Phosphor, manufacturing method therefor, and light-emitting device using the phosphor
US-2015380614-A1 · Dec 31, 2015 · US
US9546318B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9546318-B2 |
| Application number | US-201414267449-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 1, 2014 |
| Priority date | May 1, 2014 |
| Publication date | Jan 17, 2017 |
| Grant date | Jan 17, 2017 |
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A process for preparing a Mn 4+ doped phosphor of formula I A x [MF y ]:Mn +4 I includes contacting a mixture of a compound of formula A x [MF y ], a compound of formula AX, and a Mn +n source comprising a fluoromanganese compound, with a fluorine-containing oxidizing agent in gaseous form, at an elevated temperature, to form the Mn 4+ doped phosphor; wherein A is Li, Na, K, Rb, Cs, or a combination thereof; M is Si, Ge, Sn, Ti, Zr, Al, Ga, In, Sc, Hf, Y, La, Nb, Ta, Bi, Gd, or a combination thereof; X is F, Cl, Br, I, HF 2 , or a combination thereof; x is the absolute value of the charge of the [MF y ] ion; y is 5, 6 or 7; and n is 2, 3, or 4.
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The invention claimed is: 1. A process for preparing a Mn 4+ doped phosphor of formula I, A x [MF y ]:Mn +4 I the process comprising contacting a mixture of a compound of formula A x [MF y ], a compound of formula AX, and a Mn +n source comprising a fluoromanganese compound, with a fluorine-containing oxidizing agent in gaseous form, at an elevated temperature, to form the Mn 4+ doped phosphor; wherein A is Li, Na, K, Rb, Cs, or a combination thereof; M is Si, Ge, Sn, Ti, Zr, Al, Ga, In, Sc, Hf, Y, La, Nb, Ta, Bi, Gd, or a combination thereof; X is F, Cl, Br, I, HF 2 , or a combination thereof; x is 1, 2, or 3, and is equal to the absolute value of the charge of the [MF y ] ion; y is 5, 6 or 7; and n is 2, 3, or 4. 2. A process according to claim 1 , wherein the Mn 4+ doped phosphor is K 2 SiF 6 :Mn 4+ . 3. A process according to claim 1 , wherein the compound of formula A x [MF y ] is K 2 SiF 6 . 4. A process according to claim 1 , wherein the compound of formula AX is KF, KHF 2 , or a combination thereof. 5. A process according to claim 1 , wherein the Mn +n source is selected from K 2 MnF 6 , K 2 MnF 5 .H 2 O, KMnF 4 , K 2 MnF 4 , KMnF 3 , MnF 2 , MnF 3 , MnF 4 , and combinations thereof. 6. A process according to claim 1 , wherein the Mn +n source is K 2 MnF 6 , MnF 2 , MnF 3 , or a combination thereof. 7. A process according to claim 1 , wherein the fluorine-containing oxidizing agent is F 2 . 8. A process according to claim 1 , additionally comprising treating the phosphor in particulate form with a saturated solution of a composition of formula II in aqueous hydrofluoric acid, after contacting with the fluorine-containing oxidizing agent A x [MF y ] II. 9. A process for preparing a Mn 4+ doped phosphor, the process comprising contacting a mixture of a host compound of the phosphor, a compound of formula AX or EX 2 , and a Mn +n source comprising a fluoromanganese compound; with a fluorine-containing oxidizing agent in gaseous form, at an elevated temperature, to form the Mn 4+ doped phosphor; wherein the host compound is selected from the group consisting of (a) A 2 [MF 5 ], where M is selected from Al, Ga, In, and combinations thereof; (b) A 3 [MF 6 ], where M is selected from Al, Ga, In, and combinations thereof; (c) Zn 2 [MF 7 ], where M is selected from Al, Ga, In, and combinations thereof; (d) A[In 2 F 7 ]; (e) A 2 [MF 6 ], where M is selected from Ge, Si, Sn, Ti, Zr, and combinations thereof; (f) E[MF 6 ], where E is selected from Mg, Ca, Sr, Ba, Zn, and combinations thereof; and where M is selected from Ge, Si, Sn, Ti, Zr, and combinations thereof; (g) Ba 0.65 Zr 0.35 F 2.70 ; and (h) A 3 [ZrF 7 ]; and combinations thereof in solid solution; A is Li, Na, K, Rb, Cs, or a combination thereof. 10. A process according to claim 9 , wherein the fluorine-containing oxidizing agent is F 2 . 11. A process for preparing a Mn 4+ doped phosphor of formula I, A x [MF y ]:Mn +4 I the process comprising contacting a mixture of a phosphor precursor and a flux compound selected from compounds of formula AX, EX 2 , MF 2 , or MF 3 , or a combination thereof, with a fluorine-containing oxidizing agent in gaseous form at an elevated temperature, to form the Mn 4+ doped phosphor; wherein A is Li, Na, K, Rb, Cs, or a combination thereof; E is Mg, Ca, Sr, Ba, Zn, and combinations thereof; M is Si, Ge, Sn, Ti, Zr, Al, Ga, In, Sc, Hf, Y, La, Nb, Ta, Bi, Gd, or a combination thereof; X is F, CI, Br, I, HF 2 ,or a combination thereof; x is 1, 2, or 3, and is equal to the absolute value of the charge of the [MF y ] ion; and y is 5, 6 or 7. 12. A process according to claim 11 , wherein the flux compound is of formula AX. 13. A process according to claim 12 , wherein the compound of formula AX is KF, KHF 2 , or a combination thereof.
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