane and the exterior of the array of polygonal unit cells configured to form a waveplate; whereby the waveplate operates to shift the phase between two perpendicular polarization components of the light wave. 2. The waveplate of claim 1 wherein the polygonal unit cell is 119 μm×194 μm and the periodicity is 195 μm×234 μm and wherein the polymer comprises a polyimide spacer having a thickness of 68 μm and wherein the ground plane is a continuous gold ground plane, and wherein the polygonal unit cells are approximately 200 nm thick. 3. The waveplate of claim 1 wherein the waveplate is a static reflection-mode half waveplate that is arrayed in both the horizontal and vertical directions. 4. The waveplate of claim 1 wherein the waveplate is a quarter wave plate. 5. The waveplate of claim 1 wherein the waveplate is a half wave plate. 6. The waveplate of claim 1 wherein the waveplate is electrically modulated. 7. A reflection-mode waveplate for operation in the terahertz region by shifting the phase between two perpendicular polarization components of the light wave, comprising a ground plane; an array of polygonal unit cells; the polygonal unit cells comprising a polymer positioned between the ground plane and the exterior of the array of polygonal unit cells; wherein the waveplate can be externally modulated either electrically or optically. 8. A waveplate comprising an array of unit cells; each unit cell comprising a ground layer; a polymer material layer; a layer of GaAs; n-type GaAs thin layer grown on the GaAs layer; and a split ring resonator fabricated on the n-type GaAs thin layer grown on GaAs; the split ring resonator having a gap such that when a reverse bias is applied between the ground layer and the split ring resonator, the carriers in the gap are depleted and the split ring resonator resonance turns on. 9. The waveplate of claim 8 wherein the ground and polymer layers of the unit cells are contiguous. 10. The waveplate of claim 8 wherein the polymer material layer is polyimide. 11. The waveplate of claim 8 wherein the ground layer is a gold ground layer Schottky contact and the split ring resonator comprises a metamaterial ohmic contact, and wherein when a reverse bias is applied between the gold ground layer Schottky contact and the split ring resonator metamaterial ohmic contact the carriers in the gap are depleted and the split ring resonator resonance turns on. 12. The waveplate of claim 8 where the n-type GaAs thin layer is approximately 2 micrometers thick. 13. The waveplate of claim 8 wherein the split ring resonator material layer is etched such that the gap in the split ring comprises n-type GaAs. 14. The waveplate of claim 8 wherein the split ring resonator material layer is etched such that n-type GaAs only remains only in the gap of the split ring resonator material layer.
involving the reflection of light at a particular angle of incidence, e.g. Brewster's angle · CPC title
Birefringent or phase retarding elements (G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001) · CPC title
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