Radiation source, lithographic apparatus, and device manufacturing method

US9529283B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9529283-B2
Application numberUS-200913058783-A
CountryUS
Kind codeB2
Filing dateJul 29, 2009
Priority dateAug 14, 2008
Publication dateDec 27, 2016
Grant dateDec 27, 2016

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.

First claim

Opening claim text (preview).

What is claimed is: 1. A spectral purity filter configured to transmit extreme ultraviolet (EUV) radiation and to deflect non-EUV secondary electromagnetic radiation, the spectral purity filter comprising a body of material having a transmissivity for EUV radiation in the range of 5-20 nm of at least 20% and a layer of material having reflection to the non-EUV secondary electromagnetic radiation of at least 50%, said layer being located on a radiation incident side of the body.…

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Next steps

Free tools are coming soon. Tell us what you want to track and we'll notify you.

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9529283B2 cover?
A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spec…
Who is the assignee on this patent?
Yakunin Andrei Mikhailovich, Banine Vadim Yevgenyevich, Moors Johannes Hubertus Josephina, and 2 more
What technology area does this patent fall under?
Primary CPC classification G03F7/70958. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 27 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).