Swash plate

US9528504B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9528504-B2
Application numberUS-201314387867-A
CountryUS
Kind codeB2
Filing dateMar 25, 2013
Priority dateMar 26, 2012
Publication dateDec 27, 2016
Grant dateDec 27, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The outer periphery of the outer part of a substrate is a chamfer, and the outer part of the substrate is covered by a resin film layer. The thickness of the resin film layer at the chamfer is thicker than the locations radially further inwards from said chamfer. The surface of the resin film layer on the outer peripheral edge of the outer part is coplanar with the surface of the resin film layer further inwards. These locations act as the sliding surface (the surface of the swash plate) that slides on a shoe, and compared with conventional techniques, because the resin film layer in the outer peripheral edge is thick, attrition of the portion being pressed against the shoe is suppressed. For that reason, the outer peripheral edge of the substrate and the vicinity thereof are prevented from being exposed, and seizure of the swash plate can be prevented.

First claim

Opening claim text (preview).

The invention claimed is: 1. A swash plate comprising: a substrate formed in a disk shape and with a chamfered part on an outer peripheral edge of an end surface; and a resin film layer arranged to cover an end surface of the substrate and formed beyond an outer peripheral edge of an end surface serving as the chamfered part to cover up to the chamfered part, a flat surface of the resin film layer serving as a sliding surface sliding with a shoe; wherein the resin film layer in the chamfered part is thicker than the chamfered part and thicker than the resin film layer in a radial inner direction side, the outer peripheral edge of the flat surface of the resin film layer serving as a sliding surface is located above the chamfered part serving as a radial outer direction than an outer peripheral edge of the end surface of the substrate, and when a thickness of the resin film layer at the outer peripheral edge of the flat surface of the resin film layer is given as T 2 and a thickness of the resin film layer at the outer peripheral edge on the end surface of the substrate is given as T 1 , the thickness T 2 is set larger than the thickness T 1 . 2. The swash plate according to claim 1 , wherein a surface of the resin film layer at the chamfered part and a surface of the resin film layer at the outer peripheral edge of the end surface become coplanar, and a surface of the resin film layer at the chamfered part becomes the sliding surface. 3. The swash plate according to claim 1 or claim 2 , wherein the thickness T 2 is set to 4˜100 μm, and the thickness T 1 is set to 2˜50 μm.

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What does patent US9528504B2 cover?
The outer periphery of the outer part of a substrate is a chamfer, and the outer part of the substrate is covered by a resin film layer. The thickness of the resin film layer at the chamfer is thicker than the locations radially further inwards from said chamfer. The surface of the resin film layer on the outer peripheral edge of the outer part is coplanar with the surface of the resin film lay…
Who is the assignee on this patent?
Taiho Kogyo Co Ltd
What technology area does this patent fall under?
Primary CPC classification F04B27/08. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Dec 27 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).