Wafer processing apparatus and wafer processing method
US-2024395512-A1 · Nov 28, 2024 · US
US9551064B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9551064-B2 |
| Application number | US-201514788648-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 30, 2015 |
| Priority date | Jun 18, 2012 |
| Publication date | Jan 24, 2017 |
| Grant date | Jan 24, 2017 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
The disclosure extends to protectively coated energy storage devices, such as rechargeable batteries, and associated methods of forming the same. An energy storage device, such as a rechargeable battery, may comprise a cell including at least one electrical terminal and a circuit board electrically coupled to the at least one electrical terminal. The rechargeable battery may also include a protective coating on at least a portion of at least one of a surface of the cell and/or at least one surface of the circuit board. The protective coating may reside between the circuit board and the cell. The protective coating may comprise a moisture resistant coating that will withstand exposure to corrosive agents, including electrolytes, corrosive gases and dust.
Opening claim text (preview).
What is claimed: 1. A method for preventing exposure of an energy storage device to moisture and corrosive agents, comprising: applying a first protective coating to at least a portion of at least one surface of a cell of an energy storage device having a first electrical terminal, the first protective coating comprising a moisture resistant coating formed from a material that will withstand exposure to corrosive agents, including electrolytes, corrosive gases and dust; applying a second protective coating to at least a portion of at least one surface of a circuit board having a second electrical terminal, the second protective coating comprising a moisture resistant coating formed from a material that will withstand exposure to corrosive agents, including electrolytes, corrosive gases and dust; and etching the first protective coating from the first electrical terminal and the second protective coating from the second electrical terminal; and electrically coupling the first electrical terminal to the second electrical terminal; and wherein etching is performed prior to coupling the first and second electrical terminals. 2. The method of claim 1 , further comprising masking the first electrical terminal prior to applying the first protective coating to the at least a portion of the at least one surface of the cell. 3. The method of claim 2 , further comprising masking the second electrical terminal prior to applying the second protective coating to the at least a portion of the at least one surface of the circuit board. 4. The method of claim 1 , wherein applying the first protective coating or applying the second protective coating comprises at least one of atomic layer deposition, chemical vapor deposition, pulsed plasma deposition and physical vapor deposition. 5. The method of claim 1 , wherein applying the first protective coating or applying the second protective coating comprises applying a protective coating by dip-coating, screen painting or dispensing. 6. The method of claim 1 , wherein applying the protective coating comprises covering the cell with the protective coating to seal electrolytes within the cell. 7. The method of claim 1 , wherein applying the protective coating comprises applying a protective layer comprising a plurality of layers to at least the portion of the surface of the energy storage assembly. 8. The method of claim 1 , wherein the energy storage device includes an interconnect disposed between the cell and the circuit board, and applying the protective coating comprises applying the protective coating to a surface of the interconnect. 9. A method for preventing exposure of an energy storage device to moisture and corrosive agents, comprising: masking a first electrical terminal of a cell of an energy storage device; applying a first protective coating to at least a portion of at least one surface of the cell of the energy storage device, the first protective coating comprising a moisture resistant coating formed from a material that will withstand exposure to corrosive agents, including electrolytes, corrosive gases and dust; wherein masking the first electrical terminal is performed prior to applying the first protective coating to at least a portion of at least one surface of the cell; masking a second electrical terminal of a circuit board; applying a second protective coating to at least a portion of at least one surface of the circuit board, the second protective coating comprising a moisture resistant coating formed from a material that will withstand exposure to corrosive agents, including electrolytes, corrosive gases and dust; and wherein masking the second electrical terminal is performed prior to applying the second protective coating to at least a portion of at least one surface of the circuit board; and electrically coupling the first electrical terminal to the second electrical terminal. 10. The method of claim 9 , further comprising etching the first protective coating from the first electrical terminal and the second protective coating from the second electrical terminal prior to coupling the first and second electrical terminals. 11. The method of claim 9 , wherein applying the first protective coating or applying the second protective coating comprises at least one of atomic layer deposition, chemical vapor deposition, pulsed plasma deposition and physical vapor deposition. 12. The method of claim 9 , wherein applying the first protective coating or applying the second protective coating comprises applying a protective coating by dip-coating, screen painting or dispensing. 13. The method of claim 9 , wherein applying the protective coating comprises covering the cell with the protective coating to seal electrolytes within the cell. 14. The method of claim 9 , wherein applying the protective coating comprises applying a protective layer comprising a plurality of layers to at least the portion of the surface of the energy storage assembly. 15. The method of claim 9 , wherein the energy storage device includes an interconnect disposed between the cell and the circuit board, and applying the protective coating comprises applying the protective coating to a surface of the interconnect.
for protecting against corrosion · CPC title
prismatic or rectangular (H01M50/109, H01M50/11 take precedence) · CPC title
for protecting against humidity · CPC title
applied in non-semiconductor technology · CPC title
Sputtering · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.