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System and method for pattern correction in e-beam lithography
US9529959B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9529959-B2 |
| Application number | US-201414192523-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 27, 2014 |
| Priority date | Feb 27, 2014 |
| Publication date | Dec 27, 2016 |
| Grant date | Dec 27, 2016 |
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Abstract
Official abstract text for this publication.
The present disclosure provides a method for pattern correction for electron-beam (e-beam) lithography. In accordance with some embodiments, the method includes splitting a plurality of patterns into a plurality of pattern types; performing model fittings to determine a plurality of models for the plurality of pattern types respectively; and performing a pattern correction to an integrated circuit (IC) layout using the plurality of models.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for pattern correction for electron-beam (e-beam) lithography, comprising: receiving, by a processor, a computer file including an integrated circuit (IC) layout, the IC layout including a plurality of patterns; classifying, by the processor, each pattern of the plurality of patterns according to a plurality of pattern types; performing, by the processor, model fittings to determine a plurality of models for the plurality of pattern types respec…
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Electricity · mapped topic
- H01J37/3174Primary
Electricity · mapped topic
- G06F30/398Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US9529959B2 cover?
- The present disclosure provides a method for pattern correction for electron-beam (e-beam) lithography. In accordance with some embodiments, the method includes splitting a plurality of patterns into a plurality of pattern types; performing model fittings to determine a plurality of models for the plurality of pattern types respectively; and performing a pattern correction to an integrated circ…
- Who is the assignee on this patent?
- Taiwan Semiconductor Mfg Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification H01J37/3174. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Dec 27 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).