Method for forming shield tunnels in single-crystal substrates

US9543466B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9543466-B2
Application numberUS-201615013041-A
CountryUS
Kind codeB2
Filing dateFeb 2, 2016
Priority dateFeb 2, 2015
Publication dateJan 10, 2017
Grant dateJan 10, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of processing a single-crystal member includes setting the peak energy density of a pulsed laser beam to a value in a range from 1 TW/cm 2 to 100 TW/cm 2 , and applying the pulsed laser beam to the single-crystal member while positioning a converged point of the pulsed laser beam at a predetermined position spaced from an upper side of the single-crystal member to grow a fine hole and a amorphous region shielding the fine hole from the upper side of the single-crystal member, thereby forming a shield tunnel in the single-crystal member.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of processing a single-crystal member, comprising: setting a peak energy density of a pulsed laser beam to a value in a range from 1 TW/cm 2 to 100 TW/cm 2 ; and applying the pulsed laser beam to the single-crystal member while positioning a converged point of the pulsed laser beam at a predetermined position spaced from an upper side of the single-crystal member to grow a fine hole and an amorphous region shielding the fine hole from the upper side of the single-crystal member, thereby forming a shield tunnel in the single-crystal member. 2. The method of processing a single-crystal member according to claim 1 , further comprising: continuously forming the shield tunnels along a plurality of division lines formed on the single-crystal member; and dividing the single-crystal member along the division lines with the shield tunnels continuously formed therealong.

Assignees

Inventors

Classifications

  • Cutting or separating of wafers, substrates or parts of devices · CPC title

  • Auxiliary operations or equipment · CPC title

  • involving non-metallic material, e.g. isolators · CPC title

  • comprising lenses · CPC title

  • being semiconducting · CPC title

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What does patent US9543466B2 cover?
A method of processing a single-crystal member includes setting the peak energy density of a pulsed laser beam to a value in a range from 1 TW/cm 2 to 100 TW/cm 2 , and applying the pulsed laser beam to the single-crystal member while positioning a converged point of the pulsed laser beam at a predetermined position spaced from an upper side of the single-crystal member to grow a fine hole and…
Who is the assignee on this patent?
Disco Corp
What technology area does this patent fall under?
Primary CPC classification B23K26/38. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jan 10 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).