Magnetoresistive sensor with stop-layers

Patent metadata

Field	Value
Publication number	US-9542961-B2
Application number	US-201414309012-A
Country	US
Kind code	B2
Filing date	Jun 19, 2014
Priority date	Oct 14, 2011
Publication date	Jan 10, 2017
Grant date	Jan 10, 2017

Abstract

Tolerances for manufacturing reader structures for transducer heads continue to grow smaller and storage density in corresponding storage media increases. Reader stop layers may be utilized during manufacturing of reader structures to protect various layers of the reader structure from recession and/or scratches while processing other non-protected layers of the reader structure. For example, the stop layer may have a very low polish rate during mechanical or chemical-mechanical polishing. Surrounding areas may be significantly polished while a structure protected by a stop layer with a very low polish rate is substantially unaffected. The stop layer may then be removed via etching, for example, after the mechanical or chemical-mechanical polishing is completed.

First claim

What is claimed is:

1. A method comprising:
forming a depression in a shield element of a reader;
depositing an alumina insert within the depression; and
depositing a stop layer on the alumina insert; and
forming a reader stack above the alumina insert such that a width of the reader stack is at least partially co-extensive with a corresponding width of the alumina insert.

2. The method of claim 1 , further comprising:
polishing to remove re-deposition material from at least one layer formed on the stop layer, wherein the stop layer protects the alumina insert during the polishing operation.

3. The method of claim 1 , wherein the reader stack is formed on the stop layer.

4. The method of claim 1 , wherein forming the depression in the shield element further comprises forming the depression using an ion milling process.

5. The method of claim 1 , wherein the alumina insert fills the depression and exceeds a depth of the depression.

6. The method of claim 1 , wherein the stop layer comprises at least one of ruthenium, chromium, and tantalum.

7. A method comprising:
forming a first stop layer on a shield element;
removing material of the first stop layer to form a depression in the shield element; and
depositing an alumina insert within the depression; and
forming a reader stack above the alumina insert such that a width of the reader stack is at least partially co-extensive with a corresponding width of the alumina insert.

8. The method of claim 7 , further comprising:
depositing at least one additional layer adjacent to the first stop layer, and forming the depression in the at least one additional layer and the shield element.

9. The method of claim 8 , further comprising:
polishing to remove material of the at least one additional layer, wherein the second stop layer protects the alumina insert during the polishing operation.

10. The method of claim 7 , further comprising:
forming a second stop layer on the alumina insert.

11. The method of claim 10 , further comprising:
side milling to remove the second stop layer and an upper portion of the alumina insert.

12. The method of claim 7 wherein the first stop layer comprises at least one of ruthenium, chromium, and tantalum.

13. A method comprising:
depositing an alumina insert within a depression formed in a shield element of a reader;
depositing a stop layer on the alumina insert;
side milling to remove the stop layer and an upper portion of the alumina insert, and
forming a reader stack above a remaining lower portion of the alumina insert such that a width of the reader stack is at least partially co-extensive with a corresponding width of the remaining lower portion of the alumina insert.

14. The method of claim 13 , wherein the stop layer comprises at least one of ruthenium, chromium, and tantalum.

Assignees

• Seagate Technology Llc

Inventors

• Van Dorn Carolyn Pitcher
• Boonstra Thomas Roy
• Singleton Eric Walter
• Mckinlay Shaun Eric

Classifications

• G11B5/3169 Primary

  Working or finishing the interfacing surface of heads, e.g. lapping of heads · CPC title

• G11B5/40

  Protective measures on heads, e.g. against excessive temperature  (G11B5/31 takes precedence; protection against wear G11B5/255  {; protective structure of the head: see under structures, e.g. G11B5/3106}) · CPC title

• Y10T428/1164

  with protective film · CPC title

• G11B5/39 Primary

  using magneto-resistive devices {or effects} · CPC title

• G11B5/11

  Shielding of head against electric or magnetic fields · CPC title