Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate

Patent metadata

Field	Value
Publication number	US-9527938-B2
Application number	US-201314382476-A
Country	US
Kind code	B2
Filing date	Mar 5, 2013
Priority date	Mar 5, 2012
Publication date	Dec 27, 2016
Grant date	Dec 27, 2016

Abstract

Provided is a copolymer for lithography containing a monomer containing an acid leaving group and a monomer not containing an acid leaving group, in which N(v 1 )/N ave is from 1.01 to 1.09 and all of N(v 2 )/N ave , N(v 3 )/N ave , and N(v 4 )/N ave are from 0.95 to 1.05 when, among five fractions obtained by dividing an eluate providing a peak according to the copolymer in an elution curve obtained by GPC in order of elution so as to have an equal volume, ratios of monomer units containing an acid leaving group among the total monomer units constituting a copolymer included in the respective fractions from the first which is eluted earliest to the fourth are denoted as N(v 1 ) mol % to N(v 4 ) mol %, respectively, and the ratio of the monomer unit containing an acid leaving group among the total monomer units constituting a copolymer included in the sum of the five fractions is denoted as N ave mol %.

First claim

The invention claimed is:

1. A copolymer obtained by polymerizing at least one monomer comprising an acid leaving group and at least one monomer without an acid leaving group, wherein
N(v 1 ) mol %/N ave mol % is from 1.01 to 1.09 and N(v 2 ) mol %/N ave mol %, N(v 3 ) mol %/N ave mol %, and N(v 4 ) mol %/N ave mol % are individually from 0.95 to 1.05, and further satisfies the following Equation (1),
0.05≦( Sw−Sc )/ Sc× 100≦0.75  (1)

in Equation (1), Sw is a value represented by the following Equation (2), and Sc is a value represented by the following Equation (3),

S
w

=

∑

j
=
1

m

⁢

W
⁡

(

v
j

)

⁢

N
⁡

(

v
j

)

⁢

A
⁡

(

v
j

)

∑

j
=
1

m

⁢

W
⁡

(

v
j

)

⁢

A
⁡

(

v
j

)

(
2
)

S
c

=

∑

j
=
1

m

⁢

N
⁡

(

v
j

)

⁢

A
⁡

(

v
j

)

∑

j
=
1

m

⁢

A
⁡

(

v
j

)

(
3
)

in Equations (2) and (3), m represents 5, N(v j ) represents the ratio [unit:mol %] of the monomer unit containing an acid leaving group among the total monomer units constituting the copolymer contained in each of the five fractions,
A(v j ) represents the ratio [unit:%] of the area value of each fraction in the elution curve with respect to the sum of the area values of the total fractions, and
W(v j ) represents the mass average molecular weight of the copolymer contained in each of the five fractions,
when, among five fractions obtained by dividing an eluate providing a peak corresponding to the copolymer in an elution curve obtained by gel permeation chromatography (GPC) in order of elution so as to have an equal volume, a ratio of the monomer unit comprising an acid leaving group among total monomer units constituting the copolymer included in a first fraction which is eluted earliest is denoted as N(v 1 ) mol %, ratios of the monomer units comprising an acid leaving group among total monomer units constituting the copolymer included in respective fractions which are eluted from the second to the fourth are denoted as N(v 2 ) mol %, N(v 3 ) mol %, and N(v 4 ) mol %, respectively, and a ratio of the monomer unit comprising an acid leaving group among total monomer units constituting the copolymer included in a sum of the five fractions is denoted as N ave mol %.

2. The copolymer according to claim 1 , wherein the monomer unit comprising an acid leaving group is one or more selected from the group consisting of Formulas (i) to (iv);

wherein in Formula (i), R 31 represents a hydrogen at

Assignees

• Mitsubishi Rayon Co

Inventors

• Yasuda Atsushi
• Oshikiri Tomoya
• CHUJO Miho

Classifications

• G03F7/0397

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• C09D4/00

  Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond {; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16} · CPC title

• G03F7/004

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title

• C08F220/20

  of polyhydric alcohols or phenols {, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate} · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title