Package architecture utilizing wafer to wafer bonding
US-2024379487-A1 · Nov 14, 2024 · US
US9530717B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9530717-B2 |
| Application number | US-201414913648-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 18, 2014 |
| Priority date | Aug 26, 2013 |
| Publication date | Dec 27, 2016 |
| Grant date | Dec 27, 2016 |
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The bonded body of the present invention includes: a ceramic member made of ceramics; and a Cu member which is made of Cu or a Cu alloy and bonded to the ceramic member through a Cu—P—Sn-based brazing filler material and a Ti material, wherein a Cu—Sn layer, which is positioned close to the ceramic member and in which Sn forms a solid solution with Cu, and an intermetallic compound layer which is positioned between the Cu member and the Cu—Sn layer and contains P and Ti, are formed at a bonded interface between the ceramic member and the Cu member.
Opening claim text (preview).
The invention claimed is: 1. A bonded body comprising: a ceramic member made of ceramics; and a Cu member which is made of Cu or a Cu alloy and bonded to the ceramic member through a Cu—P—Sn-based brazing filler material and a Ti material, wherein a Cu—Sn layer, which is positioned close to the ceramic member and in which Sn forms a solid solution with Cu, and an intermetallic compound layer which is positioned between the Cu member and the Cu—Sn layer and contains P and Ti, are formed at a bonded interface between the ceramic member and the Cu member. 2. The bonded body according to claim 1 , wherein the intermetallic compound layer is formed in a range of 0.1 μm to 100 μm from the interface between the ceramic member and the Cu—Sn layer. 3. A power module substrate comprising the bonded body according to claim 2 , wherein the substrate further comprises: a ceramic substrate formed of the ceramic member; and a circuit layer formed by bonding a Cu foil formed of the Cu member to a first surface of the ceramic substrate through the Cu—P—Sn-based brazing filler material and the Ti material, and wherein the Cu—Sn layer, which is positioned close to the ceramic substrate and in which Sn forms a solid solution with Cu, and the intermetallic compound layer which is positioned between the circuit layer and the Cu—Sn layer and contains P and Ti, are formed at a bonded interface between the ceramic substrate and the circuit layer. 4. The power module substrate according to claim 3 , wherein a metal layer is formed on a second surface of the ceramic substrate. 5. The power module substrate according to claim 4 , wherein the metal layer is formed by bonding a Cu foil made of Cu or a Cu alloy to the second surface of the ceramic substrate through a Cu—P—Sn-based brazing filler material and a Ti material, and wherein a Cu—Sn layer, which is positioned close to the ceramic substrate and in which Sn forms a solid solution with Cu, and an intermetallic compound layer which is positioned between the metal layer and the Cu—Sn layer and contains P and Ti, are formed at a bonded interface between the ceramic substrate and the metal layer. 6. The power module substrate according to claim 4 , wherein the metal layer is made of Al or an Al alloy. 7. A power module substrate comprising the bonded body according to claim 1 , wherein the substrate further comprises: a ceramic substrate formed of the ceramic member; and a circuit layer formed by bonding a Cu foil formed of the Cu member to a first surface of the ceramic substrate through the Cu—P—Sn-based brazing filler material and the Ti material, and wherein the Cu—Sn layer, which is positioned close to the ceramic substrate and in which Sn forms a solid solution with Cu, and the intermetallic compound layer which is positioned between the circuit layer and the Cu—Sn layer and contains P and Ti, are formed at a bonded interface between the ceramic substrate and the circuit layer. 8. The power module substrate according to claim 7 , wherein a metal layer is formed on a second surface of the ceramic substrate. 9. The power module substrate according to claim 8 , wherein the metal layer is formed by bonding a Cu foil made of Cu or a Cu alloy to the second surface of the ceramic substrate through a Cu—P—Sn-based brazing filler material and a Ti material, and wherein a Cu—Sn layer, which is positioned close to the ceramic substrate and in which Sn forms a solid solution with Cu, and an intermetallic compound layer which is positioned between the metal layer and the Cu—Sn layer and contains P and Ti, are formed at a bonded interface between the ceramic substrate and the metal layer. 10. The power module substrate according to claim 8 , wherein the metal layer is made of Al or an Al alloy.
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