Blank of tio2-sio2 glass for a mirror substrate for use in euv lithography and method for the production thereof
US-2015376049-A1 · Dec 31, 2015 · US
US9529283B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9529283-B2 |
| Application number | US-200913058783-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 29, 2009 |
| Priority date | Aug 14, 2008 |
| Publication date | Dec 27, 2016 |
| Grant date | Dec 27, 2016 |
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A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.
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What is claimed is: 1. A spectral purity filter configured to transmit extreme ultraviolet (EUV) radiation and to deflect non-EUV secondary electromagnetic radiation, the spectral purity filter comprising a body of material having a transmissivity for EUV radiation in the range of 5-20 nm of at least 20% and a layer of material having reflection to the non-EUV secondary electromagnetic radiation of at least 50%, said layer being located on a radiation incident side of the body.…
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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