Deposition of discrete nanoparticles on a nanostructured surface of an implant

Patent metadata

Field	Value
Publication number	US-9539067-B2
Application number	US-201514925524-A
Country	US
Kind code	B2
Filing date	Oct 28, 2015
Priority date	Oct 24, 2006
Publication date	Jan 10, 2017
Grant date	Jan 10, 2017

Abstract

A method of forming an implant to be implanted into living bone is disclosed. The method comprises the act of roughening at least a portion of the implant surface to produce a microscale roughened surface. The method further comprises forming a nanoscale roughened surface on the microscale roughened surface. The method further comprises the act of depositing discrete nanoparticles on the nanoscale roughened surface though a one-step process of exposing the roughened surface to a solution including the nanoparticles. The nanoparticles comprise a material having a property that promotes osseointegration.

First claim

What is claimed is:

1. A method of forming an implant to be implanted into living bone, the method, comprising:
roughening at least a portion of an implant surface to produce a microscale roughened surface;
forming permanent nanostructures on the microscale roughened surface; and
depositing discrete nanoparticles on the permanent nanostructures through a one-step process of exposing the permanent nanostructures to a solution including the nanoparticles, the nanoparticles comprising a material having a property that promotes osseointegration.

2. The method of claim 1 , wherein the implant is made of a metal selected from the group consisting of tantalum, cobalt, chromium, titanium, stainless steel, and alloys thereof.

3. The method of claim 1 , wherein the nanostructures are made from a same material as the implant.

4. The method of claim 1 , wherein the implant is a dental implant.

5. The method of claim 4 , wherein the portion of the implant surface is a threaded bottom portion for facilitating bonding with bone.

6. The method of claim 1 , wherein the implant is made of titanium and the act of roughening the implant surface to produce a microscale roughened surface comprises:
removing a native oxide layer from the implant surface; and
acid etching the resulting surface.

7. The method of claim 1 , wherein the act of roughening the implant surface to produce a microscale roughened surface creates irregularities, the irregularities having peak-to-valley heights not greater than about 20 microns.

8. The method of claim 1 , wherein the nanoparticles include hydroxyapatite nanoparticles.

9. The method of claim 1 , wherein a portion of the microscale roughened surface is exposed through the nanoparticles such that the exposed portion of the microscale roughened surface is for contacting bone.

10. A method of forming an implant to be implanted into living bone, the method, comprising:
roughening at least a portion of an implant surface to produce a microscale roughened surface;
forming permanent nanostructures on the microscale roughened surface, wherein the permanent nanostructures have a first nanotopography; and
depositing discrete nanoparticles on portions of the permanent nanostructures through a one-step process, wherein the discrete nanoparticles form a second nanotopography on the first nanotopography.

11. The method of claim 10 , wherein a portion of the first nanotopography is exposed through the second nanotopography such that the exposed portion of the first nanotopography is for contacting bone.

12. The method of claim 10 , wherein the nanoparticles include a material having a property that promotes osseointegration.

13. The method of claim 12 , wherein the discrete nanoparticles include hydroxyapatite nanoparticles.

14. The method of claim 13 , wherein the discrete hydroxyapatite nanoparticles are deposited by exposing the implant to a solution including the hydroxyapatite nanoparticles.

15. The method of claim 13 , wherein the hydroxyapatite nanoparticles include hydroxyapatite nanocrystals.

16. The method of claim 15 , wherein the hydroxyapatite nanocrystals have dimensions of about 20 nanometers to about 100 nanometers.

17. The method of claim 10 , wherein roughening at least a portion of an implant surface to produce a microscale roughened surface, includes:
removing a native oxide layer from the implant surface; and
acid etching the resulting surface.

18. The method of claim 17 , wherein roughening at least a portion of an implant surface to produce a microscale roughened surface includes grit blasting.

19. The method of claim 17 , wherein roughening at least a portion of an implant surface to produce a microscale roughened surface includes titanium plasma spraying.

20. The method of claim 10 , wherein the microscale roughened surface includes an array of microscale irregularities having peak-to-valley heights not greater than about 20 microns.

Assignees

• Biomet 3I Llc

Inventors

• Berckmans Iii Bruce
• Towse Ross W
• Mayfield Robert L

Classifications

• A61F2002/30968

  Sintering · CPC title

• C23F1/00

  Etching metallic material by chemical means (manufacture of printing surfaces B41C; manufacture of printed circuits H05K) · CPC title

• A61L2430/12

  for dental implants or prostheses · CPC title

• A61L27/50

  Materials characterised by their function or physical properties {, e.g. injectable or lubricating compositions, shape-memory materials, surface modified materials} · CPC title

• A61L27/04

  Metals or alloys · CPC title