Method for fabricating photolytic alignment film, liquid crystal display panel and display device
US-2015378218-A1 · Dec 31, 2015 · US
US9534133B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9534133-B2 |
| Application number | US-201514955151-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 1, 2015 |
| Priority date | Sep 1, 2011 |
| Publication date | Jan 3, 2017 |
| Grant date | Jan 3, 2017 |
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Methods for producing an at least partially cured layer by applying a layer including a (meth)acrylate-functional siloxane to a surface of a substrate, and irradiating the layer in a substantially inert atmosphere with a short wavelength polychromatic ultraviolet light source having a peak intensity at a wavelength of from about 160 nanometers to about 240 nanometers to at least partially cure the layer. Optionally, the layer is at a curing temperature greater than 25° C. In some embodiments, the layer has a thickness of about 0.1 micrometers to about 1 micrometer. In certain embodiments, the layer is substantially free of a photoinitiator and/or an organic solvent. In some particular embodiments, irradiating the layer with a short wavelength polychromatic ultraviolet light source takes place in an inert atmosphere including no greater than 50 ppm oxygen. The substantially cured layer may be a release layer or a low adhesion backsize (LAB).
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What is claimed is: 1. A method for producing an at least partially cured layer, comprising: applying a layer comprising a (meth)acrylate-functional siloxane and at least one non-functional polysiloxane material to a major surface of a substrate, wherein the layer is substantially free of added catalysts; and irradiating said layer, in a substantially inert atmosphere comprising no greater than 500 ppm oxygen, with a short wavelength polychromatic ultraviolet light source having at least one peak intensity at a wavelength of from about 160 nanometers to about 240 nanometers to at least partially cure the layer, optionally wherein the layer is at a curing temperature greater than 25° C. 2. The method of claim 1 , wherein said at least one peak intensity is at a wavelength between about 170 nanometers to about 220 nanometers. 3. The method of claim 2 , wherein said peak intensity is at a wavelength of about 185 nanometers. 4. The method of claim 1 , wherein said short wavelength polychromatic ultraviolet light source comprises at least one low pressure mercury vapor lamp, at least one low pressure mercury amalgam lamp, at least one pulsed Xenon lamp, at least one glow discharge from a polychromatic plasma emission source, or combinations thereof. 5. The method of claim 1 , wherein said (meth)acrylate-functional siloxane is one or more (meth)acrylate-functional siloxane monomers. 6. The method of claim 1 , wherein said (meth)acrylate-functional siloxane is one or more (meth)acrylate-functional siloxane oligomers. 7. The method of claim 1 , wherein said (meth)acrylate-functional siloxane is one or more (meth)acrylate-functional polysiloxanes. 8. The method of claim 1 , wherein said layer further comprises one or more copolymerizable materials selected from the group consisting of monofunctional (meth)acrylate monomers, difunctional (meth)acrylate monomers, polyfunctional (meth)acrylate monomers having functionality greater than two, vinyl ester monomers, vinyl ester oligomers, vinyl ether monomers, and vinyl ether oligomers. 9. The method of claim 1 , wherein said layer further comprises at least one functional polysiloxane material which does not comprise a (meth)acrylate functionality. 10. The method of claim 9 , wherein said functional polysiloxane material is selected from the group consisting of a vinyl-functional polysiloxane, a hydroxy-functional polysiloxane, an amine-functional polysiloxane, a hydride-functional polysiloxane, an epoxy-functional polysiloxane, and combinations thereof. 11. The method of claim 1 , wherein said at least one non-functional polysiloxane material is selected from a poly(dialkylsiloxane), a poly(alkylarylsiloxane), a poly(diarylsiloxane), a poly(dialkyldiarylsiloxane), or a combination thereof, optionally wherein the non-functional polysiloxane material comprises from 0.1 wt. % to 95 wt. %, inclusive, of the at least partially cured layer. 12. The method of claim 1 , wherein said layer is substantially free of an added photoinitiator. 13. The method of claim 1 , wherein said layer is substantially free of an organic solvent. 14. The method of claim 1 , wherein said substantially inert atmosphere comprises no greater than 50 ppm oxygen. 15. The method of claim 1 , wherein applying said layer to the surface of the substrate comprises applying a discontinuous coating. 16. The method of claim 1 , wherein the substrate is selected from the group consisting of paper, poly-coated Kraft paper, supercalendered or glassine Kraft paper, a cloth backing, a nonwoven web, a metal foil, poly(ethylene terephthalate), poly(ethylene naphthalate), polycarbonate, polypropylene, biaxially-oriented polypropylene, polyethylene, polyamide, cellulose acetate, ethyl cellulose, and combinations thereof.
After-treatment · CPC title
containing silicon bound to oxygen-containing groups (C09D183/12 takes precedence) · CPC title
in the release coating · CPC title
Release layer · CPC title
Rearranging applied substances, e.g. metering, smoothing; Removing excess material · CPC title
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