Group III nitride wafer and its production method

Patent metadata

Field	Value
Publication number	US-9543393-B2
Application number	US-201313834871-A
Country	US
Kind code	B2
Filing date	Mar 15, 2013
Priority date	Apr 7, 2006
Publication date	Jan 10, 2017
Grant date	Jan 10, 2017

Abstract

The present invention discloses a group III nitride wafer such as GaN, AlN, InN and their alloys having one surface visually distinguishable from the other surface. After slicing of the wafer from a bulk crystal of group III nitride with a mechanical method such as multiple wire saw, the wafer is chemically etched so that one surface of the wafer is visually distinguishable from the other surface. The present invention also discloses a method of producing such wafers.

First claim

What is claimed is:

1. A group III nitride wafer having composition of Ga x Al y In 1-x-y N (0≦x≦1, 0≦x+y≦1), wherein the wafer is formed by roughening both surfaces using a mechanical process and the surfaces are chemically treated to visually distinguish, without instrumentation, one surface from another after said roughening and before chemically-mechanically polishing the wafer.

2. A group III nitride wafer according to claim 1 , wherein the mechanical process comprises slicing the wafer from a bulk crystal of group III nitride.

3. A group III nitride wafer according to claim 1 , wherein the mechanical process is grinding of the wafer.

4. A group III nitride wafer according to claim 2 , wherein the wafer was sliced from a bulk crystal of group III nitride with a multiple wire saw.

5. A group III nitride wafer according to claim 1 , wherein the chemical treatment is etching.

6. A group III nitride wafer according to claim 5 , wherein the etching is performed using a wet etchant.

7. A group III nitride wafer according to claim 6 , wherein the wet etchant comprises phosphoric acid.

8. A group III nitride wafer according to claim 7 , wherein the chemical treatment is etching in phosphoric acid or its mixture at 50° C. or higher.

9. A group III nitride wafer according to claim 1 , wherein the wafer has c-plane orientation with misorientation from minus 10 degree to plus 10 degree.

10. A group III nitride wafer according to claim 1 , wherein the wafer has a semipolar plane orientation with misorientation from minus 10 degree to plus 10 degree.

11. A group III nitride wafer according to claim 1 , wherein the wafer has a nonpolar plane orientation with misorientation from minus 10 degree to minus 0.1 degree or plus 0.1 degree to plus 10 degree.

12. A group III nitride wafer according to claim 1 , wherein the wafer has a surface area greater than 100 mm 2 .

13. A group III nitride wafer according to claim 1 , wherein the composition comprises GaN.

14. A group III nitride wafer comprising a first layer and a second layer of damaged group III nitride on opposite faces of a third layer of highly oriented poly or single crystalline group III nitride, wherein the first and the second layer were formed through a mechanical process that precedes chemically-mechanically polishing the wafer, and the surface of the second layer is made visually distinguishable, without instrumentation, from the surface of the first layer by a chemical etching.

15. A group III nitride wafer according to claim 14 , wherein the wafer is sliced from a bulk crystal of group III nitride.

16. A group III nitride wafer according to claim 14 , wherein the wafer is sliced from a bulk crystal of group III nitride with a multiple wire saw.

17. A group III nitride wafer according to claim 14 , wherein the chemical etching uses acid or base.

18. A group III nitride wafer according to claim 17 , wherein the chemical etching uses phosphoric acid or its mixture.

19. A group III nitride wafer according to claim 18 , wherein the chemical etching uses phosphoric acid or its mixture at 50° C. or higher.

20. A group III nitride wafer according to claim 14 , wherein the surface area of the wafer is more than 100 mm 2 .

21. A group III nitride wafer according to claim 14 , wherein the third layer has a density of line defect and grain boundary less than 10 6 cm −2 .

22. A group III nitride wafer according to claim 14 , wherein the group III nitride comprises GaN.

Assignees

• Sixpoint Mat Inc
• Seoul Semiconductor Co Ltd

Inventors

• Hashimoto Tadao
• Letts Edward
• Hoff Sierra

Classifications

• H10P90/126

  by chemical etching · CPC title

• H10P90/123

  by grinding or lapping · CPC title

• C30B33/00

  After-treatment of single crystals or homogeneous polycrystalline material with defined structure (C30B31/00 takes precedence) · CPC title

• C30B29/403

  AIII-nitrides · CPC title

• C30B29/406

  Gallium nitride · CPC title