Energy-sensitive resin composition

US9529258B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9529258-B2
Application numberUS-201314758199-A
CountryUS
Kind codeB2
Filing dateDec 25, 2013
Priority dateDec 28, 2012
Publication dateDec 27, 2016
Grant dateDec 27, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present invention provides an energy-sensitive resin composition, a method of manufacturing a polyimide film or a polyimide molded product in which said composition is used, and a method of forming a pattern in which said composition is used. The composition supplies a polyimide resin exhibiting exceptional thermal resistance and low permittivity even by a heat treatment at a low temperature. The composition contains polyamic acid obtained by reacting tetracarboxylic dianhydride and diamine, a solvent, and a compound (A) decomposing by the action of light and/or heat and generating a base and/or an acid. The method of manufacturing a polyimide film or a polyimide molded product includes forming a coating film or molded product comprising the composition and decomposing the compound (A) in the film or product through exposure or heating. The method of forming a pattern sequentially includes forming, selectively exposing, developing and heating the film or product.

First claim

Opening claim text (preview).

What is claimed is: 1. An energy-sensitive resin composition comprising polyamic acid, a solvent, and a compound (A), wherein the polyamic acid is obtained by reacting tetracarboxylic dianhydride with diamine, the compound (A) comprises at least one of: a compound (A-1) that decomposes by the action of at least one of light and heat and generates an imidazole compound; and an oxime ester compound (A-2), wherein the compound (A-1) is represented by the following formula (4) or a…

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What does patent US9529258B2 cover?
The present invention provides an energy-sensitive resin composition, a method of manufacturing a polyimide film or a polyimide molded product in which said composition is used, and a method of forming a pattern in which said composition is used. The composition supplies a polyimide resin exhibiting exceptional thermal resistance and low permittivity even by a heat treatment at a low temperatur…
Who is the assignee on this patent?
Tokyo Ohka Kogyo Co Ltd
What technology area does this patent fall under?
Primary CPC classification G03F7/0041. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 27 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).