Thermosetting resin composition, method for producing same, method for producing cured resin product, and method for causing self-polymerization of epoxy compound

US9550877B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9550877-B2
Application numberUS-201514643799-A
CountryUS
Kind codeB2
Filing dateMar 10, 2015
Priority dateSep 28, 2012
Publication dateJan 24, 2017
Grant dateJan 24, 2017

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present invention is directed to provide at least one of a novel thermosetting resin composition using an epoxy compound, a method for producing the composition, a method for producing a novel cured resin using an epoxy compound, and a novel method for causing self-polymerization of an epoxy compound. The thermosetting resin composition includes an epoxy compound, a gallium compound, and a silanol source compound. The method for producing the thermosetting resin composition includes a step of mixing the epoxy compound with the gallium compound and the silanol source compound. The method for producing a cured resin includes a step of heating an epoxy compound in the presence of a gallium compound and silanol. The method for causing self-polymerization of an epoxy compound is characterized by using a gallium compound and silanol as catalysts.

First claim

Opening claim text (preview).

What is claimed is: 1. A thermosetting resin composition comprising an epoxy compound, a gallium compound, and a silanol source compound, wherein said gallium compound. is gallium triacetylacetylacetonate or gallium acetate, and said silanol source compound comprises a monosilane compound and/or an organopolysiloxane of formula(19): (R 21 3 SiO 1/2 ) a2 (R 22 2 SiO 2/2 ) b2 (R 23 SiO 3/2 ) c2 (SiO 4/2 ) d2 (O 1/2 H) e2   (19) where R 21 , R 22 , and R 23 each independently represent a C 1-10 hydrocarbon group, a2, b2, c2, and d2are each an integer of 0 or more and satisfy the condition of a2+b2+c2+d2≧3, and e2is a natural number of 1 or more and represents the number of a hydroxy group (s) directly bonded to a silicon atom. 2. The thermosetting resin composition according to claim 1 , wherein the epoxy compound is a cycloaliphatic epoxy compound. 3. The thermosetting resin composition according to claim 1 , wherein the silanol source compound is an organopolysiloxane of Formula (19). 4. The thermosetting resin composition according to claim 1 , wherein the silanol source compound is a monosilane compound. 5. The thermosetting resin composition according to claim 1 , wherein the gallium compound is a gallium complex that has a chelating ligand. 6. A method for producing a cured resin, the method comprising a step of heating an epoxy compound in the presence of a gallium compound and a silanol source compound, wherein said gallium compound is gallium triacetylacetonate or gallium acetate, and said silanol source compound comprises a monosilane compound and/or an organopolysiloxane of Formula (19 1 ): (R 21 3 SiO 1/2 ) a2 (R 22 2 SiO 2/2 ) b2 (R 23 SiO 3/2 ) c2 (SiO 4/2 ) d2 (O 1/2 H) e2   (19) Where R 21 , R 22 , and R 23 each independently represent a C 1-10 hydrocarbon group, a2, b2, c2, and d2are each an integer of 0 or more and satisfy the condition of a2+b2+c2+d2≧3, and e2 is a natural number of 1 or more and represents the number of hydroxyl group(s) directly bonded to a silicon atom. 7. The method according to claim 6 , wherein the epoxy compound is a cycloaliphatic epoxy compound. 8. The method according to claim 6 , wherein an organopolysiloxane of Formula (19) is used as a source of the silanol. 9. The method according to claim 6 , wherein a monosilane compound is used as a source of the silanol. 10. The method according to claim 6 , wherein a gallium complex that has a chelating ligand is used as the gallium compound. 11. A method for causing self-polymerization of an epoxy compound, the method comprising a step of adding a gallium compound and a silanol source compound as catalysts, wherein said gallium compound is gallium triacetylacetonate or gallium acetate, and said silanol source compound comprises a monosilane compound and/or an organopolysiloxane of Formula (19): (R 21 3 SiO 1/2 ) a2 (R 22 2 SiO 2/2 ) b2 (R 23 SiO 3/2 ) c2 (SiO 4/2 ) d2 (O 1/2 H) e2   (19) where R 21 , R 22 , and R 23 each independently represent a C 1-10 hydrocarbon group, a2, b2, c2, and d2 are each an integer of 0 or more and satisfy the condition of a2+b2+c2+d2≧3, and e2 is a natural number of 1 or more and represents the number of hydroxyl group(s) directly bonded to a silicon atom. 12. The method according to claim 11 , wherein the epoxy compound is a cycloaliphatic epoxy compound. 13. The method according to claim 11 , wherein an organopolysiloxane of Formula (19) is used as a source of the silanol. 14. The method according to claim 11 , wherein a monosilane compound is used as a source of the silanol. 15. The method according to claim 11 , wherein the gallium compound is a gallium complex that has a chelating ligand.

Assignees

Inventors

Classifications

  • C08K5/5415Primary

    containing at least one Si—O bond · CPC title

  • Metal compounds · CPC title

  • C08K3/24Primary

    Acids; Salts thereof {(C08K3/16 takes precedence)} · CPC title

  • containing silicon bound to oxygen-containing groups (C08L83/12 takes precedence) · CPC title

  • Flame or fire retardant/resistant · CPC title

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What does patent US9550877B2 cover?
The present invention is directed to provide at least one of a novel thermosetting resin composition using an epoxy compound, a method for producing the composition, a method for producing a novel cured resin using an epoxy compound, and a novel method for causing self-polymerization of an epoxy compound. The thermosetting resin composition includes an epoxy compound, a gallium compound, and a …
Who is the assignee on this patent?
Mitsubishi Chem Corp
What technology area does this patent fall under?
Primary CPC classification C08K5/5415. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 24 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).