Method for a lithographic apparatus

Patent metadata

Field	Value
Publication number	US-9535341-B2
Application number	US-61785509-A
Country	US
Kind code	B2
Filing date	Nov 13, 2009
Priority date	Nov 17, 2008
Publication date	Jan 3, 2017
Grant date	Jan 3, 2017

Abstract

A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern features.

First claim

The invention claimed is:

1. A method of obtaining information at least indicative of a focal property of a lithographic apparatus, the method comprising: illuminating a patterning device pattern, provided by a patterning device, with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation constituting at least a portion of the radiation beam, and a second pattern feature that does not substantially diffract radiation constituting at least a portion of the radiation beam; illuminating a phase modulation element with radiation emanating from the patterning device, and introducing an asymmetry, relative to an optical axis, substantially only in the substantially diffracted radiation using the phase modulation element; illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern on the receiving element that is related to the patterning device pattern, the receiving element pattern having a first feature that is related to the first pattern feature of the patterning device pattern, and a second feature that is related to the second pattern feature of the patterning device pattern; obtaining positional information regarding the relative positions of the first feature of the receiving element pattern and of the second feature of the receiving element pattern; and determining information at least indicative of the focal property of the lithographic apparatus from the obtained positional information, wherein using the phase modulation element to introduce an asymmetry relative to an optical axis in the substantially diffracted radiation comprises: using the phase modulation element to induce a phase shift between first radiation constituting at least a portion of a diffraction order of the substantially diffracted radiation and second radiation constituting a different portion of that same diffraction order such that the first radiation and second radiation combine with radiation constituting at least a portion of another diffraction order to result in a substantially constant level of radiation when illuminating the radiation beam receiving element.

2. The method of claim 1 , wherein the phase shift is introduced in radiation constituting a diffraction order derived from one of at least two poles of the illumination mode, thus introducing the asymmetry.

3. The method of claim 1 , wherein the diffraction order is a zeroth diffraction order.

4. The method of claim 1 , wherein a zeroth diffraction order and an additional diffraction order of the substantially diffracted radiation are incident upon the phase modulation element.

5. The method of claim 4 , wherein the zeroth diffraction order and the additional diffraction order are spatially separated when incident upon the phase modulation element.

6. A method of obtaining information at least indicative of a focal property of a lithographic apparatus, the method comprising: illuminating a patterning device pattern, provided by a patterning device, with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation constituting at least a portion of the radiation beam, and a second pattern feature that does not substantially diffract radiation constituting at least a portion of the radiation beam; illuminating a phase modulation element with radiation emanating from the patterning device, and introducing an asymmetry, relative to an optical axis, substantially only in the substantially diffracted radiation using the phase modulation element; illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern on the receiving element that is related to the patterning device pattern, the receiving element pattern having a first feature that is related to the first pattern feature of the patterning device pattern, and a second feature that is related to the second pattern feature of the patterning device pattern; obtaining positional information regarding the relative positions of the first feature of the receiving element pattern and of the second feature of the receiving element pattern; and determining information at least indicative of the focal property of the lithographic apparatus from the obtained positional information, wherein using the phase modulation element to introduce an asymmetry relative to an optical axis in the substantially diffracted radiation comprises: using the phase modulation element to induce a phase shift between first radiation constituting at least a portion of a diffraction order of the substantially diffracted radiation and second radiation constituting a different portion of that same diffraction order such that the first radiation and second radiation combine with radiation constituting at least a portion of another diffraction order to ensure that the patterning device pattern which comprises the first pattern feature of the patterning device that substantially diffracts radiation is not imaged onto the radiation beam receiving element.

7. A lithographic arrangement, comprising:
an adjuster to provide a radiation beam with a symmetric illumination mode;
a patterning device to receive the radiation beam and arranged to provide a patterning device pattern, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation constituting at least a portion of the radiation beam, and a second pattern feature that does not substantially diffract radiation constituting at least a portion of the radiation beam;
a phase modulation element configured to introduce an asymmetry, relative to an optical axis, substantially only in the substantially diffracted radiation;
a radiation beam receiving element arranged to receive radiation emanating from the phase modulation element such that, in use, a receiving element pattern is formed on the receiving element that is related to the patterning device pattern, the receiving element pattern having a first feature that is related to the first pattern feature of the patterning device pattern, and a second feature that is related to the second pattern feature of the patterning device pattern;
a position detection arrangement configured to obtain positional information regarding the relative positions of the first feature of the receiving element pattern and of the second feature of the receiving element pattern; and
a determination configuration to determine information at least indicative of a focal property of the lithographic apparatus from the obtained positional information.

Assignees

• De Winter Laurentius Cornelius
• Finders Jozef Maria
• Asml Netherlands Bv

Inventors

• De Winter Laurentius Cornelius
• Finders Jozef Maria

Classifications

• G03F7/70641 Primary

  Focus · CPC title

• G03F7/70891 Primary

  Temperature · CPC title

• G03F7/70591

  Testing optical components · CPC title

• G03F7/70308

  Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift · CPC title

• G03F7/70125

  Use of illumination settings tailored to particular mask patterns (details of setting means G03F7/70091) · CPC title